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Proceedings of SPIE Volume 9984 • new

Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Nobuyuki Yoshioka
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Volume Details

Volume Number: 9984
Date Published: 19 September 2016
: 31 papers (240) pages
ISBN: 9781510603721

Table of Contents
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Front Matter: Volume 9984
Author(s): Proceedings of SPIE
Defect avoidance for EUV photomask readiness at the 7 nm node
Author(s): Zhengqing John Qi; Jed Rankin; Eisuke Narita; Masayuki Kagawa
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eBeam community speaks out on future directions for photomask manufacturing
Author(s): Aki Fujimura; Jan Willis
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Thin absorber EUV photomask based on mixed Ni and TaN material
Author(s): Derrick Hay; Patrick Bagge; Ian Khaw; Lei Sun; Obert Wood; Yulu Chen; Ryoung-han Kim; Zhengqing John Qi; Zhimin Shi
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ILT based defect simulation of inspection images accurately predicts mask defect printability on wafer
Author(s): Prakash Deep; Sankaranarayanan Paninjath; Mark Pereira; Peter Buck
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Technology for fabricating micro-lens arrays utilizing lithographically replicated concave resist patterns
Author(s): Noa Kobayashi; Ryunosuke Sasaki; Toshiyuki Horiuchi
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Laser-Scan Lithography onto Ultra-Fine Pipes 100 μm in diameter
Author(s): Hiroshi Takahashi; Tomoya Sagara; Toshiyuki Horiuchi
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Synchronous scan-projection lithography for fabricating cylindrical micro-parts
Author(s): Kaiki Ito; Yuta Suzuki; Toshiyuki Horiuchi
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Production mask composition checking flow
Author(s): Shou-Yuan Ma; Chuen-Huei Yang; Joe Tsai; Alice Wang; Roger Lin; Rachel Lee; Erwin Deng; Ling-Chieh Lin; Hung-Yueh Liao; Jenny Tsai; Amanda Bowhill; Hien Vu; Gordon Russell
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Developer molecular size dependence of pattern formation of polymer type electron beam resists with various molecular weights
Author(s): Tomohiro Takayama; Hironori Asada; Yukiko Kishimura; Shunsuke Ochiai; Ryoichi Hoshino; Atsushi Kawata
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Resist behaviour during peeling release in nano-imprint lithography
Author(s): Florian Chalvin; Naoto Nakamura; Takamitsu Tochino; Masaaki Yasuda; Hiroaki Kawata; Yoshihiko Hirai
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Comparison of analysis techniques for aerial image metrology on advanced photomask
Author(s): Seolchong Hwang; Sungha Woo; Heeyeon Jang; Youngmo Lee; Sangpyo Kim; Hyunjo Yang; Kristian Schulz; Anthony Garetto
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EBL2, a flexible, controlled EUV exposure and surface analysis facility
Author(s): Edwin te Sligte; Norbert Koster; Freek Molkenboer; Alex Deutz
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Clean induced feature CD shift of EUV mask
Author(s): Pavel Nesládek; Thorsten Schedel; Markus Bender
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Computational nano OPC DFM for LV Fin-type SRAM
Author(s): Kazuya Kadota
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Influence of different developer nozzle types on the photomask performance
Author(s): Cindy Schmädicke; Axel Feicke; Mark Herrmann; Christian Bürgel
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The impact of the residual stress on the EUV pellicle
Author(s): Eun-Sang Park; Jae-Keun Choi; Min-Ha Kim; Sollee Hwang; Zahid Hussain Shamsi; Dai-Gyoung Kim; Hye-Keun Oh
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Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system
Author(s): Ryoichi Hirano; Susumu Iida; Tsuyoshi Amano; Hidehiro Watanabe; Masahiro Hatakeyama; Takeshi Murakami; Kenichi Suematsu; Kenji Terao
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Development of a new high transmission phase shift mask technology for 10 nm logic node
Author(s): Thomas Faure; Yoshifumi Sakamoto; Yusuke Toda; Karen Badger; Kazunori Seki; Mark Lawliss; Takeshi Isogawa; Amy Zweber; Masayuki Kagawa; Richard Wistrom; Yongan Xu; Granger Lobb; Ramya Viswanathan; Lin Hu; Yukio Inazuki; Kazuhiro Nishikawa
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Error analysis of overlay compensation methodologies and proposed functional tolerances for EUV photomask flatness
Author(s): Katherine Ballman; Christopher Lee; Thomas Dunn; Alexander Bean
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High resolution hole patterning with EB lithography for NIL template production
Author(s): Mana Tanabe; Keisuke Yagawa; Takeharu Motokawa; Kazuki Hagihara; Machiko Suenaga; Masato Saito; Shingo Kanamitsu; Masamitsu Itoh
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The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information
Author(s): Won Joo Park; Hyung-Joo Lee; Yoon Taek Han; Seuk Hwan Choi; Hak Seung Han; Dong Hoon Chung; Chan-Uk Jeon; Yoshiaki Ogiso; Soichi Shida; Jun Matsumoto; Takayuki Nakamura
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In-line surface preparation and resist plug removal on NIL templates
Author(s): Hiroyuki Ishida; Osamu Katada; Shingo Ishida; Takehiko Ueno; Toshiaki Ando; Yoshio Kawanobe; Klaus Beschorner; Uwe Dietze
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Novel EUV mask black border suppressing EUV and DUV OoB light reflection
Author(s): Shin Ito; Yutaka Kodera; Norihito Fukugami; Toru Komizo; Shingo Maruyama; Genta Watanabe; Itaru Yoshida; Jun Kotani; Toshio Konishi; Takashi Haraguchi
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Lithographic performance of a new “low-k” mask
Author(s): Takashi Adachi; Ayako Tani; Yukihiro Fujimura; Katsuya Hayano; Yasutaka Morikawa; Hiroyuki Miyashita; Yukio Inazuki; Yoshio Kawai
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Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width
Author(s): Noriko Iida; Kosuke Takai; Takashi Kamo; Yasutaka Morikawa; Naoya Hayashi
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Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask
Author(s): Patrick Naulleau; Christopher N. Anderson; Weilun Chao; Kenneth A. Goldberg; Eric Gullikson; Farhad Salmassi; Antoine Wojdyla
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Model based correction of placement error in EBL and its verification
Author(s): Sergey Babin; Sergey Borisov; Vladimir Militsin; Tadashi Komagata; Tetsuro Wakatsuki
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Multi-beam mask writer MBM-1000 and its application field
Author(s): Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Hirofumi Morita; Satoru Hirose; Munehiro Ogasawara; Hirokazu Yamada; Kiyoshi Hattori
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Investigation and modeling of CPL mask profiles using OCD
Author(s): Hsuan-Chen Chen; Ren-Hao Lin; Chien-Cheng Chen; Cheng-Hsuan Huang; Ta-Cheng Lien; Chia-Jen Chen; Gaston Lee; Hsin-Chang Lee; Anthony Yen
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The measurement capabilities of cross-sectional profile of Nanoimprint template pattern using small angle x-ray scattering
Author(s): Eiji Yamanaka; Rikiya Taniguchi; Masamitsu Itoh; Kazuhiko Omote; Yoshiyasu Ito; Kiyoshi Ogata; Naoya Hayashi
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Formation mechanism of the photomask blanks material related haze
Author(s): Jung-Jin Kim; Junyoul Choi; Soowan Koh; Minho Kim; Jiyoung Lee; Han-Shin Lee; Byung Gook Kim; Chan-uk Jeon
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