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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Optical lithography, resists, metrology, EUV, immersion, and more at SPIE Advanced Lithography

Lisa Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc. delivers her Plenary Presentation at the 2009 meeting.


Plan to attend the most important event in semiconductor lithography.

Save $100 over onsite pricing
if you register by 5 February 2010
One registration fee gives you access to:
 •The Conference Program, featuring over 600 papers from the world's top researchers. Download a printable Conference Program (PDF).
 •Plenary Presentations presented by the industry's leaders
 •Poster Receptions offering refreshments and one-to-one interaction with authors
 •Numerous evening panel discussions and debates
 •The Exhibition, where leading companies display their latest products
 •Printed or CD-ROM conference proceedings
 •Daily breakfast breads and coffee breaks
 •Lunches and dessert snacks


Conference topics:
EUV—sources, components, yields, resists, modeling
Alternative Technologies—maskless, nano-imprint, directed self-assembly
Optical lithography—computational, double patterning, SMO, OPC, RET
Metrology, inspection, process control, LER/LWR, mask litho, DBM
Resists materials and processing, double patterning, immersion, LER
DFM/DPI—co-optimization, layout, electrical, methodologies

Plenary Speakers:

Kazuo Ushida
President
Precision Equipment Co.
Nikon Corp.

Eric Chen
Managing Director
Silver Lake Partners

Sam Sivakumar
Director of Lithography
Portland Technology Development Group
Intel Corp.
Other program information:
 •21 Courses, taught by hand-picked instructors, cover basic through advanced topics
 •See the current list of Authors, chairs, and presenters, including details of their conference participation


Why do your colleagues return to SPIE Advanced Lithography year after year?
 •98% say that the technical topics are timely and relevant
 •93% say they found valuable opportunities to connect with colleagues
 •96% would recommend the event to a colleague
 •94% received valuable information they can apply in their work
-Survey of 2009 attendees


Interested in exhibiting?
 •View the list of exhibitors
 •Download the Exhibitor Contract
 •Find an ideal location on the exhibition floor plan
 •View all the details online at SPIE Advanced Lithography Exhibition


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Important Author Dates

Post-Deadline Submissions
Late abstract submissions may be accepted, subject to chair approval

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

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