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SPIE Optical Metrology has solutions for design, modelling and inspection

04 March 2011

SPIE Optical Metrology

CARDIFF, Wales, UK -- New research in optical measurement technologies enabling applications in industry, research modelling, inspection of nanostructures and artwork, and related topics will be presented at SPIE Optical Metrology 23-26 May 2011 in Munich.

SPIE Optical Metrology is the premier conference in Europe for scientists, engineers, researchers, and applications or product developers engaged in optical metrology, optical measurement systems, and optics for arts, architecture, and archaeology.

Technical sessions offer solutions to problems in industrial design and production engineering, optical technologies to preserve cultural heritage sites and artefacts, and optical principles of measurement and testing in the micro- and nanoscales.

The event is sponsored by SPIE, the international society for optics and photonics, with Cooperating Organisations EOS (European Optical Society) and WLT (German Scientific Laser Society/Wissenschaftliche Gesellschaft Lasertechnik).

Optical Metrology will be held as part of the biennial Laser World of Photonics Congress along with other conferences organised by WLT, EOS, OSA (Optical Society), IEEE Photonics Society and EPS (European Physical Society).

A joint session on Measurements of Optical Components and Systems has been organised between the EOS conference on Testing for Fabrication and Assembly, a sub-conference of Manufacturing of Optical Components, and the SPIE conference on Optical Measurement Systems for Industrial Inspection.

Papers will include invited talks by Gunther Notni (Fraunhofer-Institut für Angewandte Optik und Feinmechanik) on challenges in shape measurements of optical freeform surfaces, and by Michael Schulz (Physikalisch-Technische Bundesanstalt) on error influences in optical interferometry.

The Optical Metrology conference plenary talk by Mitsuo Takeda (Univ. of Electro-Communications) will cover coherence holography including new work in the spatial frequency comb for dispersion-free optical coherence tomography and profilometry.

Symposium Chairs are Wolfgang Osten (Univ. Stuttgart), Malgorzata Kujawinska (Warsaw Univ. of Technology) and Pietro Ferraro (Istituto Nazionale di Ottica Applicata).

Networking events include a luncheon for students and SPIE Fellows, a welcome reception, and evening poster sessions.

Programme and registration information are on the conference website: http://spie.org/x6506.xml.

Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections.

Collaborative projects workshop

A workshop for technologically progressive industry and academia working in collaborative photonics projects on European and national level projects is scheduled on 22 May, preceding SPIE Optical Metrology, at the nearby Novotel Munchen Messe Hotel. Sponsors are SPIE, HOLOEYE, Polytec, and Steinbichler Optotechnik, along with co-organiser Technologie Transfer Initiative.

On the agenda are updates on current European and German collaborative research projects s PHOSFOS, OptAssyst, and SMARTIES, and discussions on managing intellectual property in academia, estimating the business value of an innovation, and negotiating of R&D and technology transfer agreements.

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies. Serving more than 180,000 constituents from 168 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions and education programs in North America, Europe, Asia and the South Pacific, and supports scholarships, grants and other education programs around the world.


Media Contact:

Amy Nelson
Public Relations Manager
+44 29 2089 4749

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