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San Jose Convention Center
San Jose, California, United States
25 February - 1 March 2018
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Submit an abstract to the leading event for the lithography community

SPIE Advanced Lithography 2018 Call for Papers - submit your abstract today

Post-deadline submissions completed online will be considered by the chairs—submit your abstract
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Submit an abstract

Abstracts
Post-deadline submissions will be considered by the chairs

Author Notification
26 October 2017

Manuscripts Due
29 January 2018

Featured Sponsor, Canon

2018 Call for Papers—make late submissions online for consideration

View the Online Call for Papers
Download the 2018 Call for Papers PDF
View the submission guidelines

7 Conferences and 600 papers

600 papers divided into 7 conferences address various topic areas

View the 2018 conference topic areas:

• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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