• Advanced Lithography
    2018 Onsite News
    Plan to Participate
    Courses
    Exhibition
    Sponsors
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
    Become a Sponsor
San Jose Convention Center
San Jose, California, United States
24 - 28 February 2019
Print PageEmail Page

SPIE Advanced Lithography, the leading global lithography event

Register for SPIE Advanced Lithography 2018 in San Jose, California

Advanced Lithography 2019 Call for Papers
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Stories and photos from the 2018 conference

Important Dates

Call Opens
1 May 2018

Abstracts Due
29 August 2019

Download the 2018 Final Program PDF
Advanced Lithography 2018 Exhibitors
Paid conference registration includes online Proceedings of SPIE

In 2018, over 200 papers were presented on thesee topics

• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

2018 Plenary speakers

Yan Borodovsky

Yan Borodovsky
Intel Senior Fellow, retired (USA)

G. Dan Hutcheson

G. Dan Hutcheson
CEO and Chairman VSLI Research, Inc. (USA)

Stephen Hsu

Stephen Hsu
ASML Brion US (USA)

Featured Sponsor, Canon

Connect with SPIE

#SPIElitho FB Twitter Check out SPIE on Instagram SPIE.tv SPIE LinkedIn

Sign up for email updates about SPIE Advanced Lithography