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San Jose Convention Center
San Jose, California, United States
24 - 28 February 2019
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Award announcements

The following awards will be announced at SPIE Advanced Lithography 2019 in San Jose, California.


Metrology, Inspection, and Process Control for Microlithography (10959)

Monday 25 February 2019 · 11:00 to 11:15 AM
Presentation of the 2018 Diana Nyyssonen Memorial Award for Best Paper
Award Sponsored by
Hitachi Logo

Thursday 28 February 2019 · 10:20 to 10:30 AM
Presentation of the 2019 Karel Urbanek Best Student Paper Award
Award Sponsored by
KLA-Tencor Logo


Advances in Patterning Materials and Processing Technology (10960)
Location: Convention Center, 220C

Monday 25 February 2019 · 2:00 PM to 2:30 PM
Presentation of the 2018 C. Grant Willson Award for Best Paper
and
Presentation of the 2018 Hiroshi Ito Memorial Award for the Best Student Paper

These Awards Sponsored by
IBM

Monday 25 February 2019 · 11:00 to 11:10 AM
Presentation of the 2018 Jeffrey Byers Memorial Best Poster Award
Award Sponsored by
Tokyo Electron


Extreme-Ultraviolet (EUV) Lithography (10597)

Thursday 28 February 2019 · 10:25 to 10:30 am
Presentation of the 2019 Cymer Leadership for Best Student Paper Award
Award Sponsored by
Cymer ASML

Important Dates

Author Notification
22 October 2018

Manuscripts Due
29 January 2019


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