SPIE Member Ravikiran Attota (National Institute of Standards and Technology [NIST]) is among those receiving the R&D 100 Award from R&D Magazine this year, in recognition of technologically significant products introduced into the marketplace over the past year.
Attota developed through-focus scanning optical microscopy (TSOM), a measurement and analysis method that transforms ubiquitous conventional optical microscopes into 3D metrology tools with nanometer scale lateral and vertical sensitivity and a wide scope of applicability. The method increases lateral and vertical measurement resolutions over optical microscopy by more than 100 and 1,000 times, respectively.
Attota has authored nearly 20 papers for SPIE conferences, and has published in the SPIE Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3). He will present on TSMO at SPIE Advanced Lithography in 2011.
Read more about the award in R&D Magazine.
Read Attota's NIST presentation on TSOM.