23 - 27 February 2014 San Jose Marriott and San Jose Convention Center San Jose,
California,
United States
Call for Papers | Abstracts are due 21 August
SPIE Advanced Lithography 2014—Participate at the premier conference for the lithography community. For 37 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.
Why authors present their work at SPIE Advanced Lithography:
“For anyone working in lithography it is exactly the correct audience.”
“The most important symposium on lithography.”
“Best forum to gain attention from industry decision-makers.”
Exhibition
SPIE Advanced Lithography Exhibition, 25-26 February 2014, is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.
Get the most ROI from your time in San Jose by presenting a paper in the conference room and exhibiting on the show floor.
•
Connect with the largest gathering of lithography experts in the world (2,300 attendees)
•
Get face-to-face interaction with potential customers from 5 days of presentations, courses, and special events
•
50 exhibiting companies in 2013
Become part of the world's largest collection of optics and photonics research papers.
Present at SPIE Advanced Lithography Dynamic | Diverse | Current | Collaborative
