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Awards presented at SPIE Advanced Lithography 2016

Awards presented at the 2016 Metrology, Inspection, and Process Control for Microlithography Conference

The 2015 Diana Nyyssonen Memorial Award for Best Paper
was presented to Narender Rana, Yunlin Zhang, Donald Wall, Bachir Dirahoui, Todd C. Bradley, IBM Semiconductor Research and Development Ctr. (USA)
for their presentation Machine learning and predictive data analytics enabling metrology and process control in IC fabrication [9824-54]

 Award Sponsored by

Hitachi Logo

The 2016 Karel Urbanek Best Student Paper Award
was presented to
Student, Maria Laura Gödecke, Univ. Stuttgart (Germany), and co-authors Sandy Peterhänsel, Karsten Frenner, Wolfgang Osten, Univ. Stuttgart (Germany)
for their presentation Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry [9778-16]

Award Sponsored by

KLA-Tencor Logo

Awards presented at the 2016 Advances in Patterning Materials and Processing Technology Conference

The 2015 C. Grant Willson Award for Best Paper
was presented to Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark, Peter De Schepper, Joseph Edson, Michael Greer, Kai Jiang, Michael Kocsis, Stephen T. Meyers, Jason K. Stowers, Alan J. Telecky, Inpria Corp. (USA); Danilo De Simone, Geert Vandenberghe, IMEC (Belgium)
for their presentation Integrated fab process for metal oxide EUV photoresist [9425-29]

The 2015 Hiroshi Ito Memorial Award for the Best Student Paper
was presented to Arjun Singh, Boon Teik Chan, Roel Gronheid, IMEC (Belgium); Doni Parnell, Toyko Electron Ltd. (Netherlands); Hengpeng Wu, Jian Yin, Yi Cao, EMD Performance Materials Corp. (USA)
for their presentation Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns [9425-34]

These Two Awards Sponsored by


The 2016 Jeffrey Byers Memorial Best Poster Award in Resist
was presented to Kensuke Matsuzawa, Ryan A. Mesch, Wade Wang, C. Grant Willson, The Univ. of Texas at Austin (USA); Mike Olah, Scott Phillips, The Pennsylvania State Univ. (USA)
for their presentation Aromatizing unzipping polyester for EUV photoresist [9425-64]

Award Sponsored by

Tokyo Electron

Award presented at the 2016 Optical Microlithography Conference

The 2016 Best Student Award in Microlithography
was presented to Andrew Brubine, Bruce W. Smith, Rochester Institute of Technology (USA); John Sturtevant, David Fryer, Mentor Graphics Corp. (USA)
for their presentation Bayesian inference for OPC modeling [9780-17]

Award Sponsored by

  Cymer ASML


Award presented at the 2016 Design-Process-Technology-Co-optimization for Manufacturability Conference

The Franco Cerrina Memorial Best Student Paper Award
was presented to Yibo Lin, Xiaoqing Xu, Ross Baldick, David Z. Pan, The Univ. of Texas at Austin (USA); Bei Yu, The Chinese Univ. of Hong Kong (Hong Kong)
for their presentation Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding [9781-22]

The Fritz Zernike Award for Microlithography

The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions.

Yan Borodovsky, Intel Senior Fellow (Retired), was presented the 2016 Zernike Award in recognition of his efforts toward the advancement of multi-generational lithography process solutions and as a key contributor of patterning approaches and layout design rules at Intel.  

The Special Contribution Award to the Art and Science of Lithography
For Outstanding Contribution, Visionary Guidance, and Inspiring Dedication to the Lithography Community and to the SPIE Advanced Lithography symposium.

Was individually presenteded

William H. Arnold, ASML US, Inc. (USA)


Harry J. Levinson, GLOBALFOUNDRIES Inc. (USA)

Important Dates

Abstracts Due
Late submissions will be considered. Please submit as soon as possible online.

Author Notification
24 October 2016

Manuscripts Due
30 January 2017


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