San Jose Marriott and San Jose Convention Center San Jose,
United States 23 - 27 February 2014
The #1 event for the latest lithography, EUV, nanoimprint, DSA, and semiconductor research
SPIE Advanced Lithography, 23 - 27 February 2014, the premier conference for the lithography community. For 38 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.
My Year as SPIE President: What Does the Society Do and Who Makes It Happen?
William H. Arnold Chief Scientist and VP of Technology Development Center, ASML 2013 SPIE President
Making the Impossible: Dealing with Patterns Throughout the Design and Manufacturing Flow
Joseph Sawicki VP and GM, Design-to-Silicon Division, Mentor Graphics Corp.
Beyond Scaling: Opportunities and Approaches
Akihisa Sekiguchi Corporate VP and Deputy General Manager, Tokyo Electron Ltd.
Plenaries sponsored by:
The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 35 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.