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21 - 25 February 2010 San Jose Convention Center San Jose,
California,
USA |
Optical lithography, resists, metrology, EUV, immersion, and more at SPIE Advanced Lithography
Plan to attend the most important event in semiconductor lithography.| One registration fee gives you access to: | | • | The Conference Program, featuring over 600 papers from the world's top researchers. Download a printable Conference Program (PDF). | | • | Plenary Presentations presented by the industry's leaders | | • | Poster Receptions offering refreshments and one-to-one interaction with authors | | • | Numerous evening panel discussions and debates | | • | The Exhibition, where leading companies display their latest products | | • | Printed or CD-ROM conference proceedings | | • | Daily breakfast breads and coffee breaks | | • | Lunches and dessert snacks |
Conference topics:| • | EUV—sources, components, yields, resists, modeling | | • | Alternative Technologies—maskless, nano-imprint, directed self-assembly | | • | Optical lithography—computational, double patterning, SMO, OPC, RET | | • | Metrology, inspection, process control, LER/LWR, mask litho, DBM | | • | Resists materials and processing, double patterning, immersion, LER | | • | DFM/DPI—co-optimization, layout, electrical, methodologies | Plenary Speakers: Kazuo Ushida President Precision Equipment Co. Nikon Corp. |  Eric Chen Managing Director Silver Lake Partners |  Sam Sivakumar Director of Lithography Portland Technology Development Group Intel Corp. | Other program information:| • | 21 Courses, taught by hand-picked instructors, cover basic through advanced topics | | • | See the current list of Authors, chairs, and presenters, including details of their conference participation |
Why do your colleagues return to SPIE Advanced Lithography year after year?| • | 98% say that the technical topics are timely and relevant | | • | 93% say they found valuable opportunities to connect with colleagues | | • | 96% would recommend the event to a colleague | | • | 94% received valuable information they can apply in their work | | -Survey of 2009 attendees |
Interested in exhibiting?Sponsor Cooperating Organization
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Symposium Chair
Christopher J. Progler, Photronics Inc.
Symposium Co-chair
Donis G. Flagello, Nikon Research Corp. of America
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