• About the Society
  • SPIE Altruism
  • International Year of Light
  • Fellows and Senior Members
  • Awards Programs
  • Press Room
  • Press Releases
    SPIE Member News
    Event News
    Press Kits and Fact Sheets
    PR Contacts
    RSS Collection
    Social Media
    SPIE Logos and Name
    Press Registration
  • Public Policy
  • Related Organizations
  • Jobs at SPIE
 
Print PageEmail Page

Lin wins Brunetti Award

Burn Lin

Burn J. Lin, SPIE Fellow and editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), has been awarded the 2009 Cledo Brunetti award by the IEEE, the society has announced.

Lin is Senior Director of Micropatterning Division for TSMC, Ltd., of Taiwan. His award was made for contributions to immersion lithography for the manufacture of integrated circuit devices.

The Brunetti Award is presented by IEEE to recognize outstanding contributions to miniaturization in the electronics arts.

Lin has been very active in the SPIE Advanced Lithography event, having served as Symposium Chair, Conference Chair, and in many other roles, and in the SPIE Lithography Asia symposium launched this year as well as other SPIE events. He has published more than 90 papers in SPIE journals and proceedings.