• Advanced Lithography
    Award Announcements
    Exhibitor List
    Exhibition Floor Plan
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
San Jose Marriott and San Jose Convention Center
San Jose, California, United States
26 February - 2 March 2017
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Plan ahead for the 2017 exhibition

2015 SPIE Advanced Lithography Exhibition

SPIE Advanced Lithography Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

Join us in San Jose and see everyone who is anyone in the industry (semiconductor suppliers, integrators, and manufacturers) all in one place.

Download the Program Download the 2016 Exhibition Guide (7 MB PDF)


2017 Exhibition Dates and Hours
Tuesday 28 February 10 a.m. to 5 p.m.
Wednesday 1 March 10 a.m. to 4 p.m.

Featured technologies for semiconductor lithography

 • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
 • Metrology, inspection, OPC, and process control
 • Design and manufacturing software
 • Materials and chemicals
 • Imaging equipment
 • Lasers
 • Resist materials and processing
 • Nano-imprint
 • IC and chip fabrication
 • Nanoscale imaging
 • Etch Technology for nanopatterning

Meet leaders from top companies
 • View the full list of exhibitors 
 • View the Exhibition Floor Plan
Need more information? Interested in Exhibiting?
Review the 2016 Exhibit Guide (7 MB PDF)
Learn more about exhibiting on the For Exhibitors page

Sign up for information on exhibiting at this event