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SPIE Advanced Lithography 2012 Photo Gallery

SPIE Advanced Lithography

12- 16 February 2012
San Jose, California, Marriott Hotel and Convention Center

To request copies of photographs, email media@spie.org.

Daily news from on-site.

Video interviews and plenary talks

Join the conversation on Twitter at #SPIElitho.

 

Tuesday 14 February

Monday 13 February

Sunday 12 February



   Wednesday 15 January

 

Exhibition

Exhibition

Exhibition

Exhibition

Exhibition

Exhibition


Attendees

AL12 Attendees

AL12 Attendees

AL12 Attendees

AL12 Attendees

AL12 Attendees

AL12 Attendees


Interactive Poster Session

AL12 Poster Session

AL12 Poster Session

AL12 Poster Session

AL12 Poster Session

AL12 Poster Session

 

   Tuesday 14 January

 

Exhibition

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

 

Women in Optics luncheon

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

 

Panel discussions

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

 

Interactive poster session

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

 


Monday 13 January

 

Plenary session

Jim Clifford JPEG
Jim Clifford (Qualcomm)

JPEG SPIE Advanced Lithography Plenary
C. Grant Willson
(Univ. of Texas at Austin)

JPEG SPIE Advanced Lithography Plenary
Christopher Progler (Photronics Inc.)

JPEG SPIE Advanced Lithography Plenary>

JPEG SPIE Advanced Lithography Plenary

JPEG SPIE Advanced Lithography Plenary

JPEG SPIE Advanced Lithography Plenary

JPEG SPIE Advanced Lithography Plenary


New Fellows of the Society

SPIE Fellow Yu-Cheng Lin
Yu-Cheng Lin
, National Cheng Kung University (center)


SPIE Fellow Patrick Naulleau
Patrick Naulleau, Lawrence Berkeley National Lab (right)

SPIE Fellow Andrew Neureuther
Andrew Neureuther, Univ of California Berkeley (left)

SPIE Fellow Vivek Singh
Vivek Singh, Intel Corp (center)


Coffee break

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

JPEG SPIE Advanced Lithography

 


Sunday 12 February

 

It all starts with education

Chris Mack JPEG
Chris Mack, Lithoguru.com, instructs attendees at his popular course, Lithographic Optimization: A Theoretical Approach.

Murrae J. Bowden
Murrae Bowden (shown), EMP Consultants, along with Grant Willson, The Univ. of Texas at Austin, taught Introduction to Microlithography: Theory, Materials, and Processing.

 

 

 

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