11-13 September 2012
Monterey Conference Center and Monterey Marriott
Starting with the end user
SPIE Photomask Technology opened Tuesday morning with perspective from the end user, with a well-received talk by NVIDIA Corp. Vice Presidnet of Technology and Foundry John Chen on "Transforming design to chips: an end user's point of view on mask making. Noting that today's definition of doing it right "means perfection," Chen emphasized the necessity for performance, precision, and perfection for the continuation of Moore's Law.
Always an important part of the conference experience, networking events included (below, top to bottom) lunches hosted by DNP America, KLA Tencor, Mentor Graphics, and SPIE; a well-attended reception; and the perennially popular banquet.
Kevin MacLean of PDF Solutions and Roger Sturgeon of FF Transfroms (below, left to right) were awarded the 2012 BACUS Prize for their creation of the CATS mask data preparation software. The prize is awarded annually in recognition of contributions to the photomask industry that are enduring, enabling, and represent a fundamental change in photomask manufacturing, technology, or use.
Best poster winners
Symposium Chair Frank Abboud (Intel) awarded best poster awards for three papers. Accepting, top to bottom, are Abbas Rastegar (SEMATECH North), Zhengqing John Qi (IBM Corp.), and Thomas Klimpel (Synopsys).
Two days poster viewings were offered along with an evening poster reception on Tuesday during the exhibition, enabling attendees to share their research and ideas, view poster papers and talk with the authors, and visit exhibition booths.
Conference attendees enjoyed their surroundings in Monterey, California. Below, a beautiful sunrise starts the day off; a view of the harbor.