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SPIE Advanced Lithography 21 - 26 February 2010
San Jose Convention Center
San Jose, California, USA

Join your colleagues working on optical lithography, resists, metrology, EUV, immersion, and more

Lisa Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc. delivers her Plenary Presentation at the 2009 meeting.


Drive the technology roadmap by presenting and publishing your research at SPIE Advanced Lithography.

Submit your abstract and keep R+D moving forward

Abstract submissions are being accepted in: 
Optical Microlithography
EUV lithography
Advances in Resist Materials and Processing Technology
Metrology, Inspection, and Process Control
Alternative Lithographic Technologies
Design for Manufacturability through Design-process Integration
Download the Call for Papers (PDF).



Why do industry leaders return to SPIE Advanced Lithography year after year?

SPIE Advanced Lithography “is equivalent to the world championship of lithography”

“The proceedings are widely cited and you can gain visibility for your research efficiently and effectively”

SPIE Advanced Lithography is the "top event in this field".



Three reasons to present a paper this year:
 1. Increase your chances of securing approval and support to attend
 2. Keep your company visible at the industry's most important meeting
 3. Get published within 8 weeks of the meeting, with your paper available in SPIE Proceedings and Digital Library, and indexed worldwide in INSPEC, Ei Compendex, and other leading databases.
Submit your abstract and help define the technology roadmap



"If you don’t innovate during this downturn, the market will come back, but you won’t”
 -Bernard Meyerson
2009 Plenary Speaker
Vice President for Strategic Alliances and CTO
IBM Systems and Technology Group


Interested in exhibiting?
 •View the list of exhibitors
 •Download the Exhibitor Contract
 •Find an ideal location on the exhibition floorplan
 •View all the details online at SPIE Advanced Lithography Exhibition


2009 Meeting Highlights
The 2009 meeting concluded Friday 27 February.

See an overview of the 2009 meeting, or the 2009 Technical Program (PDF).

Read Onsite News from 2009, featuring program highlights and photos.




Sponsor

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Cooperating Organization

Search Open Calls
Enter keywords to find conferences with open calls for papers and submit an abstract.

Important Author Dates

Abstract Due:
10 August 2009

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

Conference + Exhibition Updates


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