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SPIE Photomask will explore emerging and on-going issues facing the photomask industry

01 September 2009

BELLINGHAM, WA, USA - The photomask industry will meet in Monterey, CA, this month to explore its challenges and opportunities. The SPIE Photomask Technology symposium, sponsored annually by SPIE and BACUS, will provide a forum for reports on the latest research and emerging and on-going issues in mask design, integration, tools, and business issues. The event will be held 14-17 September at the Monterey Marriott and Monterey Conference Center. BACUS is SPIE's international technical group for photomask technology.

Michael Polcari, President and CEO of SEMATECH, Inc., will open the technical program with a keynote talk on global collaboration in semiconductors and strategies for the mask industry. He will call for "increased industry collaboration to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet) lithography." Polcari is responsible for leading the consortium's advanced technology R&D programs in lithography, front end processes, interconnect, and metrology.

This year's conference will also for the first time feature sessions addressing the technical challenges of the application of Nano-imprint (NIL) technology for HDD (Patterned Media) manufacture. Presentations will discuss cost-of-ownership, lithography, and defect challenges.

In addition to technical presentations and a professional development program, the event includes an exhibition featuring the industry's top manufacturers and designers. The exhibition is open to registrants for no additional fee.

"In tough economic times like today it is more important than ever to maintain a network with your customers and peers," said Wolfgang Staud with Applied Materials, Inc. "SPIE's exhibition at Photomask Technology in Monterey provides an excellent and intimate forum for these close contacts."

This year's conference chairs are Larry S. Zurbrick of Agilent Technologies, Inc., and M. Warren Montgomery, with the College of NanoScale Science and Engineering (CNSE) and SEMATECH Inc.

Conference proceedings papers will be published online in the SPIE Digital Library beginning immediately as approved after the meeting. For more information about the SPIE Digital Library, visit spie.org/x2836.xml, or access the library at spiedl.org.

For more information about SPIE Photomask Technology, see spie.org/photomask.xml.

SPIE is the international society for optics and photonics, founded in 1955 to advance light-based technologies. Serving more than 188,000 constituents from 138 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific. In 2008, the Society provided $1.9 million in support of scholarships, grants, and other education programs around the world. For more information, visit SPIE.org.


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Stacey Crockett
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+1 360 685 5458
staceyc@spie.org