Bellingham, Wash-May 17, 2007-SPIE is awarding $231,500 in scholarships to 136 outstanding individuals, based on their potential for long-range contribution to optics and photonics, or a related discipline. Since 1986, SPIE has distributed over $2 million dollars in individual scholarships to a total of 1,019 students across 60 countries. This ambitious effort reflects the Society's commitment to education and to the next generation of optical scientists and engineers around the world.
Amit Kumar Agrawal, Univ. of Utah (USA) received the $11,000 D.J. Lovell Scholarship, the Society's most prestigious scholarship. This scholarship is sponsored by SPIE with contributions from Labsphere, Inc.
Agrawal cites travel support as a major incentive in applying for an SPIE Scholarship. "The multidisciplinary nature of my research requires that the work be disseminated across audiences from various disciplines," says Agrawal, "The limited amount of travel money available through research grants severely limits my attendance at meetings. This scholarship will ease these financial limitations, and allow me the educational benefits of discussing my work with researchers from other fields, and learning from them will be invaluable."
Other 2007 scholarship winners include:
The 2ndBeau A. Standish, Univ. of Toronto (Canada),
Laser Technology, Engineering and Applications Scholarship: Carlos López-Mariscal Tec de Monterrey (Mexico)Laser Technology, Engineering and Applications Scholarship is awarded in recognition of the student's scholarly achievement in Laser Technology, Engineering, or Applications. Funds are provided in part by a gift from the former Forum for Military Applications of Directed Energy (F-MADE), and in part by SPIE.
William H. Price Scholarship in Optical Engineering: Garam Yun, Univ. of Arizona (USA) The $3,000 William H. Price Scholarship in Optical Engineering was established in 1985 to honor Bill Price, a well-respected member of SPIE's technical community. This scholarship is awarded to a full-time graduate or undergraduate student in the field of optical design and engineering.
BACUS Photomask Scholarship: Two BACUS Photomask Scholarships were awarded this year. $2,500 was awarded to Chris Clifford, Univ. of California, Berkeley (USA)Nikolay Makarov. The BACUS Photomask Scholarships are awarded to a full-time undergraduate or graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.
A complete list of winners can be viewed at http://www.spie.org/x1737.xml
SPIE is an international society advancing an interdisciplinary approach to the science and application of light. SPIE organizes events including the SPIE Defense & Security Symposium, SPIE Advanced Lithography, SPIE Photonics West, Photomask, OptiFab, SPIE Optics & Photonics, SPIE Optics East, SPIE Europe, Photonics Europe, and many other international events. SPIE also publishes journals, books and conference proceedings, with over 235,000 technical papers available for download via the SPIE Digital Library and 20,000 added annually. See SPIE.org for details.