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Boulder Millennium Hotel
Boulder, Colorado, United States
24 - 27 September 2017
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Thin Film Damage Competition

355-nm Mirror Thin Film Damage Competition

Coordinated by: Raluca Negres, Christopher J. Stolz, Lawrence Livermore National Lab. (USA)

A double-blind laser damage competition will be held to determine the current nanosecond laser damage resistance of 355-nm, 45 degree multilayer mirrors. The results will be shared at SPIE Laser Damage 2017. The mirrors must meet the following requirements:

  • Reflectance > 99.5%
  • GDD <+/- 100 fs2
  • 45 degrees incidence angle; "P" polarization
  • Pulse length 5-ns; Single-longitudinal mode laser; Repetition rate 10 Hz
  • Environment: Ambient air (normal and low humidity possible)
  • No wavefront or stress requirement
  • No surface quality requirement.

The coatings shall be deposited on glass substrates provided by the coating supplier; it is highly desired to have a polished rear surface. The dimensions of the substrate shall be 50 mm (+/- 1 mm) in diameter and at least 10 mm thick. Samples must be received by June 1, 2017 to the following address:

Raluca Negres L-460
Lawrence Livermore National Laboratory
7000 East Avenue
Livermore, CA 94550

Each sample will be assigned a unique label to maintain anonymity. The origin of the samples will not be released to the damage testing service and also will not be published at the Laser Damage Symposium or within the proceedings. A summary of the results will be published in the conference proceedings. Coating suppliers will be informed of the measured results and relative ranking within the submitted population. In order to minimize the number of damage tests, no more than two different samples can be submitted from each coating supplier.

In addition to the thin film sample, the coating supplier MUST also include the following information:

  • Coating materials and number of layers
  • Reflectance or transmission spectral scan (prefer in an electronic format) from ~300-400nm. Spectral scans may be emailed to negres2@llnl.gov
  • A brief description of the deposition method (e-beam, IAD, IBS, plasma assist, etc.)
  • Substrate material and cleaning method

Failure to provide the required information will result in the disqualification of the sample. If two samples are submitted, the vendor must describe the manufacturing differences between the two samples. Optical or scanning electron microscopy may be used to image damage sites. Reflectance measurements may also occur. No other characterization tools will be used on the samples to protect any proprietary features of the samples. Samples will be returned if requested.

Testing Performed by

Spica Technologies, Inc. word logo

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