• Advanced Lithography 2016
    For Authors/Presenters
    For Chairs/Committees
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San Jose Marriott and San Jose Convention Center
San Jose, CA , United States
21 - 25 February 2016
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SPIE Advanced Lithography Call for Papers

Call for Papers for SPIE Advanced Lithography in San Jose, California, USA

Present and publish at SPIE Advanced Lithography 2016, the world's premier semiconductor lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

Call for Papers is open online. Submit your abstract by 8 September.

Call for Papers (1 MB PDF)

Conference topics for semiconductor lithography

Click on the 2016 topics below to submit your paper:
Extreme Ultraviolet (EUV) Lithography
Alternative Lithographic Technologies
Metrology, Inspection, and Process Control for Microlithography
Advances in Patterning Materials and Processes
Optical Microlithography
Design-Process-Technology Co-optimization for Manufacturability
Advanced Etch Technology for Nanopatterning

Doug Resnick of Canon Nanotechnologies

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Accepted Papers
If accepted, your research will be published in the SPIE Digital Library

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Present at SPIE Advanced Lithography
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We welcome your participation.


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Important Author Dates

Abstracts Due Date
Late Submissions may be accepted by the conference chairs. Please send your submission directly to Pat Wight at patw@spie.org

Author Notification
22 October 2015

Manuscripts Due
25 January 2016


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