Dr. Chris Mack is the 2009 recipient of the Frits Zernike Award for Microlithography in recognition of his contributions to the development and dissemination of the well known Prolith suite of lithography simulation software and for his contributions to the underlying principles upon which it is based. The nomination is also made in recognition of his dedication and success as a teacher and author.
"Chris A. Mack developed the well known Prolith Software package that has enabled meaningful simulation work in both academic and development laboratories all over the world," said Dr. Grant Willson, a professor in the Department of Chemical Engineering at the University of Texas, "I think it is safe to say that everyone who has been actively involved in process development for the semiconductor industry has been influenced in some way by this software and the underlying principles upon which it is based.
An SPIE Fellow, Mack has been an integral part of SPIE Advanced Lithography symposia for many years, including instructing numerous short courses. He's also served as Chair for the Advanced Microlithography Technology conference at SPIE Photomask Asia in Beijing, China, and authored one of SPIE's popular Field Guide Series: Field Guide to Optical Lithography.
The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. An honorarium of $2,000 will be presented, sponsored by ASML and Cymer.
For more information on this year's recipient and past winners, visit http://spie.org/x3068.xml.
SPIE presents several yearly awards that recognize outstanding individual and team technical accomplishments and meritorious service to the Society. SPIE urges you to nominate a colleague for his or her outstanding achievements. Nominations may be made through October 1 of any given year and are considered active for three years from the submission date. Visit SPIE.org/x1164.xml for instructions and nomination forms.