CARDIFF, Wales, UK -- New research in optical measurement technologies enabling applications in industry, research modelling, inspection of nanostructures and artwork, and related topics will be presented at SPIE Optical Metrology 24-26 May 2011.
The conference will be held at the International Conference Centre Munich in conjunction with Laser World of Photonics.
SPIE Optical Metrology is the field's premier conference in Europe for scientists, engineers, researchers, and applications or product developers, noted Symposium Chairs Wolfgang Osten, Univ. Stuttgart; Malgorzata Kujawinska, Warsaw Univ. of Technology; and Pietro Ferraro, Istituto Nazionale di Ottica Applicata.
Abstracts may be submitted through 15 November for four conferences:
- Optical Measurement Systems for Industrial Inspection, chaired by Peter Lehmann, Univ. Kassel, on optical metrology methods and their applications in solving measurement problems in industrial design and production engineering.
- Modelling Aspects in Optical Metrology, chaired by Bernd Bodermann, Physikalisch-Technische Bundesanstalt, on optical metrology modelling as a prerequisite for traceable and comparable measurements.
- Optics for Arts, Architecture, and Archaeology, chaired by Luca Pezzati, Istituto Nazionale di Ottica Applicata, and Reno Salimbeni, Istituto di Fisica Applicata Nello Carrara, on advanced optical methodologies for the study, documentation, safeguard, preservation, and conservation of cultural heritage.
- Videometrics, Range Imaging and Applications, chaired by Fabio Remondino, Fondazione Bruno Kessler, and Mark Shortis, RMIT Univ., on advances in precise 3D measurement and accurate modelling from imaging and range sensors.
The conference website, at spie.org/x6506.xml, contains call for papers and submission information.
Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections. The SPIE Digital Library is the world's largest collection of optics and photonics literature, and a leading resource for scientific and patent research.
Along with SPIE Optical Metrology, the biennial World of Photonics Congress includes conferences organised by WLT (German Scientific Laser Society/Wissenschaftliche Gesellschaft Lasertechnik), EOS (European Optical Society), OSA (The Optical Society), IEEE Photonics Society and EPS (European Physical Society).
SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies. Serving more than 180,000 constituents from 168 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific, and supports scholarships, grants, and other education programs around the world.
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