BELLINGHAM, WA, USA - 14 November 2008 - The turnout for the just completed inaugural SPIE Lithography Asia symposium was outstanding, states Conference Cochair and SPIE Fellow, Anthony Yen. "Engineers were very interested in hearing from their US, European, and other Asian colleagues reporting on their progress in various aspects of lithography, and the supplier community also showed great support to this conference."
Featuring presentations from leading researchers, developers, and innovators, SPIE Lithography Asia, held 4-6 November in Taipei, Taiwan, provided the opportunity to hear the latest research and connect with others working at the leading edge of semiconductor device and flat panel display (FPD) technologies.
Taiwan is one of the leading and fastest growing international centers for semiconductor research and manufacturing. This conference was intended to stimulate a face-to-face exchange of the latest developments of microlithography techniques used in the current and future electronics manufacturing process.
Conference Cochairs Alek C. Chen, ASML Taiwan Ltd.; Burn Lin, Taiwan Semiconductor Manufacturing Co. Ltd. and Anthony Yen, Taiwan Semiconductor Manufacturing Co. introduced conference topics, including:
- Emerging Lithographic Technology and Nanofabrication
- Optical Microlithography
- Advances in Resist Material and Processing
- Metrology, Inspection, and Process Control
- LCD Application
SPIE Fellow William Arnold, ASML US, Inc. presented his industry overviews and visions at a well-attended plenary talk titled, "Old and new solutions in high resolution lithography for semiconductor fabrication."
"For years, volume manufacturing for many types of integrated circuits has been shifting to Asia. This inaugural meeting in the key field driving semiconductor shrink rate and performance, and lithography, brings the scientists and engineers from around the world, but especially Korea, Japan, and Taiwan together to share their latest results," stated Arnold.
The conference ended with the presentation of the Best Student Paper Awards, presented by Alek Chen (ASML) and Nigel Farrar (Cymer)). Each winner received a $1,500 check from one of the two sponsors, ASML and Cymer.
SPIE is the international optics and photonics society founded in 1955 to advance light-based technologies. Serving the interests of its more than 188,000 active constituents representing 138 different countries, SPIE acts as a catalyst for collaboration among technical disciplines for information exchange, continuing education, publishing opportunities, patent precedent, and career and professional growth. As the organizer and sponsor of approximately 25 major conferences and education programs annually in North America, Europe, Asia, and the South Pacific, SPIE provides publishing, speaking, and learning opportunities on emerging technologies. SPIE contributes more than $1.6 million annually in scholarships, grants, and other programs supporting research and education around the world. For more information, visit SPIE.org