SPIE Advanced Lithography: Intl Conference on Micro and Nanolithography

Courtesy of Georgia Tech. Photo by Gary Meek.

Drive the technology roadmap by presenting and publishing your research at SPIE Advanced Lithography. Increase your company's footprint, assure your attendance, and take the first step towards worldwide exposure through the SPIE Digital Library.

View the Call for Papers online
Download the Call for Papers (PDF)
View the Invitation from Chairs Donis Flagello (Nikon Research Corp. of America) and Harry Levinson (GLOBALFOUNDRIES Inc.)
Plenary presenters will include:

Luc Van den hove, President and CEO, IMEC (Belgium)
Dr. Shang-yi Chiang, Senior Vice-President of Research & Development, Taiwan Semiconductor Manufacturing Corp. (Taiwan)

Accepting papers on:

•	Optical Microlithography
•	EUV Lithography
•	Advances in Resist Materials and Processing Technology
•	Metrology, Inspection, and Process Control
•	Alternative Lithographic Technologies
•	Design for Manufacturability through Design-process Integration

Why did 2010 authors present their work at SPIE Advanced Lithography?

•	“For anyone working in lithography it is exactly the correct audience.”
•	“Good exposure, good audience, good publication.”
•	“The most important symposium on lithography.”
•	“Best forum to gain attention from industry decision-makers.”
•	“Exposure, collaboration, business.”
•	“It reminds our customers that we are a world-class innovation company.”

Interested in exhibiting?

•	Download the Exhibitor Contract
•	View the list of exhibitors

View 2010 program details:

•	Printable Final Program (PDF)
•	Conference Abstracts (PDF)

Present your work at the premier event in Optical Lithography, Resists, Metrology, EUV, Immersion, and More

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Cooperating Organization

Innovation Starts Here

Present your work at the premier event in Optical Lithography, Resists, Metrology, EUV, Immersion, and More

Sponsor

Cooperating Organization

Search Open Calls

Innovation Starts Here