Marc D. Levenson, BetaSights, Saratoga, California, USA, is the 2010 recipient of the Frits Zernike Award for Microlithography in recognition of one of the most important developments in lithography resolution enhancement of the last twenty years, the phase shifting mask.
Marc Levenson, through the pioneering development of phase shifting masks, laid the ground-work for the industry's efforts at wavefront engineering and resolution enhancement technology, said Chris Mack, Gentleman Scientist, "His seminal ideas have extended optical lithography to once unheard-of levels of resolution and enabled the cost-effective progression of Moore's law for the entire semiconductor industry."
Levenson is an SPIE Member. He has educated multiple generations of lithographers on methods of leverage optical principles in the design and delivery of resolution extension. Through short courses and an engaging interaction style, he has "Fourier-infused" the minds of many RET practitioners.
The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. An honorarium of $2,000 will be presented, sponsored by ASML and Cymer.
For more information on this year's recipient and past winners, visit http://spie.org/x3068.xml.
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