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SPIE Advanced Lithography will draw academic, industry leaders to must-attend event in San Jose

SPIE Advanced Lithography

BELLINGHAM, WA, USA - 18 December 2008 - SPIE Advanced Lithography, the foremost annual forum of the lithography community, will bring worldwide experts working in EUV, smart metrology, resist materials, processing technology, and other established and emerging topics to San Jose, CA, 22-29 February. The event, now in its 34th year, is expected to draw more than 4,000 attendees to the San Jose Convention Center and Marriott Hotel.Attendees at SPIE Advanced Lithography 2008.

"For the past 33 years, SPIE Advanced Lithography has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry," said Christopher J. Progler of Photronics Inc., the 2009 symposium chair. "If you can attend only one conference this year, SPIE Advanced Lithography is the obvious choice, as it brings the whole community to one place to solve today's problems and plan for the future."

In addition to the technical program, an exhibition featuring approximately 100 companies will run Tuesday and Wednesday during the week. Companies will show the latest technologies for applications and systems in:

  • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
  • Metrology, inspection, OPC, and process control
  • Electronic imaging components, equipment, and systems
  • Resist materials and processing
  • Nano-imprint
  • Design for manufacturability/DPI
  • IC and chip fabrication/DPI.

Technical papers will be presented in five conferences:

  • Alternative Lithographic Technologies
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Resist Materials and Processing Technology
  • Optical Microlithography
  • Design for Manufacturability through Design-Process Integration.

Several Best Paper presentations will be made, and papers will be published in the SPIE Digital Library immediately as approved following the event.

Three top industry leaders will give plenary presentations:

  • Lisa T. Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc., on "Embedded Electronics and the Semiconductor Industry"
  • Gilad Almogy, Senior Vice President and General Manager for the Display and Thin Film Solar Products Business Group, Applied Materials, Inc., on "'Moore's Law' Extension: From Integrated Circuits to Flat Panel Displays and Photovoltaic Solar Power"
  • Bernard S. Meyerson, Vice President for Strategic Alliances and Chief Technology Officer, IBM Systems and Technology Group, on "Semiconductor Technology: A Convergence of Technology and Business Models."

A suite of 21 professional development courses and workshops will be offered on topics ranging from lithography and semiconductor fundamentals to emerging techniques and approaches, at introductory, intermediate, and advanced levels.

Complete registration and other information is available online.

Photo caption: Above, attendees listen intently to a plenary speaker at SPIE Advanced Lithography 2008. More than 4,000 researchers and developers are expected to attend the 2009 symposium in February.

About SPIE

SPIE is an international optics and photonics society founded in 1955 to advance light-based technologies. Serving the interests of its more than 188,000 active constituents representing 138 different countries, SPIE acts as a catalyst for collaboration among technical disciplines for information exchange, continuing education, publishing opportunities, patent precedent, and career and professional growth. As the organizer and sponsor of approximately 25 major conferences and education programs annually in North America, Europe, Asia, and the South Pacific, SPIE provides publishing, speaking, and learning opportunities on emerging technologies.SPIE contributes more than $1.6 million annually in scholarships, grants, and other programs supporting research and education around the world.For more information, visit SPIE.org.