• Advanced Lithography 2015
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
22 - 26 February 2015
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Attend SPIE Advanced Lithography, the #1 conference for the lithography community

SPIE Advanced Lithography 2015 40-year Anniversary

SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

Pre-registration is now closed. Please register onsite.

View the 2015 Event News and Photos

Download the 2015 Advance Program 2015 Technical Program (4 MB PDF)
2015 Technical Abstracts (1 MB PDF)
View the Exhibition Guide (2 MB PDF)
Photonics West registration pricing and details View Registration Pricing and Details
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A variety of events, all in one week
500 presentationsspecial events * courses * exhibition

2015 Plenary Speakers
 Dr. Xiaowei Shen

Internet-of-Things: Cloud Platform and Industry Solutions
Dr. Xiaowei Shen
Director, IBM Research,
China

 Dr. Tsu-Jae King Liu

Sustaining the Silicon Revolution: From 3D Transistors to 3D Integration
Dr. Tsu-Jae King Liu
Chair of the Dept. of Electrical Engineering and Computer Sciences,
Univ. of California, Berkeley

 Dr. Alan Willner

Activities of the National Photonics Initiative
Dr. Alan Willner
Sample Chaired Professor of Engineering,
Univ. of Southern California


Plenaries sponsored by:
2015 Conference Topic Areas
Extreme Ultraviolet (EUV) Lithography
Alternative Lithographic Technologies
Metrology, Inspection, and Process Control for Microlithography
Advances in Patterning Materials and Processes
Optical Microlithography
Design-Process-Technology Co-optimization for Manufacturability
Advanced Etch Technology for Nanopatterning
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The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.
Learn more on the Exhibition website

SPIE.TV: The latest advances in lithography

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Important Author Dates

Author Notification
24 October 2014

Manuscripts Due
26 January 2015

Registration Prices Increase
6 February 2015


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