• Optical Metrology
    Invitation
    Conferences
    Courses
    Special Events
    Travel to Munich
    Hotels
    Onsite Services
    Registration
    Proceedings
    For Authors/Presenters
    For Chairs/Committees
Internationales Congress Center
Munich, Germany
25 - 29 June 2017
Search Program:
go
Print PageEmail Page

Invitation

Welcome to Munich!

Take this opportunity to share your research at SPIE Optical Metrology 2017. Come to Munich to meet with users and researchers to discuss the latest inventions and applications in the field of optical metrology. The symposium will highlight new optical principles and systems for metrology, videometrics and machine vision with applications in industrial design, production engineering, process monitoring, maintenance support, biotechnology, vehicle navigation, multimedia technology, architecture, archaeology and arts. Special emphasis is directed to model-based, remote and active approaches, sensor fusion, robot guidance, image sequence processing and scene modelling, biomaterials characterization as well as to the preservation of our shared cultural heritage.

We invite engineers, scientists, researchers, trustees and managers to attend this year’s meeting.
Co-located with Laser 2017 in Munich, Germany, this symposium will address the role of optics and lasers in the following areas:

• Optical Measurement Systems for Industrial Inspection
• Modeling Aspects in Optical Metrology
• Optical Methods for Inspection, Characterization and Imaging of Biomaterials
• Videometrics, Range Imaging and Applications
• Automated Visual Inspection and Machine Vision
• Optics for Arts, Architecture, and Archaeology

Take advantage of this unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering. Learn about recent advances in using optical technologies to preserve our shared cultural heritage. Find out about new approaches that push optical principles of measurement and testing at the macro, micro- and nanoscales to the forefront of metrology. Exchange new ideas, address your shared concerns, and get access to information not yet published in the mentioned topical areas. Share your research with other engineers, scientists, researchers, and managers. Presentations will be permanently archived in the SPIE Digital Library, and made available to others in the international scientific community who seek to learn, make discoveries, and innovate.

We invite you to join your colleagues and share the most recent developments and applications at SPIE Optical Metrology 2017.

Symposium Chairs

Wolfgang Osten Wolfgang Osten
Univ. Stuttgart (Germany)

Technical Committee
Armando Albertazzi Goncalves, Jr., Univ. Federal de Santa Catarina (Brazil)
Jürgen Beyerer, Fraunhofer Institute of Optronics, System Technologies and Image Exploitation (Germany)
Bernd Bodermann, Physikalisch-Technische Bundesanstalt (Germany)
Pietro Ferraro, Institute of Applied Sciences and Intelligent Systems (ISASI-CNR) (Italy)
Karsten Frenner, Univ. Stuttgart (Germany)
Simonetta Grilli, Institute of Applied Sciences and Intelligent Systems (ISASI-CNR) (Italy)
Christoph K. Hitzenberger, Medizinische Univ. Wien (Austria)
Peter Lehmann,
Univ. Kassel (Germany)
Wolfgang Osten, Univ. Stuttgart (Germany)
Luca Pezzati, Istituto Nazionale di Ottica-CNR (Italy)
Fernando Puente León, Karlsruhe Institute of Technology (Germany)
Fabio Remondino, FBK Trento (Italy)
Monika Ritsch-Marte, Medizinische Univ. Innsbruck (Austria)
Richard M. Silver, NIST (United States)
Mark Shortis, RMIT Univ. (Australia)
Piotr Targowski, Nicolaus Copernicus Univ. (Poland)



Important Dates

Registration increases after
1 June 2017

Author Notification
18 Feburary 2017

On-site Manuscripts Due
15 April 2017

Post-meeting Manuscripts Due
(O3A Conference only)
27 May 2017


Browse Defense, Security, and Sensing 2011 papers


Sign up for event e-alerts

 Subscribe