• Advanced Lithography
    Invitation
    Award Announcements
    Conferences
    Courses
    Exhibition
    Special Events
    Sponsors
    Travel to San Jose
    Hotels
    Onsite Services
    Registration
    Proceedings
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
San Jose Marriott and San Jose Convention Center
San Jose, California, United States
26 February - 2 March 2017
Search Program:  go
Print PageEmail Page

Stay competitive with courses at the event

Maintain your competitive edge with courses at Advanced Lithography

Efficient training for career enhancement, taught by recognized experts in industry and academia. Learn current approaches in DTCO, optimization, image placement, DSA, EUV, and more.

Subscribe to receive updates.


Highlights for 2017

New course
Data Analytics and Machine Learning in Semiconductor Manufacturing: Applications for Physical Design, Process and Yield Optimization (Cain/Capodieci)

Updated content
Computational basis for Advanced Lithography Techniques (Lai)


Review the 2017 course offerings

SPIE Student Members get up to 60% off courses

Advanced Lithography

Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: C. Grant Willson, The Univ. of Texas at Austin (United States); Murrae J. Bowden, EMP Consultants (United States)
$525.00 Members  |  $635.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Advanced
Instructor: Uzodinma Okoroanyanwu, Consultant (United States)
$625.00 Members  |  $735.00 Non-members
Date: 26 February 2017
Time: 1:30 PM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: Hugo Cramer, ASML Netherlands B.V. (Netherlands); Igor Turovets, Nova Measuring Instruments Ltd. (Israel)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 12:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Kafai Lai, IBM Corp. (United States)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 12:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Eric Solecky, IBM Corp. (United States); Ofer Adan, Applied Materials, Inc. (Israel)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 1:30 PM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: Alexander Starikov, I & I Consulting (United States)
$305.00 Members  |  $360.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 12:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Hoyoung Kang, TEL Technology Ctr., America, LLC (United States)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Chris A. Mack, John Petersen, Consultant (United States)
$610.00 Members  |  $720.00 Non-members
Date: 1 March 2017
Time: 1:30 PM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Puneet Gupta, Univ. of California, Los Angeles (United States); Juan Andres Torres, Mentor Graphics Corp. (United States); Arindam Mallik, IMEC (Belgium)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 1:30 PM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: Jason P. Cain, Advanced Micro Devices, Inc. (United States); Luigi Capodieci, Consultant (United States)
$300.00 Members  |  $355.00 Non-members
Date: 2 March 2017
Time: 8:30 AM - 12:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: Ralph R. Dammel, EMD Performance Materials Corp. (United States)
$300.00 Members  |  $355.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Mircea V. Dusa, ASML US, Inc. (United States); Stephen D. Hsu, ASML Brion (United States)
$525.00 Members  |  $635.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Intermediate
Instructor: Vivek Bakshi, EUV Litho, Inc. (United States); Jinho Ahn, Hanyang Univ. (South Korea); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
$665.00 Members  |  $775.00 Non-members
Date: 26 February 2017
Time: 8:30 AM - 5:30 PM
Location: SPIE Advanced Lithography, San Jose, California, United States
Course Level: Introductory
Instructor: Qinghuang Lin, Ying Zhang, IBM Thomas J. Watson Research Ctr. (United States)
$525.00 Members  |  $635.00 Non-members

Continuing Education Units

IACET Authorzed Provider
SPIE is accredited by the International Association for Continuing Education and Training (IACET) and is authorized to issue the IACET CEU.


Sign up for event e-alerts

 Subscribe


Browse Defense, Security, and Sensing 2011 papers