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Proceedings of SPIE Volume 9426

Optical Microlithography XXVIII
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Volume Details

Volume Number: 9426
Date Published: 27 April 2015
Softcover: 69 papers (668) pages
ISBN: 9781628415285

Table of Contents
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Front Matter: Volume 9426
Author(s): Proceedings of SPIE
Optical lithography with and without NGL for single-digit nanometer nodes
Author(s): Burn J. Lin
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Evolving optical lithography without EUV
Author(s): Donis G. Flagello; Stephen P. Renwick
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Mask 3D induced phase and the mitigation by absorber optimization
Author(s): Jo Finders; Jean Galvier
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Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations
Author(s): Weimin Gao; Ivan Ciofi; Yves Saad; Philippe Matagne; Michael Bachmann; Mohamed Oulmane; Werner Gillijns; Kevin Lucas; Wolfgang Demmerle; Thomas Schmoeller
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Impact of bandwidth on contrast sensitive structures for low k1 lithography
Author(s): Will Conley; Simon Hsieh; Paolo Alagna; Yaching Hou; Pedro Martinez
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Solution for high-order distortion on extreme illumination condition using computational prediction method
Author(s): Young-Seog Kang; Hunhwan Ha; Jang-Sun Kim; Ju Hee Shin; Young Ha Kim; Young Sun Nam; Young-Sin Choi; Cedric Affentauschegg; Rob W. van der Heijden; Umar Rizvi; Bernd Geh; Eric Janda; Jan Baselmans; Stefan van der Sanden; Oh-Sung Kwon; Mariya Ponomarenko; Daan Slotboom
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Optimum ArFi laser bandwidth for 10nm node logic imaging performance
Author(s): Paolo Alagna; Omar Zurita; Vadim Timoshkov; Patrick Wong; Gregory Rechtsteiner; Jan Baselmans; Julien Mailfert
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Single lithography exposure edge placement model
Author(s): Jacek K. Tyminski
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Multicolor, visible-light nanolithography
Author(s): John T. Fourkas; Zuleykhan Tomova
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Progresses in 300mm DUV photolithography for the development of advanced silicon photonic devices
Author(s): Charles Baudot; Bertrand Szelag; Nacima Allouti; Corinne Comboroure; Sébastien Bérard-Bergery; Christian Vizioz; Sébastien Barnola; Fabien Gays; Denis Mariolle; Thomas Ferrotti; Aurélie Souhaité; Stéphane Brision; Christophe Kopp; Sylvie Menezo
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Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography
Author(s): Yannick Bourgin; Thomas Siefke; Thomas Käsebier; Ernst-Bernhard Kley; Uwe D. Zeitner
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Optimization methods for 3D lithography process utilizing DMD-based maskless grayscale photolithography system
Author(s): Xiaoxu Ma; Yoshiki Kato; Yoshikazu Hirai; Floris van Kempen; Fred van Keulen; Toshiyuki Tsuchiya; Osamu Tabata
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Mask-induced best-focus-shifts in DUV and EUV lithography
Author(s): Andreas Erdmann; Peter Evanschitzky; Jens Timo Neumann; Paul Gräupner
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Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy
Author(s): Krishnaparvathy Puthankovilakam; Toralf Scharf; Hans Peter Herzig; Tina Weichelt; Uwe Zeitner; Uwe Vogler; Reinhard Voelkel
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Study of cut mask lithography options for sub-20nm metal routing
Author(s): Yan Wang; Ryoung-Han Kim; Lei Yuan; Anindarupa Chunder; Chenchen Wang; Jia Zeng; Youngtag Woo; Jongwook Kye
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Inverse lithography using sparse mask representations
Author(s): Radu C. Ionescu; Paul Hurley; Stefan Apostol
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RET selection on state-of-the-art NAND flash
Author(s): Neal V. Lafferty; Yuan He; Jinhua Pei; Feng Shao; QingWei Liu; Xuelong Shi
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Pixel-based ant colony algorithm for source mask optimization
Author(s): Hung-Fei Kuo; Wei-Chen Wu; Frederick Li
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Low-contrast photoresist development model for OPC application at 10nm node
Author(s): Cheng-En Wu; David Wei; Charlie Zhang; Hua Song
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Characterizing the dependence of thick-mask edge effects on illumination angle using AIMS images
Author(s): Aamod Shanker; Martin Sczyrba; Falk Lange; Brid Connolly; Andrew R. Neureuther; Laura Waller
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Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners
Author(s): Michael Lam; Chris H. Clifford; Michael Oliver; David Fryer; Edita Tejnil; Kostas Adam
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A pattern- and optics-independent compact model of Mask3D under off-axis illumination with significant efficiency and accuracy improvements
Author(s): Hongbo Zhang; Qiliang Yan; David Wei; Ebo Croffie
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Printing circuits with 4nm feature size: similarities and differences between EUV and optical lithographies
Author(s): Michael S Yeung; Eytan Barouch
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Rigorous wafer topography simulation for investigating wafer alignment quality and robustness
Author(s): Nicoló Morgana; Dmitrii Gavrilin; Andreas Greiner; Detlef Hofmann; Itaru Kamohara; Ulrich Klostermann; Holger Moeller; Juergen Preuninger
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Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists
Author(s): Thomas V. Pistor; Chenchen Wang; Yan Wang; Lei Yuan; Jongwook Kye; Yixu Wu; Sohan Mehta; Paul Ackmann
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Alternative to ILT method for high-quality full-chip SRAF insertion
Author(s): Andrey Lutich
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Uncertainty aware site selection method for OPC model calibration
Author(s): Tamer H. Coskun
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Experiments using automated sample plan selection for OPC modeling
Author(s): Ramya Viswanathan; Om Jaiswal; Nathalie Casati; Amr Abdo; James Oberschmidt; Josef Watts; Maria Gabrani
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Optical proximity correction with hierarchical Bayes model
Author(s): Tetsuaki Matsunawa; Bei Yu; David Z. Pan
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Application of SEM-based contours for OPC model weighting and sample plan reduction
Author(s): Marshal Miller; Keiichiro Hitomi; Scott Halle; Ioana Graur; Todd Bailey
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Hot spots prediction after etching process based on defect rate
Author(s): Taiki Kimura; Yuki Watanabe; Toshiya Kotani
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Hybrid OPC flow with pattern search and replacement
Author(s): Piyush Verma; Shikha Somani; Yang Y. Ping; Piyush Pathak; Rani S. Ghaida; Carl P. Babcock; Fadi Batarseh; Jingyu Wang; Sriram Madhavan; Sarah McGowan
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Overlay improvement methods with diffraction based overlay and integrated metrology
Author(s): Young-Sun Nam; Sunny Kim; Ju Hee Shin; Young Sin Choi; Sang Ho Yun; Young Hoon Kim; Si Woo Shin; Jeong Heung Kong; Young Seog Kang; Hun Hwan Ha
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Intra-field overlay correction for illumination based distortion
Author(s): Michael Pike; Timothy Brunner; Bradley Morgenfeld; Nan Jing; Timothy Wiltshire
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Wafer to wafer overlay control algorithm implementation based on statistics
Author(s): Byeong Soo Lee; Young Seog Kang; Jeong Heung Kong; Hyun Woo Hwang; Myeong Gyu Song
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Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node
Author(s): Takayuki Funatsu; Yusaku Uehara; Yujiro Hikida; Akira Hayakawa; Satoshi Ishiyama; Toru Hirayama; Hirotaka Kono; Yosuke Shirata; Yuichi Shibazaki
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New ArF immersion light source introduces technologies for high-volume 14nm manufacturing and beyond
Author(s): T. Cacouris; W. Conley; J. Thornes; T. Bibby; J. Melchior; T. Aggarwal; E. Gross
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Total lithography system based on a new application software platform enabling smart scanner management
Author(s): Hirotaka Kono; Kazuo Masaki; Tomoyuki Matsuyama; Shinji Wakamoto; Seemoon Park; Taro Sugihara; Yuichi Shibazaki
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Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography
Author(s): Takahito Kumazaki; Takeshi Ohta; Keisuke Ishida; Hiroaki Tsushima; Akihiko Kurosu; Kouji Kakizaki; Takashi Matsunaga; Hakaru Mizoguchi
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Immersion and dry scanner extensions for sub-10nm production nodes
Author(s): Stefan Weichselbaum; Frank Bornebroek; Toine de Kort; Richard Droste; Roelof F de Graaf; Rob van Ballegoij; Herman Botter; Matthew G McLaren; Wim P de Boeij
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Comparing the experimental resist image with aerial image intensity in high-NA projection lense
Author(s): Masato Shibuya; Akira Takada; Toshiharu Nakashima
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Advanced process characterization using light source performance modulation and monitoring
Author(s): Paolo Alagna; Omar Zurita; Gregory Rechtsteiner
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Reducing the substrate dependent scanner leveling effect in low-k1 contact printing
Author(s): C. S. Chang; C. F. Tseng; C. H. Huang; Elvis Yang; T. H. Yang; K. C. Chen
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A fast and flexible library-based thick-mask near-field calculation method
Author(s): Xu Ma; Jie Gao; Xuanbo Chen; Lisong Dong; Yanqiu Li
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Focus shift impacted by mask 3D and comparison between Att. PSM and OMOG
Author(s): Yansong Liu; Xiaojing Su; LiSong Dong; Zhiyang Song; Moran Guo; Yajuan Su; Yayi Wei
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120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography
Author(s): Takeshi Ohta; Keisuke Ishida; Takahito Kumazaki; Hiroaki Tsushima; Akihiko Kurosu; Kouji Kakizaki; Takashi Matsunaga; Hakaru Mizoguchi
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Forbidden pitches: causes, source optimization, and their role in design rules
Author(s): Ştefan Apostol; Paul Hurley
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Advanced Mask Aligner Lithography (AMALITH)
Author(s): Reinhard Voelkel; Uwe Vogler; Arianna Bramati
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An improved virtual aberration model to simulate mask 3D and resist effects
Author(s): Reiji Kanaya; Koichi Fujii; Motokatsu Imai; Tomoyuki Matsuyama; Takao Tsuzuki; Qun Ying Lin
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Evaluation of compact models for negative-tone development layers at 20/14nm nodes
Author(s): Ao Chen; Yee Mei Foong; Dong Qing Zhang; Hongxin Zhang; Angeline Chung; David Fryer; Yunfei Deng; Dmitry Medvedev; Yuri Granik
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Photoresist 3D profile related etch process simulation and its application to full chip etch compact modeling
Author(s): Cheng-En Wu; Wayne Yang; Lan Luan; Hua Song
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Resist profile modeling with compact resist model
Author(s): Christian Zuniga; Yunfei Deng; Yuri Granik
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Impacts of post OPC shapes on pattern
Author(s): W. H. Chu; Y. T. Tsai; S. Y. Huang; C. C. Kuo; H. T. Lin
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7nm logic optical lithography with OPC-Lite
Author(s): Michael C. Smayling; Koichiro Tsujita; Hidetami Yaegashi; Valery Axelrad; Ryo Nakayama; Kenichi Oyama; Shohei Yamauchi; Hiroyuki Ishii; Koji Mikami
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OPC solution by implementing fast converging methodology
Author(s): Qing Yang; Yaojun Du
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The comparison of various strategies of setting up an OPC repair flow with respect to process window constraints
Author(s): Yaojun Du; Qing Yang
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Model-based HSF using by target point control function
Author(s): Seongjin Kim; Munhoe Do; Yongbae An; Jaeseung Choi; Hyunjo Yang; Donggyu Yim
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Sub-resolution assist feature (SRAF) printing prediction using logistic regression
Author(s): Chin Boon Tan; Kar Kit Koh; Dongqing Zhang; Yee Mei Foong
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Accurate and fast computation of transmission cross coefficients
Author(s): Ştefan Apostol; Paul Hurley; Radu-Cristian Ionescu
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The study of lithography conditions to use advanced resist performance properly
Author(s): Zhengkai Yang; Wuping Wang; Quan Chen; Hajime Aoyama; Kengo Takemasa; Toshihiko Sei; Tami Miyazawa; Tomoyuki Matsuyama; Chun Shao
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Modeling and simulation of the beam steering unit
Author(s): Jiayun Feng; Xiaoping Li; Xin He; Jinchun Wang
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DUV ArF light source automated gas optimization for enhanced repeatability and availability
Author(s): Tanuj Aggarwal; Kevin O'Brien
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Performance of ETC controller in high-volume production
Author(s): Joshua Thornes; Kevin O'Brien; Hoang Dao; David Dunlap; Ronnie Flores; Matt Lake; Aleks Simic; Brian Wehrung; John Wyman; Will Conley
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Enabling CoO improvement thru green initiatives
Author(s): Eric Gross; G. G. Padmabandu; Richard Ujazdowski; Don Haran; Matt Lake; Eric Mason; Walter Gillespie
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New robust and highly customizable light source management system
Author(s): Yuji Minegishi; Kenji Takahisa; Hideyuki Ochiai; Takeshi Ohta; Tatsuo Enami
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Extending green technology innovations to enable greener fabs
Author(s): Kenji Takahisa; Young Sun Yoo; Hitomi Fukuda; Yuji Minegishi; Tatsuo Enami
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Calibrating etch model with SEM contours
Author(s): François Weisbuch; A. Omran; Kenneth Jantzen
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Source optimization using particle swarm optimization algorithm in photolithography
Author(s): Lei Wang; Sikun Li; Xiangzhao Wang; Guanyong Yan; Chaoxing Yang
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Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality
Author(s): Lina Shen; Sikun Li; Xiangzhao Wang; Guanyong Yan
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