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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
26 February - 2 March 2017
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Don't miss the industry's most important lithography exhibition of the year

SPIE Advanced Lithography 2017 Exhibition

SPIE Advanced Lithography Exhibition, the most important event for lithography R&D, devices, tools, fabrication, and services.

Join us in San Jose and see everyone who is anyone in the industry—semiconductor suppliers, integrators, and manufacturers—all in one place.

2017 Exhibition Dates and Hours
Tuesday 28 February 10 a.m. to 5 p.m.
Wednesday 1 March 10 a.m. to 4 p.m.

Download the 2016 Exhibition Guide (3 MG PDF)

Featured technologies for semiconductor lithography

 • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
 • Metrology, inspection, OPC, and process control
 • Design and manufacturing software
 • Materials and chemicals
 • Imaging equipment
 • Lasers
 • Resist materials and processing
 • Nano-imprint
 • IC and chip fabrication
 • Nanoscale imaging
 • Etch Technology for nanopatterning

Meet leaders from top companies
 • View the full list of exhibitors 
 • View the Exhibition Floor Plan
Need more information? Interested in Exhibiting?
Review the 2016 Exhibit Guide (7 MB PDF)
Learn more about exhibiting on the For Exhibitors page

Featured Exhibitor + Product

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