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SPIE Advanced Lithography 2015 photos

 

Congratulations: conference best paper winners

Exhibition: supplying the industry

Lithography Fellows of SPIE

Networking, SPIE Litho style

Poster receptions draw the crowds

 


Congratulations: conference best paper winners

Grant Willson Award

The 2014 C. Grant Willson Best Paper Award in Patterning Materials and Processes was presented for "EUV resists based on tin-oxo clusters." Authors are Brian Cardineau, (SUNY College of Nanoscale Science and Engineering), Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, and Robert Brainard. Above, from left, Advances in Patterning Materials and Processes conference chair Thomas Wallow (ASML Brion Technologies), Cardineau, Del Re, and conference co-chair Christoph Hohle (Fraunhofer Institute for Photonics Microsystems). The award is sponsored by IBM.

Byers Award

The 2014 Jeff Byers Best Poster Award in Patterning Materials and Processes was presented for "EUV resists comprised of main group organometallic oligomeric material." Authors are James Passarelli (SUNY College of Nanoscale Science and Engineering), Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, and Robert Brainard. Above from left are Advances in Patterning Materials and Processes conference co-chair Christoph Hohle (Fraunhofer Institute for Photonics Microsystems) and Passarelli. The award is sponsored by Tokyo Electron.

Ito Award

The 2014 Hiroshi Ito Student Award in Patterning Materials and Processes was presented for "An in situ hard mask block copolymer approach for the fabrication of ordered large-scale horizontally aligned Si nanowire arrays on Si substrate." Authors are Tandra Ghoshal (University College Cork), Ramsankar Senthamaraikannan, Matthew Shaw, Justin Holmes, and Michael Morris. Above from left, are Advances in Patterning Materials and Processes conference chair Thomas Wallow (ASML Brion Technologies) and Shaw. The award is sponsored by IBM.

Nyyssonen Award

The Diana Nyyssonen Memorial Award for the Best Metrology Paper of 2014 was presented for "10nm three-dimensional CD-SEM metrology." Authors are András Vladár (NIST), John Villarrubia, Jasmeet Chawla, Bin Ming, Joseph Kline, Scott List, and Michael Postek. Above from left are Metrology, Inspection, and Process Control for Microlithography conference co-chair Martha Sanchez (IBM Research), Vladár, Villarrubia, and conference chair Jason Cain (Advanced Micro Devices). The award is sponsored by Hitachi High Technologies America.

2015 Optical Microlithography Award

The 16th Annual Cymer Scientific Leadership Award for the 2015 Best Student Paper in Mirolithography was presented for "Characterizing the dependence of thick-mask edge effects on feature size and illumination angle using AIMS" (9426-23). Authors are Aamod Shanker (University of California, Berkeley), Andrew Neureuther, Laura Waller, Martin Sczyrba, and Brid Connolly. Above, from left, are Optical Microlithography program committee member Will Conley (Cymer), Shanker, and Optical Microlithography conference chair Kafai Lai (IBM Corp.).

2015 Karel Urbanek Award

The 2015 Karel Urbanek Best Student Paper Award was presented for "Material characterization at sub-50nm dimensions using coherent EUV beams" (9424-43). Authors are Kathleen Hoogeboom-Pot (University of Colorado at Boulder), Jorge Hernandez-Charpak, Damiano Nardi, Travis Frazer, Emrah Turgut, Erik Anderson, Weilun Chao, Justin Shaw, Margaret Murnane, and Henry Kapteyn. Above, from left, Metrology, Inspection, and Process Control for Microlithography conference chair Jason Cain (Advanced Micro Devices), Hoogeboom-Pot, and conference co-chair Martha Sanchez (IBM Research). The award is sponsored by KLA-Tencor.

2015 Luigi Franco Cerrina Award

The 2015 Luigi Franco Cerrina Memorial Best Student Paper Award was presented for "Topology and context-based pattern extraction using line-segment Voronoi diagram" (9427-5). Authors are Sandeep Dey (Università della Svizzera italiana), Panagiotis Cheilaris, Nathalie Casati, Maria Gabrani, and Evanthia Papadopoulo. Above, from left, Design-Process-Technology Co-optimization for Manufacturability conference chair John Sturtevant (Mentor Graphics), Dey, and program committee member Michael Rieger (Synopsys). The award is sponsored by Mentor Graphics and Synopsys.

 

Exhibition: supplying the industry

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

Marc Himel, Obert Wood, SPIE Advanced Lithography exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

SPIE Advanced Lithography 2015 exhibition

 

Lithography Fellows of SPIE

SPIE fellows

SPIE Fellows

SPIE Fellows

SPIE Fellows

SPIE Fellows

SPIE Fellows

 

Networking, SPIE Litho style

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

SPIE Advanced Lithography 2015

AL Networking

AL Networking

AL Networking

AL Networking

AL Networking

 

Poster receptions draw the crowds

SPIE Advanced Lithography 2015 poster reception

William Arnold, Martin van den Brink

SPIE Advanced Lithography 2015 poster reception

SPIE Advanced Lithography 2015 poster reception

SPIE Advanced Lithography 2015 poster reception

SPIE Advanced Lithography 2015 poster reception

SPIE Advanced Lithography 2015 poster reception

SPIE Advanced Lithography 2015 poster reception

 


All photos © SPIE except where noted.

 


SPIE Advanced Lithography

22-26 February 2015
San Jose, California, Marriott and Convention Center

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SPIE Advanced Lithography event website

SPIE Litho 2015 event news

SPIE Litho 2015 photo gallery

 


International Year of Light 2015
International Year of
Light 2015
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Celebrate the photon!