• About the Society
  • SPIE Altruism
  • International Day of Light
  • Fellows and Senior Members
  • Awards Programs
  • Press Room
  • Press Releases
    SPIE Member News
    Event News
    Press Kits and Fact Sheets
    PR Contacts
    RSS Collection
    SPIE Logos and Name
    Press Registration
  • Public Policy
  • Related Organizations
  • Jobs at SPIE
Print PageEmail Page

SPIE Advanced Lithography conferences and exhibition to provide latest insights for industry, research

10 February 2009

SPIE Advanced Lithography

BELLINGHAM, Wash., USA - SPIE Advanced Lithography, the foremost annual forum for the lithography community, will provide a close-up look at industry trends and technology advances during its run in the San Jose, Calif., Convention Center and Marriott Hotel later this month. Dates are 22-27 February.

The event, in its 34th year in 2009, continues to be the essential forum in the field for networking, industry connections, and research reports.

"SPIE Advanced Lithography plays a key role in bringing the lithography coBACUS President and new SPIE Fellow Brian Grenon, left, talks with Bill Broadbent outside the exhibition hall during last year’s symposium.mmunity together to solve challenges required by the semiconductor industry," said Symposium Chair Christopher J. Progler of Photronics, Inc.

The free exhibition runs Tuesday and Wednesday, 24 and 25 February, and will include companies such as Nikon, Hitachi, Rohm and Haas, Toppan, Synopsys, JSR Micro, Dow Corning, Applied Materials, Canon, Carl Zeiss, Honeywell, Molecular Imprints, Mentor Graphics, Tessera (winner of a 2008 Prism Award for Photonics Innovation), and others.

Three top industry leaders will give plenary presentations on Monday 23 February:

  • Lisa T. Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc., on "Embedded Electronics and the Semiconductor Industry"
  • Gilad Almogy, Senior Vice President and General Manager for the Display and Thin Film Solar Products Business Group, Applied Materials, Inc., on "'Moore's Law' Extension: From Integrated Circuits to Flat Panel Displays and Photovoltaic Solar Power"
  • Bernard S. Meyerson, Vice President for Strategic Alliances and Chief Technology Officer, IBM Systems and Technology Group, on "Semiconductor Technology: A Convergence of Technology and Business Models."

Several future-looking panels will explore some of the challenges facing the industry:

  • The Future - Where Will Reticles Be by the End of 2013?
  • Lithography for 22nm: How Many Patterning Steps?
  • Is the End of CMOS Near? Nanotechnology Alternatives to CMOS Scaling
  • DFM
  • Global Collaboration in Reference Metrology
  • Shaping Up -- Frontiers and Challenges in Contour Metrology (Organized by NIST, the U.S. National Institute for Standards and Technology).

Overall, 760 papers are scheduled for presentation in the conference rooms and in the perennially popular Advanced Lithography poster sessions. Intel, who announced this week they are stepping up investment in new manufacturing despite a downturn in profits, has submitted around 30 papers for technical presentations.

Papers will be presented in five concurrent conferences:

  • Alternative Lithographic Technologies
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Resist Materials and Processing Technology
  • Optical Microlithography
  • Design for Manufacturability through Design-process Integration.

Conference proceedings papers will be published in the SPIE Digital Library (spiedigitallibrary.org) immediately as approved following the event.

Articles by several authors presenting at Advanced Lithography are being published in the online SPIE Newsroom. An article by Henry Smith of MIT on "Maskless lithography: photons rather than electrons," is available now at spie.org/x31440.xml, and others are slated for posting in the next few weeks, along with other articles on Micro/Nano Lithography.

Professional development courses and workshops will be offered on topics ranging from lithography and semiconductor fundamentals to emerging techniques and approaches, at introductory, intermediate, and advanced levels.

The sixth Frits Zernike Award for Advances in Optical Microlithography will be presented, new SPIE Fellows will be recognized, and several Best Paper presentations will be recognized.

Complete registration and other information is available online at spie.org/advanced-lithography.xml.

SPIE is the international optics and photonics society founded in 1955 to advance light-based technologies. Serving more than 188,000 constituents from 138 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific. In 2008, the Society provided $1.9 million for scholarships, grants, and other activities supporting research and education around the world. For more information, visit SPIE.org.


Media Contact
Ms. Amy Nelson
Public Relations Manager
Tel: + 1 360 685 5478