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SPIE Advanced Lithography to provide 'total spectrum' look at the future of chip design and fabrication

08 February 2012

SPIE Advanced Lithography JPEG
Researchers and developers from around the world will gather for SPIE Advanced Lithography in San Jose next week.

BELLINGHAM, Washington, USA -- Experts from throughout the international community will gather next week at SPIE Advanced Lithography in San Jose to share insights and new findings for the next chip sets for mobile wireless, new memory devices, and faster computers.

The event offers provocative panel discussions, more than 600 technical presentations, 12 technical short courses, numerous networking opportunities and company-sponsored social events, and an exhibition showcasing the latest applications from the field. Dates are 12-15 February in the San Jose Marriot Hotel and Convention Center. The event is sponsored by SPIE, the international society for optics and photonics.

Pre-registered attendance is up over the previous year for the third straight year, an indicator that the industry is recovering from the economic downtown, event organizers said.

"For the past 36 years, the SPIE Advanced Lithography symposium has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry," said symposium chair Donis Flagello (Nikon Research Corp. of America). "With the addition of a new conference this year covering advanced etching and related processes, the total spectrum of lithographic patterning technology is presented across seven complementary conferences."

Industry and research leaders speaking at the all-symposium plenary session Monday morning are:

  • Jim Clifford (Qualcomm CDMA Technologies) on "The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography"
  • Grant Willson (University of Texas at Austin) on "High-Resolution Patterning: A View of the Future"
  • Christopher Progler (Photronics Inc.) on "Squares Do Not Make Good Frisbees."

Panel discussions during the week will include:

  • Metrology Solutions for Sub-10nm Advanced 3D Integrated Memory Logic Devices, moderated by Christopher Soles and Richard Silver (National Institute of Standards and Technology [NIST])
  • EUVL isn't the Solution: Are the Alternative Lithographic Technologies Ready?, moderated by Douglas Resnick (Molecular Imprints, Inc.) and William Tong (KLA-Tencor Corp.)
  • Wild and Crazy Ideas, moderated by Nigel Farrar (Cymer, Inc.) and Mircea Dusa (ASML US. Inc.).

New and existing SPIE Fellows from the lithography industry will be honored, and several awards will be presented for outstanding papers as well as notable career achievements.

In addition to four days of technical talks in which researchers and engineers from around the world report the latest research in advanced lithography, two perennially popular evening poster receptions will provide attendees a chance to talk directly with authors about their work.

The suite of half- and full-day short courses includes timely topics such as EUV Lithography, Directed Self-Assembly, Double and Multiple Patterning, and Computational Lithography.

See the event website at www.SPIE.org/advanced-lithography.xml for registration and other details.

Conference proceedings papers will be published individually in the SPIE Digital Library as soon as approved after the meeting, and also in collected print and digital volumes on CD ROM.

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies. Serving more than 180,000 constituents from 168 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific. SPIE provided over $2.5 million in support of education and outreach programs in 2011. The SPIE Digital Library includes over 325,000 items from Proceedings of SPIE, SPIE Journals, and SPIE eBooks.

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Media Contact:

Amy Nelson
Public Relations Manager
amy@spie.org
Tel: +1 360 685 5478