San Jose Marriott and San Jose Convention Center San Jose,
United States 21 - 25 February 2016
Register now to attend the world's most important gathering of lithography experts
SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For more than 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.
SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.
The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.