BELLINGHAM, Washington, USA - Barry Hopkins, CEO of RAVE LLC, was recently awarded the 2009 Bacus Lifetime Achievement Award at the 2009 Photomask Technology symposium, sponsored annually by SPIE and BACUS, in Monterey, California.
Hopkins helped found RAVE, with the idea of using the Atomic Force Microscope (AFM) in a revolutionary new nanomachining approach for repairing extremely small defects on advanced critical level photomasks.
In 2010 Hopkins will celebrate 47 years in the semiconductor industry with 40 of those years dedicated directly to the photomask industry.
"Those 40 years have been committed to every aspect of the mask making sciences, captive and commercial mask business development and eventually mask equipment technology," the award citation states. "Just when it was needed, Barry's vision and perseverance in the mask repair equipment arena provided a yield improvement pathway and tremendous cost saving advantage to advanced mask makers around the world."
Hopkins is an SPIE Member and has participated in numerous SPIE conferences.
For more information about SPIE Photomask Technology, see spie.org/photomask.xml
BACUS is SPIE's international technical group for photomask technology.
SPIE is the International Society for Optics and Photonics, founded in 1955 to advance light-based technologies. Serving more than 188,000 constituents from 138 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific, and supports scholarships, grants, and other education programs around the world. For more information, visit SPIE.org
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SPIE Media Relations Coordinator