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SPIE announces 2013 scholarship recipients

 

19 July 2013

BELLINGHAM, Washington, USA -- SPIE has awarded $351,000 in scholarships to 139 outstanding individuals, based on their potential for long-range contribution to optics and photonics, or a related discipline. Award-winning applicants were evaluated and selected and approved by the SPIE Scholarship Committee, chaired by Marta de la Fuente, Indra Sistemas, S.A.

Winners of the top scholarships for 2013 included:

The SPIE D.J. Lovell Scholarship was awarded to Xiaohang Li, Georgia Institute of Technology. His research focuses on growing high-quality InAlGaN semiconductor material for ultraviolet devices such as laser diodes, LED, and detectors. Li says he Li plans to use the funds to further explore his research. The D.J. Lovell Scholarship is the Society's most prestigious scholarship.

The John Kiel Scholarship was awarded to Kishore Padmaraju, Columbia University. The award was established to honor SPIE founding member John Kiel, in recognition of his long-standing and significant contributions to the society. This scholarship is sponsored by SPIE and is awarded for the student's potential for long-term contribution to the field of optics and optical engineering.

The Laser Technology, Engineering and Applications Scholarship was awarded to Christopher Collier, University of British Columbia. This scholarship is awarded in recognition of the student's scholarly achievement in Laser Technology, Engineering, or Applications. Funds are provided in part by SPIE.

The Optical Design and Engineering Scholarship was awarded to Dmitry Reshidko, The University of Arizona. The scholarship was established in memory of Bill Price and Warren Smith, both well-respected members of SPIE's technical community. This scholarship is awarded to a full-time graduate or undergraduate student in the field of optical design and engineering.

Bei Yu and Jhih-Rong Gao, both from the Univ. of Texas at Austin, were awarded the BACUS Photomask Scholarship. This scholarship is awarded to an undergraduate or a graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.

See the list of additional 2013 SPIE scholarship recipients by region:

To date, SPIE has distributed over $3.6 million dollars in individual scholarships. This ambitious effort reflects the Society's commitment to education and to the next generation of optical scientists and engineers around the world. Learn more at http://spie.org/scholarships.

SPIE is the international society for optics and photonics, a not-for-profit organization founded in 1955 to advance light-based technologies. The Society serves more than 235,000 constituents from approximately 155 countries, offering conferences, continuing education, books, journals, and a digital library in support of interdisciplinary information exchange, professional networking, and patent precedent. SPIE provided over $3.2 million in support of education and outreach programs in 2012.

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Media Contact:
Stacey Crockett
Media Relations Coordinator
staceyc@spie.org
Tel: +1 360 685 5458
@SPIEevents