• Pacific Rim Laser Damage
    Invitation
    Conference
    For Authors/Presenters
Blue Palace Hotel
Shanghai, China
21 - 24 May 2017
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Plan to Attend

On behalf of the Conference Chairs, International Program Committee, and the Local Organizers, we invite you to participate by submitting your abstract to the Pacific-Rim Laser Damage Symposium: Optical Materials for High Power Lasers. This symposium will be held in Shanghai 21-24 May 2017. The symposium is co-hosted by SIOM and SPIE. We are organizing a leading international conference, like SPIE Laser Damage in Boulder, Colorado, for presenting novel and fundamental advances in the fields of optical materials for high power lasers. We also intend to provide an excellent opportunity for researchers to communicate efficiently and to exchange information on new problems, solutions, and technologies in the field of laser damage as well as optical materials. We hope that this conference will contribute to enhancement of understanding between each other and facilitate closer collaborations among participating researchers.

We urge you to participate by submitting your abstracts, and to encourage your colleagues to do the same.

Symposium Organizers

2017 Conference Chairs:

Jianda Shao
Shanghai Institute of Optics and Fine Mechanics (China)



Takahisa Jitsuno

 Takahisa Jitsuno
 Osaka Univ. (Japan)

 

Wolfgang Rudolph

 Wolfgang Rudolph
The Univ. of New Mexico (United States)

 



International Program Committee:
MJ Soileau, Univ. of Central Florida (United States)
Efim A. Khazanov, Federal Research Ctr., Institute of Applied Physics of the Russian Academy of Sciences (Russian Federation)
Zhi M. Liao, Lawrence Livermore National Lab.(United States)
Zunqi Lin, Shanghai Institute of Optics and Fine Mechanics (China)
Yongfeng Lu, Univ. of Nebraska-Lincoln (United States)
Jean-Yves Natoli, Institut Fresnel (France)
Valdas Sirutkaitis, Vilnius Univ. (Lithuania)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Koji Sugioka, RIKEN (Japan)
Takunori Taira, Institute for Molecular Science (Japan)
Mauro Tonelli, Univ. di Pisa (Italy)
Zhouling Wu, ZC Optoelectronic Technologies Ltd. (China)
Qiao Xu, China Academy of Engineering Physics (China)
Jiping Zou, Ecole Polytechnique (France)

Local Organizing Committee:
Ya Cheng, Shanghai Institute of Optics and Fine Mechanics (China)
Yaping Dai, Chinese Academy of Engineering Physics (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Guixue Huang, National High Technology Research and Development Program 863 (China)
Yuxin Leng, Shanghai Institute of Optics and Fine Mechanics (China)
Liejia Qian, Shanghai Jiao Tong Univ. (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)
Long Zhang, Shanghai Institute of Optics and Fine Mechanics (China)


 

Organizers

SPIE logo

Cooperating Organizations

National High-tech R&D

Important Dates

Abstract Due Date
20 January 2017

Author Notification
1 February 2017

Manuscripts Due
26 June 2017

 


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