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SPIE Photomask will explore issues of the deep sub-wavelength era

SPIE Photomask Technologies

BELLINGHAM, WA, USA - 23 September 2008 - The deep sub-wavelength era has arrived, and world leaders in the photomask industry will meet in Monterey, CA, next month to explore its challenges and opportunities. The SPIE Photomask Technology symposium, sponsored annually by SPIE and BACUS, will provide a forum for reports on the latest research and emerging and on-going issues in advanced lithography, as well as manufacturing and data solutions. The event will be held 6-10 October at the Monterey Marriott and Monterey Conference Center. BACUS is SPIE's international technical group for photomask technology,

In addition to technical presentations and a professional development program, the event includes an exhibition featuring the industry's top manufacturers and designers. The exhibition is open to registrants for no additional fee.

Aart J. de Geus, Chairman and CEO of Synopsys, Inc., will open the technical program with a keynote talk. Since co-founding Synopsys in 1986, de Geus has expanded the company from aAart J. de Geus of Synopsys will be the SPIE Photomask keynote speaker. start-up synthesis enterprise to a world leader in software and IP for semiconductor design and manufacturing.

A special session presenting an overview of the key issues facing the industry will focus on mask infrastructure challenges at the 32-nm node and beyond for the mask industry and its suppliers. This session will address a wide range of technical issues, development barriers, and potential roadblocks facing the mask industry. Talks will be given by mask makers, device manufacturers, and researchers engaged in state-of-the-art technology development and R&D.

Conference chairs are Hiroichi Kawahira of Sony Corp. and Larry S. Zurbrick of Agilent Technologies, Inc.

Conference proceedings papers will be published online in the SPIE Digital Library beginning immediately as approved after the meeting. For more information about the SPIE Digital Library, visit spie.org/x2836.xml or access the library at spiedl.org.

Best paper and best poster awards will be announced during the conference banquet. The banquet speaker will be Master Sommelier Eddie Osterland, America's first Master Sommelier and author of Wine and the Bottom Line.

For more information about SPIE Photomask Technology, see spie.org/photomask.xml.

BACUS scholarships increase

After increasing annual scholarships from one to two in 2007, BACUS is making two additional honorary awards in 2008, made possible through donations made by Brian Grenon, current BACUS President, and John Bossung, last year's Lifetime Achievement Award winner.

Eric Chin, a PhD candidate in the Department of Electrical Engineering and Computer Science at the University of California, Berkeley, and Peng Yu, a PhD candidate in the Department of Electrical and Computer Engineering at the University of Texas at Austin, have been awarded the BACUS Photomask Scholarships. Awards are made to full-time undergraduate or graduate students in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies.

Yu and Chin each will receive a $2,000 scholarship. Both have several publications with SPIE, and are SPIE Student Members.

The two $1000 one-time honorary awards were sponsored through donations to BACUS. Winners are Christine Lee, a high-school graduate of Peddie School in Highstown, NJ, and Huda Tanvir, a PhD student at City University, London.

Since the program's inception in 1978, the SPIE Scholarship Committee has made two types of awards: scholarships to high school, undergraduate, and graduate students in support of research, tuition, and related expenses, and grants to educational institutions for academic use and for student travel to SPIE technical meetings. SPIE has distributed more than $3,000,000 in scholarship and grant awards through these programs.

Photo caption: Aart J. de Geus of Synopsys will be the SPIE Photomask keynote speaker.