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Proceedings of SPIE Volume 9777

Alternative Lithographic Technologies VIII
Editor(s): Christopher Bencher
Format Member Price Non-Member Price
Softcover $97.50 $130.00

Volume Details

Volume Number: 9777
Date Published: 5 July 2016
Softcover: 48 papers (440) pages
ISBN: 9781510600126

Table of Contents
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Front Matter: Volume 9777
Author(s): Proceedings of SPIE
Lithography alternatives meet design style reality: How do they "line" up?
Author(s): Michael C. Smayling
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Nanoimprint system development and status for high-volume semiconductor manufacturing
Author(s): Tsuneo Takashima; Yukio Takabayashi; Naosuke Nishimura; Keiji Emoto; Takahiro Matsumoto; Tatsuya Hayashi; Atsushi Kimura; Jin Choi; Philip Schumaker
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Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation
Author(s): Sachiko Kobayashi; Motofumi Komori; Inanami Ryoichi; Kyoji Yamashita; Akiko Mimotogi; Ji-Young Im; Masayuki Hatano; Takuya Kono; Shimon Maeda
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Defectivity prediction for droplet-dispensed UV nanoimprint lithography, enabled by fast simulation of resin flow at feature, droplet, and template scales
Author(s): Hayden K. Taylor
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High throughput Jet and Flash Imprint Lithography for semiconductor memory applications
Author(s): Wei Zhang; Brian Fletcher; Ecron Thompson; Weijun Liu; Tim Stachowiak; Niyaz Khusnatdinov; J. W. Irving; Whitney Longsine; Matthew Traub; Van Truskett; Dwayne LaBrake; Zhengmao Ye
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NIL defect performance toward high volume mass production
Author(s): Masayuki Hatano; Kei Kobayashi; Hiroyuki Kashiwagi; Hiroshi Tokue; Takuya Kono; Nakasugi Tetsuro; Eun Hyuk Choi; Wooyung Jung
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Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing
Author(s): Keiji Emoto; Fumio Sakai; Chiaki Sato; Yukio Takabayashi; Hitoshi Nakano; Tsuneo Takabayashi; Kiyohito Yamamoto; Tadashi Hattori; Mitsuru Hiura; Toshiaki Ando; Yoshio Kawanobe; Hisanobu Azuma; Takehiko Iwanaga; Jin Choi; Ali Aghili; Chris Jones; J. W. Irving; Brian Fletcher; Zhengmao Ye
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Experiments towards establishing of design rules for R2R-UV-NIL with polymer working shims
Author(s): Dieter Nees; Stephan Ruttloff; Ursula Palfinger; Barbara Stadlober
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Pattern fidelity improvement of chemo-epitaxy DSA process for high-volume manufacturing
Author(s): Makoto Muramatsu; Takanori Nishi; Gen You; Yusuke Saito; Yasuyuki Ido; Kiyohito Ito; Toshikatsu Tobana; Masanori Hosoya; Weichien Chen; Satoru Nakamura; Mark Somervell; Takahiro Kitano
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DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC
Author(s): Hari Pathangi; Varun Vaid; Boon Teik Chan; Nadia Vandenbroeck; Jin Li; Sung Eun Hong; Yi Cao; Baskaran Durairaj; Guanyang Lin; Mark Somervell; Takahiro Kitano; Ryota Harukawa; Kaushik Sah; Andrew Cross; Hareen Bayana; Lucia D’Urzo; Roel Gronheid
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Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide
Author(s): Seiji Morita; Masahiro Kanno; Ryousuke Yamamoto; Norikatsu Sasao; Shinobu Sugimura
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DSA via hole shrink for advanced node applications
Author(s): Cheng Chi; Chi-Chun Liu; Luciana Meli; Kristin Schmidt; Yongan Xu; Ekmini Anuja DeSilva; Martha Sanchez; Richard Farrell; Hongyun Cottle; Daiji Kawamura; Lovejeet Singh; Tsuyoshi Furukawa; Kafai Lai; Jed W. Pitera; Daniel Sanders; David R. Hetzer; Andrew Metz; Nelson Felix; John Arnold; Matthew Colburn
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New placement estimator for contact hole printed with DSA
Author(s): L. Schneider; V. Farys; E. Serret; C. Fenouillet-Beranger
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Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning
Author(s): Yuansheng Ma; Yan Wang; James Word; Junjiang Lei; Joydeep Mitra; J. Andres Torres; Le Hong; Germain Fenger; Daman Khaira; Moshe Preil; Lei Yuan; Jongwook Kye; Harry J. Levinson
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Investigation of coat-develop track system for placement error of contact hole shrink process
Author(s): Masahiko Harumoto; Harold Stokes; Yuji Tanaka; Koji Kaneyama; Charles Pieczulewski; Masaya Asai; Isabelle Servin; Maxime Argoud; Ahmed Gharbi; Celine Lapeyre; Raluca Tiron; Cedric Monget
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Manufacturability of dense hole arrays with directed self-assembly using the CHIPS flow
Author(s): Arjun Singh; Jaewoo Nam; Jongsu Lee; Boon Teik Chan; Hengpeng Wu; Jian Yin; Yi Cao; Roel Gronheid
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DSA patterning options for FinFET formation at 7nm node
Author(s): Chi-Chun Charlie Liu; Elliott Franke; Fee Li Lie; Stuart Sieg; Hsinyu Tsai; Kafai Lai; Hoa Truong; Richard Farrell; Mark Somervell; Daniel Sanders; Nelson Felix; Michael Guillorn; Sean Burns; David Hetzer; Akiteru Ko; John Arnold; Matthew Colburn
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Process highlights to enhance DSA contact patterning performances
Author(s): A. Gharbi; R. Tiron; M. Argoud; G. Chamiot-Maitral; A. Fouquet; C. Lapeyre; P. Pimenta Barros; A. Sarrazin; I. Servin; F. Delachat; S. Bos; S. Bérard-Bergery; J. Hazart; X. Chevalier; C. Nicolet; C. Navarro; I. Cayrefourcq; S. Bouanani; C. Monget
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Shape optimization for DSA
Author(s): Gaddiel Ouaknin; Nabil Laachi; Kris Delaney; Glenn Fredrickson; Frederic Gibou
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Modeling and parameter tuning for templated directed self-assembly
Author(s): B. Meliorisz; T. Mülders; H.-J. Stock; S. Marokkey; W. Demmerle; K. Lai; A. Raghunathan; P. Dhagat
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Virtual fabrication using directed self-assembly for process optimization in a 14nm DRAM
Author(s): Mattan Kamon; Mustafa Akbulut; Yiguang Yan; Daniel Faken; Andras Pap; Vasanth Allampalli; Ken Greiner; David Fried
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Development of a MEMS electrostatic condenser lens array for nc-Si surface electron emitters of the Massive Parallel Electron Beam Direct-Write system
Author(s): A. Kojima; N. Ikegami; T. Yoshida; H. Miyaguchi; M. Muroyama; S. Yoshida; K. Totsu; N. Koshida; M. Esashi
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Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration
Author(s): Marie-Line Pourteau; Isabelle Servin; Kévin Lepinay; Cyrille Essomba; Bernard Dal'Zotto; Jonathan Pradelles; Ludovic Lattard; Pieter Brandt; Marco Wieland
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Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design
Author(s): Aurélien Fay; Clyde Browning; Pieter Brandt; Jacky Chartoire; Sébastien Bérard-Bergery; Jérôme Hazart; Alexandre Chagoya; Sergei Postnikov; Mohamed Saib; Ludovic Lattard; Patrick Schavione
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Requirements of the e-beam shot quality for mask patterning of the sub-1X device
Author(s): Sinjeung Park; Jongmun Park; Boram Lee; Jin Choi; In Kyun Shin; Chan-Uk Jeon
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Prediction of positioning error in EB lithography
Author(s): Masaki Kimura; Kazuo Goda
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A paradigm shift in patterning foundation from frequency multiplication to edge-placement accuracy: a novel processing solution by selective etching and alternating-material self-aligned multiple patterning
Author(s): Ting Han; Hongyi Liu; Yijian Chen
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Contact hole patterning by electric-field assisted assembly of core-shell nanoparticles
Author(s): Xuexue Guo; Lan Lin; Theresa S. Mayer
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Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns
Author(s): David Lombardo; Piyush Shah; Pengfei Guo; Andrew Sarangan
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Enhanced patterning by tilted ion implantation
Author(s): Sang Wan Kim; Peng Zheng; Kimihiko Kato; Leonard Rubin; Tsu-Jae King Liu
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Exploring the potential of Multiphoton Laser Ablation Lithography (MP-LAL) as a reliable technique for sub-50nm patterning
Author(s): Theodoros Manouras; Evangelos Angelakos; Maria Vamvakaki; Panagiotis Argitis
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Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography
Author(s): Zhidong Du; Ye Wen; Luis Traverso; Anurup Datta; Chen Chen; Xianfan Xu; Liang Pan
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Dots-on-the-fly electron beam lithography
Author(s): Tero J. Isotalo; Tapio Niemi
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Nanoimprint lithography using disposable biomass template
Author(s): Makoto Hanabata; Satoshi Takei; Kigen Sugahara; Shinya Nakajima; Naoto Sugino; Takao Kameda; Jiro Fukushima; Yoko Matsumoto; Atsushi Sekiguchi
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Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers
Author(s): Yung-Chiang Ting; Shyi-Long Shy
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Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production
Author(s): Keisuke Yagawa; Kunihiro Ugajin; Machiko Suenaga; Shingo Kanamitsu; Takeharu Motokawa; Kazuki Hagihara; Yukiyasu Arisawa; Sachiko Kobayashi; Masato Saito; Masamitsu Ito
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Resist roughness improvement by a chemical shrink process
Author(s): Tatsuro Nagahara; Takashi Sekito; Yuriko Matsuura
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Nanoscale patterning in ambient conditions using liquid electromigration
Author(s): Santanu Talukder; Praveen Kumar; Rudra Pratap
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Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process
Author(s): Akihisa Yoshida; Kenji Yoshimoto; Masahiro Ohshima; Katsuyoshi Kodera; Yoshihiro Naka; Hideki Kanai; Sachiko Kobayashi; Simon Maeda; Phubes Jiravanichsakul; Katsutoshi Kobayashi; Hisako Aoyama
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Directed self-assembly of Si-containing and topcoat free block copolymer
Author(s): Tasuku Matsumiya; Takehiro Seshimo; Tsuyoshi Kurosawa; Hitoshi Yamano; Ken Miyagi; Tomotaka Yamada; Katsumi Ohmori
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Numerical placement analysis in hole multiplication patterns for directed self-assembly
Author(s): K. Yamamoto; T. Nakano; M. Muramatsu; H. Genjima; T. Tomita; K. Matsuzaki; T. Kitano
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Grapho-epitaxial sub-10nm line and space patterning using lamellar-forming Si-containing block copolymer
Author(s): Hironobu Sato; Yusuke Kasahara; Naoko Kihara; Yuriko Seino; Ken Miyagi; Shinya Minegishi; Hitoshi Kubota; Katsutoshi Kobayashi; Hideki Kanai; Katsuyoshi Kodera; Yoshiaki Kawamonzen; Masayuki Shiraishi; Hitoshi Yamano; Satoshi Nomura; Tsukasa Azuma; Teruaki Hayakawa
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Sub-10nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers
Author(s): Yuriko Seino; Hironobu Sato; Yusuke Kasahara; Shinya Minegishi; Ken Miyagi; Hitoshi Kubota; Hideki Kanai; Katsuyoshi Kodera; Masayuki Shiraishi; Naoko Kihara; Yoshiaki Kawamonzen; Toshikatsu Tobana; Katsutoshi Kobayashi; Hitoshi Yamano; Tsukasa Azuma; Satoshi Nomura
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Strategies to enable directed self-assembly contact hole shrink for tight pitches
Author(s): Kristin Schmidt; Hitoshi Osaki; Kota Nishino; Martha Sanchez; Chi-Chun Liu; Tsuyoshi Furukawa; Cheng Chi; Jed Pitera; Nelson Felix; Daniel Sanders
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Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers
Author(s): Benjamin D. Nation; Peter J. Ludovice; Clifford L. Henderson
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A route for industry compatible directed self-assembly of high-chi PS-PDMS block copolymers
Author(s): S. Böhme; C. Girardot; J. Garnier; J. Arias-Zapata; S. Arnaud; R. Tiron; O. Marconot; D. Buttard; M. Zelsmann
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Improved cost-effectiveness of the block co-polymer anneal process for DSA
Author(s): Hari Pathangi; Maarten Stokhof; Werner Knaepen; Varun Vaid; Arindam Mallik; Boon Teik Chan; Nadia Vandenbroeck; Jan Willem Maes; Roel Gronheid
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Reversible nano-lithography for commercial approaches
Author(s): Jae Hong Park; Hyun Ik Jang; Woo Choong Kim; Hae Su Yun; Jun Yong Park; Seok Woo Jeon; Hee Yeoun Kim; Chi Won Ahn
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