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12 - 16 February 2012
San Jose Convention Center and San Jose Marriott
San Jose,
California,
USA |
Free Lithography Exhibition | Come to the event for Semiconductor Suppliers, Integrators, and Manufacturers
COME TO THE EXHIBITION
The industry's top semiconductor suppliers, integrators, and manufacturers will be on hand for the annual SPIE Advanced Lithography exhibition. For 35 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.
Featured technologies include:
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NEW: Etch Technology for nanopatterning |
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Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET |
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Metrology, inspection, OPC, and process control |
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Design and manufacturing software |
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Materials and chemicals |
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Imaging equipment |
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Lasers |
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Resist materials and processing |
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Nano-imprint |
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IC and chip fabrication |
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Nanoscale imaging |
HOURS:
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| 10 a.m. to 5 p.m. Tuesday 14 February |
| 10 a.m. to 4 p.m. Wednesday 15 February |
BECOME AN EXHIBITOR, SPONSOR AN EVENT, OR ADVERTISE:
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In America, Asia, and rest of the world
Teresa Roles-Meier
Tel: +1 360 685 5445
Fax: +1 360 647 1445
teresar@spie.org
In Austria, Belgium, Germany, Italy, Liechtenstein, Luxembourg, Netherlands, and Switzerland
Hermann Doster
Tel: +49 (0)7025/841 806
Fax: +49 (0)7025/842 983
hermann@spieeurope.org
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