SPIE Advanced Lithography

The final program and technical abstracts are now available for SPIE Advanced Lithography 2012, the world's premier semiconductor lithography conference and exhibition.

Read a new preview from the chairs from SPIE Professional magazine.

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PROGRAM INFORMATION
•	View Final Program (PDF)
•	View Technical Abstracts

More than 600 presentations highlighting the latest research

•	NEW: Advanced Etch Technology for Nanopatterning
•	Extreme Ultraviolet (EUV) Lithography
•	Alternative Lithographic Technologies
•	Metrology, Inspection, and Process Control for Microlithography
•	Advances in Resist Materials and Processing Technology
•	Optical Microlithography
•	Design for Manufacturability through Design-Process Integration

PLENARY PRESENTATIONS
	Jim Clifford Vice President and GM, CDMA Technologies (USA) The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography
	C. Grant Willson Professor of Chemical Engineering, University of Texas at Austin (USA) High-Resolution Patterning: A View of the Future
	Christopher J. Progler Chief Technology Officer, Photronics Inc. (USA) Squares Do Not Make Good Frisbees
Plenaries sponsored by:

THE ADVANCED LITHOGRAPHY EXHIBITION
Don't miss this highly regarded exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.
•	Learn more on the Exhibition website
•	Interested in exhibiting? View the Exhibit Prospectus (PDF)
•	Become an Exhibitor: View 2012 Exhibitor Contract (PDF)

Register today for SPIE Advanced Lithography | EUV, Optical, Resists, Patterning, Metrology, Imprint

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Register today for SPIE Advanced Lithography | EUV, Optical, Resists, Patterning, Metrology, Imprint

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