• Advanced Lithography
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
25 February - 1 March 2018
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The premier event for the lithography community

View 2017 news and photos

Plan to join us in San Jose for SPIE Advanced Lithography 2018
The world's premier lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry. 

2018 Call for Papers opens in May

7 Conferences and 600 papers

600 technical papers in 2017

2017 conference topic areas:

• Extreme Ultraviolet (EUV) Lithography
• Emerging Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research. 

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.

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