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EUVL, DSA, and mobile drive the conversation at SPIE Advanced Lithography

Video talks and interviews online on SPIE.tv

02 March 2012

Grant Willison and Moore's Law JPEG
Grant Willson (above) invoked Moore's Law in his plenary talk at SPIE Advanced Lithography.

 

BELLINGHAM, Washington, USA -- Future prospects for extreme ultraviolet lithography (EUVL), the promise of directed self-assembly (DSA), and the growing pervasion and importance of mobile devices dominated technical talks and hallway conversations at SPIE Advanced Lithography last month in San Jose, California.

As of this week, many of those talks are now available online in video. Plenary presentations by Jim Clifford of Qualcomm Grant Willson of the University of Texas at Austin and interviews with Nigel Farrar of Cymer, Kurt Ronse of IMEC, and Vivek Singh of Intel have been posted on the SPIE Newsroom, at http://spie.org/SPIElithotalks.

Higher attendance for the third straight year -- 2,365 total, including an 8% increase in technical conference attendees -- and more technical talks provided signs of recovery in the industry that were reiterated by attendee's comments. A new conference on advanced etching and related processes was added to the program, several conferences drew overflow audiences, and poster receptions drew as many at 1,300 attendees.

Among highlights from the plenary talks:

  • Calling mobile "the biggest platform in the history of the world," Clifford urged his SPIE Advanced Lithography audience to continue pushing process development and resolution because "lithography problems are at the heart " of solutions to cost-effective, increasingly capable advances.
  • Willson pointed out that making things smaller is the essence of future progress, noting that reduction in the minimum feature size is happening on many fronts: optical lithography, immersion lithography, EUV, and increasingly chemistry.
  • Chris Progler, CTO of Photronics, described the industry's path to consolidation, and illustrated the link between the semiconductor market and global GDP.

Read more about the meeting, view event photos, and find links to media coverage at http://spie.org/SPIElithonews.

Conference proceedings papers are being published individually in the SPIE Digital Library as soon as approved, and will be available in collected print and digital volumes on CD ROM.

Recently published open-access articles authored for the SPIE Newsroom by SPIE Advanced Lithography presenters include:

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies. Serving more than 225,600 constituents from approximately 150 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific. SPIE provided over $2.5 million in support of education and outreach programs in 2011.

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