• Advanced Lithography
    For Exhibitors
San Jose Marriott and San Jose Convention Center
San Jose, California, United States
26 February - 2 March 2017
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The premier event for the lithography community

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Thank you for attending SPIE Advanced Lithography 2017
The world's premier lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry. 

We look forward to seeing you in 2018.

Explore the program

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7 Conferences and 600 papers

View the 600 technical papers

View the 2017 SPIE Advanced Lithography conference topic areas

• Extreme Ultraviolet (EUV) Lithography
• Emerging Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research. 

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.

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