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Proceedings of SPIE Volume 9658

Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Editor(s): Nobuyuki Yoshioka
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Volume Details

Volume Number: 9658
Date Published: 9 July 2015
: 45 papers (360) pages
ISBN: 9781628418712

Table of Contents
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Front Matter: Volume 9658
Author(s): Proceedings of SPIE
Experimental observation of laser-produced Sn extreme ultraviolet source diameter for high-brightness source
Author(s): Goki Arai; Hiroyuki Hara; Thanh-Hung Dinh; Atsushi Sunahara; Takeshi Higashiguchi
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Evaluation of a dot target based high-brightness microplasma extreme ultraviolet (EUV) source by hydrodynamic simulation
Author(s): Hiroyuki Hara; Goki Arai; Thanh-Hung Dinh; Atsushi Sunahara; Takeshi Higashiguchi
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Pitch-based pattern splitting for 1D layout
Author(s): Ryo Nakayama; Hiroyuki Ishii; Koji Mikami; Koichiro Tsujita; Hidetami Yaegashi; Kenichi Oyama; Michael C. Smayling; Valery Axelrad
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Readability of intentionally degraded two dimensional code marks printed lithographically using a squared optical fiber matrix
Author(s): Jun Watanabe; Jun-ya Iwasaki; Toshiyuki Horiuchi
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High performance ILT for hotspots repair with hierarchical pattern matching
Author(s): Kyohei Sakajiri
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Maskless lithography using point array technique for fine patterns
Author(s): Fumitaka Nakajima; Eiji Ohta; Takashi Nakagawa; Masahiro Tachikawa; Nobuo Takeda; Nirou Nishimoto
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Fabrication of microfluidic paths using thick and vertical resist patterns printed by exposure with intentional large defocus
Author(s): Yuta Morizane; Toshiyuki Horiuchi
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Strategy optimization for mask rule check in wafer fab
Author(s): Chuen Huei Yang; Shaina Lin; Roger Lin; Alice Wang; Rachel Lee; Erwin Deng
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Investigation into causes of resolution degradation in projection exposure using a gradient-index lens array
Author(s): Takanori Sato; Toshiyuki Horiuchi
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Mask CD uniformity improvement by electron scanning exposure based Global Loading Effect Correction
Author(s): Rivan Li; Eric Tian; Irene Shi; Eric Guo; Max Lu
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Effective conflict resolution strategies for SRAF placement
Author(s): Shashidhara K. Ganjugunte; Norbert Strecker; Srividya Jayaram; Pat LaCour; Ilhami Torunoglu
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Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography
Author(s): Naoya Nomura; Kazumasa Okamoto; Hiroki Yamamoto; Takahiro Kozawa; Ryoko Fujiyoshi; Kikuo Umegaki
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The method of quartz damage recovery in the photomask repair process
Author(s): Hoon Namkung; MunSik Kim; EuiSang Park; HoYong Jung; SangPyo Kim; DongGyu Yim
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The study of develop optimization to control various resist defect in Photomask fabrication
Author(s): JongHoon Lim; ByungJu Kim; JaeSik Son; EuiSang Park; SangPyo Kim; DongGyu Yim
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Photomasks for FPD
Author(s): Yasuhiro Kanaya; Tetsuya Iizuka; Takatoshi Tomooka
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EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source
Author(s): Takahiro Fujino; Yusuke Tanaka; Tetsuo Harada; Yutaka Nagata; Takeo Watanabe; Hiroo Kinoshita
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CD measurement point extraction from local dense patterns
Author(s): Masaaki Miyajima; Hiroyuki Matsumoto; Kanji Takeuchi; Mitsufumi Naoe; Koji Hosono; Toru Miyauchi
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Influence of unit process interaction on EUV mask performance
Author(s): Pavel Nesládek; Tereza Steinhartová; Haiko Rolff; Thorsten Schedel; Markus Bender
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Multi-beam SEM technology for ultra-high throughput
Author(s): Thomas Kemen; Tomasz Garbowski; Dirk Zeidler
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Impact of the back side flatness of a mask on the panel overlay
Author(s): Daisuke Kemmochi; Yutaka Yoshikawa; Yoshinori Iwanaga; Termusa Hirano; Hiroshi Kinoshita
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Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer
Author(s): Daniel Chalom; Jan Klikovits; David Geist; Peter Hudek; Stefan Eder-Kapl; Mehdi Daneshpanah; Frank Laske; Stefan Eyring; Klaus-Dieter Roeth
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N7 logic via patterning using templated DSA: implementation aspects
Author(s): J. Bekaert; J. Doise; R. Gronheid; J. Ryckaert; G. Vandenberghe; G. Fenger; Y. J. Her; Y. Cao
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Grab a coffee: your aerial images are already analyzed
Author(s): Anthony Garetto; Thomas Rademacher; Kristian Schulz
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Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks
Author(s): Ryoichi Hirano; Susumu Iida; Tsuyoshi Amano; Hidehiro Watanabe; Masahiro Hatakeyama; Takeshi Murakami; Shoji Yoshikawa; Kenichi Suematsu; Kenji Terao
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Alternative EUV mask technology to compensate for mask 3D effects
Author(s): Lieve Van Look; Vicky Philipsen; Eric Hendrickx; Geert Vandenberghe; Natalia Davydova; Friso Wittebrood; Robert de Kruif; Anton van Oosten; Junji Miyazaki; Timon Fliervoet; Jan van Schoot; Jens Timo Neumann
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Detection capability of Actinic Blank Inspection tool
Author(s): Tomohiro Suzuki; Hiroki Miyai; Kiwamu Takehisa; Haruhiko Kusunose; Hidehiro Watanabe; Ichiro Mori
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Mo/Si multilayer mirrors with 300-bilayers for EUV lithography
Author(s): Satoshi Ichimaru; Masatoshi Hatayama; Tadayuki Ohchi; Satoshi Oku
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Exploring EUV mask backside defectivity and control methods
Author(s): Christina Turley; Jed Rankin; Louis Kindt; Mark Lawliss; Luke Bolton; Kevin Collins; Lin Cheong; Ravi Bonam; Richard Poro; Takeshi Isogawa; Eisuke Narita; Masayuki Kagawa
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Grid-supported EUV pellicles: A theoretical investigation for added value
Author(s): Florian Dhalluin; Laurens de Winter; Luigi Scaccabarozzi; Jack Van der Sanden; Sven Lentzen; Rob Van Gils; Maurice Bogers; Erik Ruinemans; Derk Brouns; Juan Diego Arias Espinoza; Mária Péter; Daniel Smith; Wim Van der Zande; Hans Vermeulen
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Pattern inspection of etched multilayer EUV mask
Author(s): Susumu Iida; Ryoichi Hirano; Tsuyoshi Amano; Hidehiro Watanabe
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Analysis of a low-aspect phase defect for actinic EUVL mask blank inspection
Author(s): Takeshi Yamane; Tomohisa Ino; Hiroki Miyai
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Improvements of AIMS D2DB matching for product patterns
Author(s): Masaharu Nishiguchi; Koichi Kanno; Hiroyuki Miyashita; Kana Ohara; Donghwan Son; Vikram Tolani; Masaki Satake
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Development of new high transmission eaPSM for Negative Tone Development process on wafer
Author(s): Takashi Adachi; Ayako Tani; Yukihiro Fujimura; Shingo Yoshikawa; Katsuya Hayano; Yasutaka Morikawa; Yoichi Miura; Hiroyuki Miyashita
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Study of defect verification based on lithography simulation with a SEM system
Author(s): Shingo Yoshikawa; Nobuaki Fujii; Koichi Kanno; Hidemichi Imai; Katsuya Hayano; Hiroyuki Miyashita; Soichi Shida; Tsutomu Murakawa; Masayuki Kuribara; Jun Matsumoto; Takayuki Nakamura; Shohei Matsushita; Daisuke Hara; Linyong Pang
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EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Author(s): Noriaki Takagi; Hidehiro Watanabe; Dieter Van den Heuvel; Rik Jonckheere; Emily Gallagher
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Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
Author(s): Rik Jonckheere; Erik Verduijn; Genta Watanabe; Norihito Fukugami; Yo Sakata; Yutaka Kodera; Emily Gallagher
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Patterning dependence on the mask defect for extreme ultraviolet lithography
Author(s): Hye-Rim Ji; In-Seon Kim; Guk-Jin Kim; Jin-Goo Park; Min-Su Kim; Micheal Yeung; Eytan Barouch; Hye-Keun Oh
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Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity
Author(s): In-Seon Kim; Michael Yeung; Eytan Barouch; Hye-Keun Oh
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ENDEAVOUR to understand EUV buried defect printability
Author(s): Kazunori Seki; Takeshi Isogawa; Masayuki Kagawa; Shinji Akima; Yutaka Kodera; Karen Badger; Zhengqing John Qi; Mark Lawliss; Jed Rankin; Ravi Bonam
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Automatic classification and accurate size measurement of blank mask defects
Author(s): Samir Bhamidipati; Sankaranarayanan Paninjath; Mark Pereira; Peter Buck
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Development of a reflectometer for a large EUV mirror in NewSUBARU
Author(s): Haruki Iguchi; Hiraku Hashimoto; Masaki Kuki; Tetsuo Harada; Takeo Watanabe; Hiroo Kinoshita
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Challenges and requirements of mask data processing for multi-beam mask writer
Author(s): Jin Choi; Dong Hyun Lee; Sinjeung Park; SookHyun Lee; Shuichi Tamamushi; In Kyun Shin; Chan Uk Jeon
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Study on modeling of resist heating effect correction in EB mask writer EBM-9000
Author(s): Haruyuki Nomura; Takashi Kamikubo; Mizuna Suganuma; Yasuo Kato; Jun Yashima; Noriaki Nakayamada; Hirohito Anze; Munehiro Ogasawara
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Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
Author(s): Pawitter Mangat; Erik Verduijn; Obert R. Wood; Markus P. Benk; Antoine Wojdyla; Kenneth A. Goldberg
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Development of high-transmittance phase-shifting mask for ArF immersion lithography
Author(s): Won-suk Ahn; Hwan-Seok Seo; Ju-Mi Bang; Ji-Young Kim; Jae-Min Song; Byoung-Hoon Seung; Hee-Bom Kim; Chan-Uk Jeon
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