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SPIE Advanced Lithography 2016 news and photos

 All the latest: SPIE Advanced Lithography 2016

 

‘Good place to meet, see what’s new’

SPIE Advanced Lithography poster session

This year's SPIE Advanced Lithography, the semiconductor lithography industry's leading event, was a high-energy gathering of more than 2,200 researchers, developers, suppliers, and customers. Audiences packed the seven conference rooms all week to hear the latest about technology and industry plans, and three new courses were in this year's program. A two-day exhibition provided a chance for 55 exhibiting companies to showcase their new systems and devices, and conversation from confernce rooms to hallways to evening events -- including a new all-sympoisum welcome reception.

Poster sessions are popular at Advanced Lithography: “a good place to meet people and to see what’s new.” See more photos below.

 


SPIE Advanced Lithography plenary session
An attentive audience of more than 1,000 heard plenary talks on opening day of the conference.

Harry Levinson plenary: 'Periods of intense advancements'

Harry Levinson
Harry Levinson
Richard Gottscho
Richard Gottscho
Anthony Yen
Tony Yen

Monday's plenary session kicked off with a talk by Harry Levinson, Senior Director at GLOBALFOUNDRIES, who reviewed the history of multiple concentrations of activities in lithography. "Advancement doesn't happen at a uniform pace," he said. "Instead, we see periods of intense advancements."

Beginning with the early era of more practical lithographic solutions, like the invention of pellicles and reducing edge bead with beveled edges, Levinson took the audience on a journey through decades of development spurts reflected in the literature from this very conference. 

From the Fred Dill paper in the mid-'70s, to Alexander Starikov's 1989 serifs paper, Obert Wood's personal notes in 1992, and LaFontaine's 2008 demonstration of EUV, Levinson showed how successive concentrations of work on simulation and modeling, RET, OPC, lithography-design co-optimization, and EUV have characterized their times and built on preceding advances.

All of this prior experience, he explained, will be drawn upon as we move toward technologies where meso-molecular and molecular-level length scales are significant. Issues at the molecular scale, he said, will need to be addressed to realize the optical resolution "entitlement" of EUV lithography.

 

Richard Gottscho plenary: Minimizing process-induced variability

Richard Gottscho, Executive Vice President of Global Products at Lam Research Corp., followed up with a talk about minimizing the process-induced variability in multiple patterning. He extolled the benefits of plasma deposition and etching, including anisotropic etching, much smoother sidewalls, thinner lines, and much smaller via holes.

But plasma processing does create problems, he said, requiring a new process, atomic layer processing, that he called the penultimate solution to variability reduction -- "penultimate" because much work still needs to be done.

 

Anthony Yen plenary: EUV moving to the mainstream

The plenary session closed with an often humorous talk on EUV lithography by Tony Yen, Director of the Nanopatterning Technology Infrastructure Division of TSMC.

Calling EUV lithography a 30-year endeavor to uphold Moore's Law, Yen harkened back to the 1986 Victor Pol paper that described the first 248-nm wafer stepper and described the work by the three groups that independently came up with the EUVL idea: Kinoshita at NTT, Silvast and Wood at Bell Labs, and Hawryluk et al. at LLNL (as well as giving credit to a notable Russian theoretical study around the same time).

While it is extremely difficult to unseat the existing technology of optical lithography, Yen said, belief in the EUV vision has required these pioneers to stick to that belief against complacency, prejudice, and mockery. Yen showed how substantial progress has been made in recent years in EUV source power, power maintenance, pellicle development, and resist sensitivity that will help this community make EUVL develop into a solution for high-volume manufacturing.

 

SPIE Advanced Lithography 2016 plenary Q-and-A
Audience members including Chris Mack had questions for plenary speakers in the week's first
technical session. (Read Mack's blog posts on for his commentary on the event and the industry.)
SPIE Advanced Lithography 2016 plenary session SPIE Advanced Lithography 2016 plenary session

 


Congratulations! SPIE awards recognize important contributions

Symposium Chair Mircea Dusa of ASML and Symposium Cochair Bruce Smith of the  Rochester Institute of Technology open the conference with a welcome and presentation of awards for outstanding achievements.

Bruce Smith, Bill Arnold, Harry Levinson, Mircea Dusa Bruce Smith, Yan Borodovsky, Mircea Dusa
Bill Arnold (ASML) and Harry Levinson
(GLOBALFOUNDRIES) were recognized with
the Advanced Lithography 2016 Special Award
for their work in the critical parameter
of submicron lithography: focus.
Yan Borodovsky (Intel [Rtd.]) was presented
with the 13th Frits Zernike Award for
Advances in Optical Microlithography.
The award is sponsored by ASML.
Bruce Smith, Andreas Erdmann, Mircea Dusa Bruce Smith, Mircea Dusa
New Fellow of SPIE Andreas Erdmann
(Fraunhofer
IISB) was presented with a
Fellow's plaque and pin
.
Dusa, who is stepping down as symposium chair
after this week, was honored for his
contributions. Will Conley (Cymer) will
join Smith in leading the symposium.

 


Break time: tea coffee, and conversation

SPIE Advanced Lithography 2016 coffee break SPIE Advanced Lithography 2016 coffee break
SPIE Advanced Lithography 2016 coffee break SPIE Advanced Lithography 2016 coffee break
SPIE Advanced Lithography 2016 coffee break SPIE Advanced Lithography 2016 coffee break
SPIE Advanced Lithography 2016 coffee break SPIE Advanced Lithography 2016 coffee break

 


Honors for outstanding papers

2016 C. Grant Willson Award Hiroshi Ito Memorial Award
Accepting the C. Grant Willson Award:
Michael Cocsis and Andrew Grenville (Inpria),
Danilo De Simone and Geert
Vandenberghe
(IMEC), Ben Clark (Inpria)
Accepting the Hiroshi Ito Memorial Award:
Arjun Singh, Roel Gronheid (both IMEC)
2016 Jeffrey Byers Memorial Award
Accepting the Jeffrey Byers Memorial Award:
Kensuke Matsuzawa, Ryan Mesch, Grant
Willson
(all University of Texas
at Austin)

Conference chair Christoph Hohle (Fraunhofer IPMS) and cochair Todd Younkin (Intel) [at far left and far right, above and at right] presented three awards Monday morning at the start of the conference on Advances in Patterning Materials and Processes (9779).

  • Authors from Inpria and IMEC were awarded the 2015 C. Grant Willson Best Paper Award, for "Integrated fab process for metal oxide EUV photo resist" (9425-29).The award is sponsored by IBM.
  • Authors from the University of Texas at Austin and Pennsylvania State University were awarded the 2015 Jeffrey Byers Memorial Best Poster Award, for "Aromatizing unzipping polyester for EUV photoresist" (9425-64). The award is sponsored by Tokyo Electron Limited.
  • Authors from IMEC, Tokyo Electron Europe, and EMD Performance Materials were awarded the 2015 Hiroshi Ito Memorial Best Student Paper Award, for "Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns" (9425-34). The award is sponsored by IBM.

 

Diana Nyyssonen Memorial Award Karel Urbanek Award
Accepting the Diana Nyyssonen Memorial
Award:
Narender Rana (IBM)
Accepting the Karel Urbanek Award:
Maria Laura Gödecke (Universität Stuttgart)

Conference chair Martha Sanchez (IBM Research Almaden) and cochair Vladimir Ukraintsev (Qorvo) [at far left and far right above] presented the first of two awards to be given this week on Monday (at left) at the start of the conference on Metrology, Inspection, and Process Control for Microlithography (9778), and the second on Thursday (at right) for a paper presented at this year's event.

  • The Diana Nyyssonen Memorial Award for the Best Paper at SPIE conference Metrology, Inspection, and Process Control for Microlithography XXIX was presented for the paper 9424-54, "Machine Learning and Predictive Data Analytics Enabling Metrology and Process Control in IC," authored by Narender Rana, Yunlin Zhang, Donald Wall, Bachir Dirahoui, and Todd C. Bailey; IBM Corp. (United States). The Diana Nyyssonen Memorial Award is sponsored by Hitachi High Technologies America.
  • The Karel Urbánek Best Student Paper Award at SPIE conference Metrology, Inspection, and Process Control for Microlithography XXX was presented to student Maria Laura Gödecke for the paper 9778-16, "Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry." She co-authored with Sandy Peterhänsel, Karsten Frenner, and Wolfgang Osten of Universität Stuttgart, Germany. The Karel Urbánek Best Student Paper Award is sponsored by KLA-Tencor.

 

Cymer Microlithography Award Franco Cerrina Memorial Award
Accepting the Cymer Microlithography
Award:
Andrew Burbine (Mentor Graphics)
Accepting the Franco Cerrina Memorial
Award:
Yibo Lin (University of Texas at Austin)

Conference chair Andreas Erdmann (Fraunhofer IISB) and Will Conley (Cymer) [above left; far right and far left] presented an award for a paper this year in the conference on Optical Microlithography (9780).

  • Authors from Mentor Graphics and Rochester Institute of Technology were awarded the 2016 Best Student Paper Award in Microlithography, for "Bayesian inference for OPC modeling" (9780-17). The award is sponsored by Cymer.

Conference chair Luigi Capodieci (KnotPrice) [above right; at left] presented an award for a paper this year in the conference on Design-Process-Technology Co-optimization for Manufacturability (9781).

  • Authors from the University of Texas at Austin and the Chinese University of Hong Kong were awarded the 2016 Franco Cerrina Memorial Best Student Paper Award, for "Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding " (9781-22).

 


Welcome to all!

SPIE litho welcome reception

SPIE Litho attendees enjoyed a welcome reception on Monday evening, with tables of food, plenty to drink, and excellent patio weather.

SPIE Advanced Lithography welcome reception SPIE Advanced Lithography welcome reception
SPIE Advanced Lithography welcome reception SPIE Advanced Lithography welcome reception
SPIE Advanced Lithography welcome reception SPIE Advanced Lithography welcome reception

SPIE Advanced Lithography welcome reception

 


What's the industry's latest? Check out the exhibition

Exhibitors had a busy opening on Tuesday talking with visitors about new applications.

SPIE Advanced Lithography exhibition

SPIE Advanced Lithography exhibition SPIE Advanced Lithography exhibition
SPIE Advanced Lithography exhibition SPIE Advanced Lithography exhibition
SPIE Advanced Lithography exhibition SPIE Advanced Lithography exhibition

SPIE Advanced Lithography exhibition

 


Technical talks fill the rooms

Characteristically large audiences filled the conference rooms throughout the week to hear papers on seven topics. A small sampling included:

Martin van den Brink of ASML opened the conference on Metrology, Inpsection, and Process Control with a keynote talk, "Holistic lithography and metrology's importance in driving patterning fidelity" (9778-1).

Jelena Vuckovic of Stanford University presented a keynote talk (9780-2) Tuesday morning on her lab's work in design of on-chip photonics.

With a computationally efficient design algorithm for nanophotonic structures, they are able to create space-saving, energy-efficient photonic chips using lithographic techniques. "They are like nothing you've ever seen," she said, emphasizing that by taking advantage of parameters that are not being used, objective-first design forces the design objective to always be met.

Vuckovic showed examples of computer-designed nanophotonic resonators and waveguide couplers.​

Stephen Sirard, Lam Research Corp. "Interactions between plasma and block copolymers used in directed self-assembly patterning" (9782-19) Tuesday afternoon.

The conference on Advances in Patterning Materials and Processes (9779) opened with a dedication to Arnošt Reiser, who died in August 2015 at the age of 95. Reiser, who survived Auschwitz and escaped with his wife and young children from Czechoslovakia, was renowned for his seminal work in photoresists. Rudolf Zahradník, past president of the Czech Academy of Sciences to said of Reiser that "his character was made of a single crystal of the best material."

Martin van den Brink Jelena Vukovich, Stanford University Stephen Sirad, Lam Research
Martin van den Brink Jelena Vuckovic Stephen Sirad

 


Visions on the molecular scale

Nano in Micro panel

Panelists in a session Monday evening on Nanotechnology in Microlithography: Approaching the Molecular Scale described current status and envisioned future options for metrology for features under 7 nanometers.

After several vendors spoke about methods to move scale of analysis from device structures to molecular or atomic structures, Zhiyong Ma, Vice President of Intel's Technology and Manufacturing Group, pointed out that metrology research and development is lagging behind industry need. He noted that "design for metrology" is increasingly important and anything that improves yield is critical, regardless of technique.

Panelists discussed the difficulty of distinguishing differences in shapes and other characteristics at <7nm. Common themes includes comparing and modeling analytical methods, such as predictive metrology and the need for "hybrid" inter-technique comparisons, using and combining parameters measured by different tools. While promising, hybrid metrology also creates difficulty in modeling vastly different physical characteristics using tools from different suppliers.

Panelists were (from left above) Heath Pois (Revera), Narenda Rana (HGST), Zhiyong Ma (Intel), Jason Osborne (Bruker), John Allgair (Metrologist/Program Mgr), Pablo Rovira (KLA-Tencor), and John Villarrubia (NIST).

Moderators were Bryan Barnes and Richard Silver of NIST.

 


Metrology looks forward, at 30 years

Metrology at 30 panel session chair Ofer Adan Metrology at 30 panel session

Session chair Ofer Adan of Applied Materials (above left) offered the audience celebrating the 30th anniversary of the conference on Metrology, Inspection, and Process Control Tuesday evening a chance to test their knowledge of the field -- and a flute of champagne or cider at the door to the session.

Over bubbly and hors d'oeuvres, attendees tapped into a survey app that shared their responses on the big screen. Questions started out with "one word to describe yourself" and affiliations (more suppliers than buyers responded), and proceeded to moments and milestones in the history of the field.

Panelists (from left below) Chris Mack, Bryan Rice of GLOBALFOUNDRIES, Chih-Ming Ke of TSMC, and Tania Levin of APC each gave a vision of the future, and Adan's follow-up questions -- answered via the app -- kept the discussion interactive.

Metrology at 30 years panel 

 


Poster sessions: 'meet people, see what's new'

Poster sessions are popular at Advanced Lithography, for good reason. In the words of one attendee, the sessions provide "a good place to meet people and to see what's new." Attendees indulged in much of both in poster sessions on Tuesday and Wednesday evenings.

SPIE Advanced Lithography poster session SPIE Advanced Lithography poster session
SPIE Advanced Lithography poster session SPIE Advanced Lithography poster session

 


All photos © SPIE, the international society for optics and photonics, except where noted.

SPIE Advanced Lithography

21-25 February 2016
San Jose, California, USA

 


Click below or browse at left:

Harry Levinson plenary: 'Periods of intense advancements'

Richard Gottscho plenary: Minimizing process-induced variability

Anthony Yen plenary: EUV moving to the mainstream

Congratulations! SPIE awards recognize important contributions

Break time: tea, coffee, and conversation

Honors for outstanding papers

Welcome to all!

What's the industry's latest? Check out the exhibition

Technical talks fill the rooms

Visions on the molecular scale

Metrology looks forward, at 30 years

Poster sessions: 'meet people, see what's new'

 


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