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Proceedings of SPIE Volume 9780 • new

Optical Microlithography XXIX
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Volume Details

Volume Number: 9780
Date Published: 25 August 2016
Softcover: 0 papers () pages
ISBN: 9781510600157

Table of Contents
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Front Matter: Volume 9780
Author(s): Proceedings of SPIE
Patterning challenges in the sub-10 nm era
Author(s): Moshe E. Preil
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Expected innovations of optical lithography in the next 10 years
Author(s): Soichi Owa; Noriyuki Hirayanagi
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Computational process modeling and correction in a multi-patterning era
Author(s): Chris Spence
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Lithographic qualification of high-transmission mask blank for 10nm node and beyond
Author(s): Yongan Xu; Tom Faure; Ramya Viswanathan; Granger Lobb; Richard Wistrom; Sean Burns; Lin Hu; Ioana Graur; Ben Bleiman; Dan Fischer; Yann Mignot; Yoshifumi Sakamoto; Yusuke Toda; John Bolton; Todd Bailey; Nelson Felix; John Arnold; Matthew Colburn
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Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections
Author(s): Michael Kubis; Rich Wise; Liesbeth Reijnen; Katja Viatkina; Patrick Jaenen; Melisa Luca; Guillaume Mernier; Charlotte Chahine; David Hellin; Benjamin Kam; Daniel Sobieski; Johan Vertommen; Jan Mulkens; Mircea Dusa; Girish Dixit; Nader Shamma; Philippe Leray
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Lower BW and its impact on the patterning performance
Author(s): Paolo Alagna; Greg Rechtsteiner; Vadim Timoshkov; Patrick Wong; Will Conley; Jan Baselmans
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Intra-lot wafer by wafer overlay control using integrated and standalone metrology combined sampling
Author(s): Young Sin Choi; Young Sun Nam; Dong Han Lee; Jae Il Lee; Young Seog Kang; Se Yeon Jang; Jeong Heung Kong
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Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements
Author(s): Min-Suk Kim; Hwa-Yeon Won; Jong-Mun Jeong; Paul Böcker; Lydia Vergaij-Huizer; Michiel Kupers; Milenko Jovanović; Inez Sochal; Kevin Ryan; Kyu-Tae Sun; Young-Wan Lim; Jin-Moo Byun; Gwang-Gon Kim; Jung-Joon Suh
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Overcoming low-alignment signal contrast induced alignment failure by alignment signal enhancement
Author(s): Byeong Soo Lee; Young Ha Kim; Hyunwoo Hwang; Jeongjin Lee; Jeong Heung Kong; Young Seog Kang; Bart Paarhuis; Haico Kok; Roelof de Graaf; Stefan Weichselbaum; Richard Droste; Christopher Mason; Igor Aarts; Wim P. de Boeij
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Lithographic imaging-driven pattern edge placement errors at 10nm node
Author(s): Jacek K. Tyminski; Stephen P. Renwick; Shane R. Palmer; Julia A. Sakamoto; Steven D. Slonaker
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Process window variation comparison between NTD and PTD for various contact type
Author(s): Doyoun Kim; Hyoungsoon Yune; Daejin Park; Joohong Jeong; Woosung Moon; Mingu Kim; Seyoung Oh; Chanha Park; Hyunjo Yang
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Ultimate 2D resolution printing with negative tone development
Author(s): Martin Burkhardt; Yongan Xu; Hsinyu Tsai; Alexander Tritchkov; Jörg Mellmann
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Machine learning (ML)-guided OPC using basis functions of polar Fourier transform
Author(s): Suhyeong Choi; Seongbo Shim; Youngsoo Shin
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Bayesian inference for OPC modeling
Author(s): Andrew Burbine; John Sturtevant; David Fryer; Bruce W. Smith
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OPC recipe optimization using genetic algorithm
Author(s): Abhishek Asthana; Bill Wilkinson; Dave Power
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Impact of bandwidth variation on OPC model accuracy
Author(s): Will Conley; Paolo Alagna; Stephen Hsu; Qian Zhao
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An integrated source/mask/DSA optimization approach
Author(s): Tim Fühner; Przemysław Michalak; Ulrich Welling; Juan Carlos Orozco-Rey; Marcus Müller; Andreas Erdmann
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Multi-layer VEB modeling: capturing interlayer etch process effects for multi-patterning process
Author(s): Lin Hu; Sunwook Jung; Jianliang Li; Young Kim; Yuval Bar; Granger Lobb; Jim Liang; Atsushi Ogino; John Sturtevant; Todd Bailey
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Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process
Author(s): Ken Furubayashi; Koutarou Sho; Seiro Miyoshi; Shinji Yamaguchi; Kazunori Iida; Satoshi Usui; Tsuyoshi Morisaki; Naoki Sato; Hidefumi Mukai
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Standard cell pin access and physical design in advanced lithography
Author(s): Xiaoqing Xu; Brian Cline; Greg Yeric; David Z. Pan
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Incorporating photomask shape uncertainty in computational lithography
Author(s): Xiaofei Wu; Shiyuan Liu; Andreas Erdmann; Edmund Y. Lam
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Alternative high-resolution lithographic technologies for optical applications
Author(s): Uwe D. Zeitner; Tina Weichelt; Yannick Bourgin; Robert Kinder
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High dynamic grayscale lithography with an LED-based micro-image stepper
Author(s): Hans-Christoph Eckstein; Uwe D. Zeitner; Robert Leitel; Marko Stumpf; Philipp Schleicher; Andreas Bräuer; Andreas Tünnermann
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Firefly: an optical lithographic system for the fabrication of holographic security labels
Author(s): Jorge Calderón; Oscar Rincón; Ricardo Amézquita; Iván Pulido; Sebastián Amézquita; Andrés Bernal; Luis Romero; Viviana Agudelo
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Phase analysis of amplitude binary mask structures
Author(s): Krishnaparvathy Puthankovilakam; Toralf Scharf; Hans Peter Herzig; Uwe Vogler; Arianna Bramati; Reinhard Voelkel
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Patterned wafer geometry (PWG) metrology for improving process-induced overlay and focus problems
Author(s): Timothy A. Brunner; Yue Zhou; Cheuk W. Wong; Bradley Morgenfeld; Gerald Leino; Sunit Mahajan
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Improvement of unbalanced illumination induced telecentricity within the exposure slit
Author(s): Jonghoon Jang; ByeongSoo Lee; Young Seog Kang; Chansam Chang; Jeong-Heung Kong; Young Ha Kim; Wim Bouman; Roelof de Graaf; Stefan Weichselbaum; Richard Droste; Wim P. de Boeij; Bart van Bussel; Patrick Neefs; Arij Rijke
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High-order aberration control during exposure for leading-edge lithography projection optics
Author(s): Yasuhiro Ohmura; Yosuke Tsuge; Toru Hirayama; Hironori Ikezawa; Daisuke Inoue; Yasuhiro Kitamura; Yukio Koizumi; Keisuke Hasegawa; Satoshi Ishiyama; Toshiharu Nakashima; Takahisa Kikuchi; Minoru Onda; Yohei Takase; Akimasa Nagahiro; Susumu Isago; Hidetaka Kawahara
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The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
Author(s): Keisuke Ishida; Takeshi Ohta; Hirotaka Miyamoto; Takahito Kumazaki; Hiroaki Tsushima; Akihiko Kurosu; Takashi Matsunaga; Hakaru Mizoguchi
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NXT:1980Di immersion scanner for 7nm and 5nm production nodes
Author(s): Roelof de Graaf; Stefan Weichselbaum; Richard Droste; Matthew McLaren; Bert Koek; Wim de Boeij
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Next-generation immersion scanner optimizing on-product performance for 7nm node
Author(s): Yasushi Yoda; Akira Hayakawa; Satoshi Ishiyama; Yasuhiro Ohmura; Issei Fujimoto; Toru Hirayama; Yuji Shiba; Kazuo Masaki; Yuichi Shibazaki
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Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)
Author(s): Yannick Bourgin; Daniel Voigt; Thomas Käsebier; Ernst-Bernhard Kley; Uwe D. Zeitner
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Innovative method to suppress local geometry distortions for fabrication of interdigitated electrode arrays with nano gaps
Author(s): S. Partel; G. Urban
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Coherence management in lithography printing systems
Author(s): Johana Bernasconi; Toralf Scharf; Hans Peter Herzig; Reinhard Voelkel; Arianna Bramati
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Fabricate large area and defect free periodic structures with advance achromatic laser interference lithography
Author(s): Yin-Kuang Yang; Yun-Wen Wang; Te-Hsun Lin; Chien-Chung Fu
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Optimizing the lithography model calibration algorithms for NTD process
Author(s): C. M. Hu; Fred Lo; Elvis Yang; T. H. Yang; K. C. Chen
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Source mask optimization using 3D mask and compact resist models
Author(s): Omar El-Sewefy; Ao Chen; Neal Lafferty; Jason Meiring; Angeline Chung; Yee Mei Foong; Kostas Adam; John Sturtevant
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Layer aware source mask target optimization
Author(s): Ao Chen; Yee Mei Foong; Jessy Schramm; Liang Ji; Stephen Hsu; James Guerrero; Xiaoyang Li; Joe Shaw; Joe Wang
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A novel full chip process window OPC based on matrix retargeting
Author(s): Xima Zhang; Zhitang Yu; Qingwei Liu; Xuan Shen; Liguo Zhang; Le Hong; Vlad Liubich; George Lippincott; Cynthia Zhu; James Word
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Simple method for decreasing wafer topography effect for implant mask
Author(s): Taejun You; Taehyeong Lee; Gyun Yoo; Youngjoon Park; Cheolkyun Kim; Donggyu Yim
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Native conflict awared layout decomposition in triple patterning lithography using bin-based library matching method
Author(s): Xianhua Ke; Hao Jiang; Wen Lv; Shiyuan Liu
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Investigation of systematic CD distribution error on intrafield
Author(s): Keunjun Kim; Daewoo Kim; Junghyun Kang; Inseok Jeong; Sungkoo Lee; Hyeongsoo Kim
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Means to improve light source productivity: from proof of concept to field implementation
Author(s): E. Rausa; T. Cacouris; W. Conley; M. Jackson; S. Luo; S. Murthy; G. Rechtsteiner; K. Steiner
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Neon reduction program on Cymer ArF light sources
Author(s): Dinesh Kanawade; Yzzer Roman; Ted Cacouris; Josh Thornes; Kevin O'Brien
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The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation
Author(s): Hirotaka Miyamoto; Takahito Kumazaki; Hiroaki Tsushima; Akihiko Kurosu; Takeshi Ohta; Takashi Matsunaga; Hakaru Mizoguchi
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Rare resource supply crisis and solution technology for semiconductor manufacturing
Author(s): Hitomi Fukuda; Sophia Hu; Youngsun Yoo; Kenji Takahisa; Tatsuo Enami
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Spatial conversion of excimer laser beam
Author(s): Alexander Grishkanich; Alexander Zhevlakov; Sergey Kascheev; Veli Kujanpaa; Timo Savinainen
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Progress on glass ceramic ZERODUR enabling nanometer precision
Author(s): Ralf Jedamzik; Clemens Kunisch; Johannes Nieder; Peter Weber; Thomas Westerhoff
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Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system
Author(s): Honggang Gu; Hao Jiang; Chuanwei Zhang; Xiuguo Chen; Shiyuan Liu
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Confocal position alignment in high-precision wavefront error metrology using Shack-Hartmann wavefront sensor
Author(s): Jiani Su; Zengxiong Lu; Yuejing Qi; Guangyi Liu; Qingbin Meng
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SEM signal emulation for 2D patterns
Author(s): Evgenii Sukhov; Thomas Muelders; Ulrich Klostermann; Weimin Gao; Mariya Braylovska
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Source mask optimization study based on latest Nikon immersion scanner
Author(s): Jun Zhu; Fang Wei; Lijun Chen; Chenming Zhang; Wei Zhang; Hisashi Nishinaga; Omar El-Sewefy; Gen-Sheng Gao; Neal Lafferty; Jason Meiring; Recoo Zhang; Cynthia Zhu
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CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM
Author(s): Young Ki Kim; Pavan Samudrala; Juan-Manuel Gomez; Peter Nikolsky; Roy Anunciado; Maria Barkelid; Shawn Lee; Ye Tian; Justin K. Hanson
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Inverse polarizer on immersion lithography mask
Author(s): Minfeng Chen; Shuo-Yen Chou; Chun-Kuang Chen; Ru-Gun Liu; Tsai-Sheng Gau
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Line edge roughness frequency analysis for SAQP process
Author(s): Lei Sun; Xiaoxiao Zhang; Shimon Levi; Adam Ge; Hua Zhou; Wenhui Wang; Navaneetha Krishnan; Yulu Chen; Erik Verduijn; Ryoung-han Kim
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Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device
Author(s): Jun Amako; Shinozaki Yu
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OPC for curved designs in application to photonics on silicon
Author(s): Bastien Orlando; Vincent Farys; Loïc Schneider; Sébastien Cremer; Sergei V. Postnikov; Matthieu Millequant; Mathieu Dirrenberger; Charles Tiphine; Sébastian Bayle; Céline Tranquillin; Patrick Schiavone
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Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography
Author(s): Lei Wang; Sikun Li; Xiangzhao Wang; Chaoxing Yang; Feng Tang
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