2025 call for papers opens in June
23 - 27 February 2025
San Jose, California, US

Share your research, challenges, and breakthroughs with colleagues in San Jose

The call for papers opens soon. Submit your abstract and join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
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Explore six great conferences

  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

Prepare your abstract

Review everything you need to know about submitting your abstract for SPIE Advanced Lithography + Patterning 2025.

Be a part of the 2025 program

Join your community in San Jose and enjoy:

  • Plenary talks
  • Technical presentations
  • Networking sessions
  • Course offerings
  • Exhibition

Presenter at SPIE Advanced Lithography + Patterning

See highlights from the 2024 event


A wonderful week in San Jose

View daily image highlights and social media activity from a packed week of presentations, networking, and the latest technology in San Jose, California.

Learn about career opportunities


Watch a webinar recording from the technical community

Students and others are encouraged to watch this webinar recording covering the basics of semiconductor lithography, the careers available, and a preview of Advanced Lithography + Patterning 2024. Opportunities for students to apply for full funding to attend the event in February is included in the discussion.

Watch to learn more!

Add a course to your conference experience


Choose from a selection of highly valuable topics

Advance your career and expand your skill set with instructional opportunities. Several courses will be available in San Jose.

Exhibition at Advanced Lithography + Patterning


Connect with the semiconductor community

The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and to get business done. Find these technology solutions and more:
• Photoresist, EUV, and other specialty materials
• E-beam lithography systems
• Precision cleaning, contamination, transport support materials
• Wafer treatments and substrates

Opportunities for students


Students: Learn how to attend this event for free

SPIE Advanced Lithography + Patterning offers numerous opportunities for students to engage and learn about the semiconductor industry, as well as share their latest research in lithography and photomask technologies. Leading companies support student participation through grants and awards, and tech groups offer scholarships for graduate and undergraduate applicants.

Proceedings will be published on the SPIE Digital Library


Presentations become published works

SPIE Advanced Lithography + Patterning conference proceedings are published in the SPIE Digital Library. All paid conference registrations include proceeding downloads with ongoing access through your SPIE account.

Visit the Digital Library to see all past years of proceedings from this meeting.

Stay involved


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