• Advanced Lithography 2014
    Invitation
    Conferences
    Exhibition
    For Authors/Presenters
    For Chairs/Committees
    For Exhibitors
Print PageEmail Page
SPIE Advanced Lithography 23 - 27 February 2014
San Jose Marriott and San Jose Convention Center
San Jose, California, United States

Call for Papers | Abstracts are due 21 August

Call for Papers | SPIE Advanced Lithography 2014, the premier conference for the lithography community

SPIE Advanced Lithography 2014—Participate at the premier conference for the lithography community. For 37 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

Papers will be accepted in these areas
• Advanced Etch Technology for Nanopatterning
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Resist Materials and Processing Technology
• Optical Microlithography
• Design for Manufacturability through Design-Process Integration
Browse the Program Subscribe to Updates

Why authors present their work at SPIE Advanced Lithography:

“For anyone working in lithography it is exactly the correct audience.”
“The most important symposium on lithography.”
“Best forum to gain attention from industry decision-makers.”
Exhibition

SPIE Advanced Lithography Exhibition, 25-26 February 2014, is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.

Get the most ROI from your time in San Jose by presenting a paper in the conference room and exhibiting on the show floor.

 • Connect with the largest gathering of lithography experts in the world (2,300 attendees)
 • Get face-to-face interaction with potential customers from 5 days of presentations, courses, and special events
 • 50 exhibiting companies in 2013

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Advanced Lithography
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

SPIE.TV: The latest advances in lithography | Watch

Sponsor

SPIE logo
Search Open Calls
Enter keywords to find conferences with open calls for papers and submit an abstract.

Important Author Dates

Abstract Due Date 
21 August 2013

Author Notification
21 October 2013

Manuscripts Due
27 January 2014


Sign Up for Email Updates
Receive email updates on SPIE Advanced Lithography.