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SPIE Advanced Lithography 21 - 26 February 2010
San Jose Convention Center
San Jose, California, USA

Driving the lithography industry forward

Showcase your company’s latest equipment, technology, and services to the leaders of the lithography industry. For 34 years SPIE Advanced Lithography has been the premier international conference that drives the future of lithography research and applications. It’s the one event all your target customers attend to present and hear the latest developments from around the world.

Download the Exhibition Prospectus (PDF)

Reserve your place today and put your company at the industry’s leading edge.

Key resources:
 •Exhibition Contract
 •Exhibition Sponsorship Contract
 •Exhibitor list
 •Exhibition floor plan
 •Product announcements
 •Exhibition sponsors



Exhibiting companies display technology related to all aspects of semiconductor production:
 •Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
 •Metrology, inspection, OPC, and process control
 •Electronic imaging components, equipment, and systems
 •Resist materials and processing
 •Nano-imprint
 •Design for Manufacturability/DPI
 •IC and chip fabrication/DPI

Exhibition Dates and Hours:
Tuesday 23 February
Wednesday 24 February
10:00 am to 5:00 pm
10:00 am to 4:00 pm



Contact the SPIE Sales Team:

In Germany, Austria, Luxembourg, Lichtenstein, Italy and Switzerland
Hermann Doster
Tel: +49 (0)7025/841 806
Fax: +49 (0)7025/842 983
hermann@spieeurope.org

For all other inquiries
Teresa Roles-Meier
Tel: +1 360 685 5445
Fax: +1 360 647 1445
teresar@spie.org



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