Burn J. Lin, SPIE Fellow and editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), has been awarded the 2009 Cledo Brunetti award by the IEEE, the society has announced.
Lin is Senior Director of Micropatterning Division for TSMC, Ltd., of Taiwan. His award was made for contributions to immersion lithography for the manufacture of integrated circuit devices.
The Brunetti Award is presented by IEEE to recognize outstanding contributions to miniaturization in the electronics arts.
Lin has been very active in the SPIE Advanced Lithography event, having served as Symposium Chair, Conference Chair, and in many other roles, and in the SPIE Lithography Asia symposium launched this year as well as other SPIE events. He has published more than 90 papers in SPIE journals and proceedings.