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Marc Levenson honored with Frits Zernike Award for Microlithography

25 February 2010

Marc D. Levenson, BetaSights, Saratoga, California, USA, is the 2010 recipient of the Frits Zernike Award for Microlithography in recognition of one of the most important developments in lithography resolution enhancement of the last twenty years, the phase shifting mask.

Marc Levenson, through the pioneering development of phase shifting masks, laid the ground-work for the industry's efforts at wavefront engineering and resolution enhancement technology, said Chris Mack, Gentleman Scientist, "His seminal ideas have extended optical lithography to once unheard-of levels of resolution and enabled the cost-effective progression of Moore's law for the entire semiconductor industry."

Levenson is an SPIE Member. He has educated multiple generations of lithographers on methods of leverage optical principles in the design and delivery of resolution extension. Through short courses and an engaging interaction style, he has "Fourier-infused" the minds of many RET practitioners.

The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. An honorarium of $2,000 will be presented, sponsored by ASML and Cymer.

For more information on this year's recipient and past winners, visit http://spie.org/x3068.xml.

SPIE presents several yearly awards that recognize outstanding individual and team technical accomplishments and meritorious service to the Society. SPIE urges you to nominate a colleague for his or her outstanding achievements. Nominations may be made through October 1 of any given year and are considered active for three years from the submission date. Visit SPIE.org/x1164.xml for instructions and nomination forms.

SPIE the international society for optics and photonics was founded in 1955 to advance light-based technologies. Serving more than 188,000 constituents from 138 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific, and supports scholarships, grants, and other education programs around the world.