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SPIE Advanced Lithography event photos


23-27 February 2014
San Jose, California, USA

 

Joseph Sawicki plenary talk Chris Mack toasts the end of Moore's Law Mordy Rothschild on the Frits Zernike Award
Joseph Sawicki
(Mentor Graphics)
plenary talk
[Video 38:14]
Chris Mack (Litho
Guru) declares the
end of Moore's Law
[Video 2:37]
Mordy Rothschild on
winning the Frits
Zernike Awrard
[Video 1:33]

SPIE awards

Fellows of SPIE

Best paper awards

Exhibition

Hallway conversations

Poster session: Tuesday

Poster session: Wednesday

Event news

Event website

For copies of photographs, email media@spie.org.

 


SPIE awards

Bill Arnold and Mordy Rothschild, Frits Zernike Award

SPIE Immediate Past President Bill Arnold presents Mordy Rothschild with the Frits Zernike Award, in recognition of his significant contributions to the advancement of lithography through the exploration and demonstration of DUV/VUV materials, lasers, and systems.

Bill Arnold and Martin Richardson, Edgerton Award

SPIE Immediate Past President Bill Arnold presents Martin Richardson with the Harold E. Edgerton Award, in recognition of his significant contributions to the field of high-speed diagnostics of transient dense plasmas.


Fellows of SPIE

Bill Arnold and new SPIE Fellow Frank Abboud

SPIE Immediate Past President Bill Arnold congratulates new SPIE Fellow Frank Abboud.

Below, Fellows from the Advanced Lithography were guests at a luncheon:

Harry Levinson, Alain Diebold, Marc Himmel

Harry Levinson, Alain Diebold, and Marc Himel

SPIE Fellows

Timothy Brunner, Shinji Okazaki, and Ahmed Hassanein

SPIE Fellows

Bruce Smith, Kafai Lai, and Will Conley

SPIE Fellows

Marc Himel, John Petersen, and Harry Levinson

SPIE Fellows

Andrew Neureuther and David Williamson

SPIE Fellows

Brian Grenon and Naoya Hayashi.


Best paper awards

Peter Trefonas, Christophe Hohle

Peter Trefonas, at left, is presented by conference cochair Christoph Hohle with the 2013 C. Grant Willson Best Paper Award in Patterning Materials and Processes, sponsored by IBM, for "Bottom-up/top-down high-resolution high-throughput lithography using vertically assembled block bottle brush polymers," authored by Peter Trefonas, James Thackeray, Guorong Sun, Sangho Cho, Corrie Clark, Stanislav Verkhoturav, Michael Eller, Ang Li, Adriana Pavia-Jiménez, Emile Schweikert, and Karen Wooley [8682-37].

Thomas Wallow, Jin Jiang

Conference chair Thomas Wallow, at left, presents Jing Jiang with the 2013 Jeffrey Byers Memorial Award for Best Poster, sponsored by Tokyo Electron, for "Line edge roughness of high-deprotection activation energy photoresist by using sub-millisecond post-exposure bake," authored by Jing Jiang, Byungki Jung, Michael Thompson, and Christopher Ober [8682-58].

Jeffrey Byers best poster awards

Conference chair Thomas Wallow, at left, and cochair Christoph Hohle, at right, congratulate two winners of the 2013 Hiroshi Ito Memorial Best Student Paper Award, sponsored by IBM. My-Phung Van, second from left, accepts the award for "Polarization selective photoresist based on reactive liquid crystals doped with a dichroic photoinitiator," authored by My-Phung Van, Cees Bastiaanen, and Dirk Broer [8682-65]. Xaver Thrun, second from right, accepts the award for "Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography," authored by Xaver Thrun, Kang-Hoon Choi, Norbert Hanisch, Christoph Hohle, Katia Steidel, Douglas, Guerrero, Thiago Figueiro, and Johann Bartha [8682-34].

Nyyssonen award

Conference chair Jason Cain, at left, and cochair Martha Sanchez present Michael Strauss with the Diana Nyyssonen Memorial Award for the Best Metrology Paper of 2013, sponsored by Hitachi, for "High-volume process monitoring of FEOL 22nm FinFET structures using an automated STEM," authored by Ozan Ugurlu, Michael Strauss, Gavin Dutrow, Jeff Blackwood, Brian Routh, Corey Senowitz, Paul Plachinda, and Roger Alvis [8681-6].

Optical Microlithography Student Best Paper Award

Julien Mailfert, IMEC and Katholieke Universiteit Leuven, (center) received the 2014 Best Student Paper Award in Optical Microlithography. The award was presented by program committee member Will Conley of award sponsor Cymer and conference chair Kafai Lai (IBM), for "Metal1 patterning study for random-logic applications with 193i, using calibrated OPC for litho and etch," authored by Julien Mailfert, Jeroen Van de Kerkhove, Werner Gillijins, Peter De Bisschop, and Kristin De Meyer [9052-25].

Karel Urbanek award

Thomas Verduin of Technische Universiteit Delft (center) received the 2014 Karel Urbánek Best Student Paper Award, sponsored by KLA-Tencor, in the conference on Metrology, Inspection, and Process Control for Microlithography. Presenters were conference chair Jason Cain, left, and John Robinson of KLA-Tencor. The award was for "The effect of adaptive filtering and edge rotation on line-edge roughness," authored by Thomas Verduin, Cornelis Hagen, and Pieter Kruit [9050-20].

 


Exhibition

AL14 exhibition

SPIE Advanced Lithography exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14 exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

AL14-Wed-exhibition

 


Hallway conversations

Networking is an important reason to be at Advanced Lithography, and the event presents many opportunities to make connections.

networking at SPIE Advanced Lithography

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

AL14 hallway conversations

 


Poster session: Tuesday

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

SPIE Advance Lithography poster session

 


Poster session: Wednesday

SPIE Advance Lithography poster session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session

AL14-Wed-poster-session


SPIE Advanced Lithography