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Thin film laser resistance competition to advance state of the art at SPIE Laser Damage Symposium

03 September 2009

BELLINGHAM, WA, USA - Results of a thin film laser damage competition at the SPIE Laser Damage Symposium (formerly Boulder Damage) this month will provide perspective on how the industry is doing with the development of high laser resistance coatings.

The annual event is marking its 41st year in 2009, and will be held 21-23 September at the National Institute of Standards and Technology facility in Boulder, CO, USA.

Conference Co-Chair Christopher Stolz of Lawrence Livermore National Lab will give a summary talk on the results of tests on 25 submitted thin film mirror coatings for femtosecond laser damage. The samples, from companies and institutes in China, Germany, Japan, and the United States, are being tested according the ISO 11254-2 measurement protocol by Laser Zentrum Hannover e.V. in Germany with a 180 fs laser at a wavelength of 786 nm.

Femtosecond lasers are critical for fast igniters, ultrafast diagnostics, and laser machining. This damage test competition will be a good opportunity to determine current capabilities within the thin film community in this growth area. Participants will also be providing information on coating materials, deposition technologies, and layer counts. A double-blind test assures sample and submitter anonymity. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results also will be shared in Stolz's summary talk.

The Laser Damage Symposium is the leading forum for the exchange of information on the physics and technology of materials for high-power, high-energy lasers. The program features invited talks as well as poster and oral presentations by experts from around the world. For more information about the event, see spie.org/laser-damage.xml


The series of conference proceedings has grown to be a comprehensive source of information on optics for lasers and includes topics on materials and thin film preparation, durability, properties modeling, testing, and component fabrication. Papers from this year's conference will be published online in the SPIE Digital Library beginning immediately as approved after the meeting. For more information about the SPIE Digital Library, visit spie.org/x2836.xml, or access the library at spiedl.org/.


About SPIE
SPIE is an international optics and photonics society founded in 1955 advancing light-based technologies. Serving the interests of its more than 188,000 active constituents representing 138 different countries, SPIE acts as a catalyst for collaboration among technical disciplines for information exchange, continuing education, publishing opportunities, patent precedent, and career and professional growth. As the organizer and sponsor of approximately 25 major conferences and education programs annually in North America, Europe, Asia, and the South Pacific, SPIE provides publishing, speaking, and learning opportunities on emerging technologies. For more information, visit SPIE.org.



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