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Proceedings of SPIE Volume 9423

Alternative Lithographic Technologies VII
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Volume Details

Volume Number: 9423
Date Published: 21 April 2015
Softcover: 57 papers (574) pages
ISBN: 9781628415254

Table of Contents
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Front Matter: Volume 9423
Author(s): Proceedings of SPIE
Graphoepitaxial and chemoepitaxial methods for creating line-space patterns at 33nm pitch: comparison to a HVM process
Author(s): Dan B. Millward; Gurpreet S. Lugani; Scott L. Light; Ardavan Niroomand; Phillip D. Hustad; Peter Trefonas; Dung Quach; Valeriy V. Ginzburg
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Implementation of templated DSA for via layer patterning at the 7nm node
Author(s): Roel Gronheid; Jan Doise; Joost Bekaert; Boon Teik Chan; Ioannis Karageorgos; Julien Ryckaert; Geert Vandenberghe; Yi Cao; Guanyang Lin; Mark Somervell; Germain Fenger; Daisuke Fuchimoto
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Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Author(s): Yuansheng Ma; Junjiang Lei; J. Andres Torres; Le Hong; James Word; Germain Fenger; Alexander Tritchkov; George Lippincott; Rachit Gupta; Neal Lafferty; Yuan He; Joost Bekaert; Geert Vanderberghe
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Customization and design of directed self-assembly using hybrid prepatterns
Author(s): Joy Cheng; Gregory S. Doerk; Charles T. Rettner; Gurpreet Singh; Melia Tjio; Hoa Truong; Noel Arellano; Srinivasan Balakrishnan; Markus Brink; Hsinyu Tsai; Chi-Chun Liu; Michael A. Guillorn; Daniel P. Sanders
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Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing
Author(s): Alan G. Jacobs; Clemens Liedel; Christopher K. Ober; Michael O. Thompson
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Nanoimprint system development and status for high volume semiconductor manufacturing
Author(s): Hiroaki Takeishi; S.V. Sreenivasan
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HVM readiness of nanoimprint lithography templates: defects, CD, and overlay
Author(s): Koji Ichimura; Kouji Yoshida; Saburo Harada; Takaharu Nagai; Masaaki Kurihara; Naoya Hayashi
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Advanced electric-field scanning probe lithography on molecular resist using active cantilever
Author(s): Marcus Kaestner; Cemal Aydogan; Hubert-Seweryn Lipowicz; Tzvetan Ivanov; Steve Lenk; Ahmad Ahmad; Tihomir Angelov; Alexander Reum; Valentyn Ishchuk; Ivaylo Atanasov; Yana Krivoshapkina; Manuel Hofer; Mathias Holz; Ivo W. Rangelow
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Optimization of near-field scanning optical lithography
Author(s): Ben S. Routley; John L. Holdsworth; Andrew J. Fleming
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Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition
Author(s): M. Scotuzzi; M. J. Kamerbeek; Andy Goodyear; M. Cooke; C. W. Hagen
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Fabrication of functional electromechanical nanowire resonators by focused ion-beam (FIB) implantation
Author(s): J. Llobet; M. Sansa; X. Borrisé; F. Pérez-Murano; M. Gerbolés
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Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow
Author(s): Hari Pathangi; Boon Teik Chan; Hareen Bayana; Nadia Vandenbroeck; Dieter Van Den Heuvel; Lieve Van Look; Paulina Rincon-Delgadillo; Yi Cao; JiHoon Kim; Guanyang Lin; Doni Parnell; Kathleen Nafus; Ryota Harukawa; Ito Chikashi; Venkat Nagaswami; Lucia D'Urzo; Roel Gronheid; Paul Nealey
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Impact of materials selection on graphoepitaxial directed self-assembly for line-space patterning
Author(s): Dung Quach; Valeriy V. Ginzburg; Mingqi Li; Janet Wu; Shih-wei Chang; Peter Trefonas; Phillip D. Hustad; Dan B. Millward; Gurpreet S. Lugani; Scott L. Light
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Imprint directed self-assembly of cylinder-forming Si-containing block copolymer for 6nm half-pitch line patterning
Author(s): Shuaigang Xiao; XiaoMin Yang; Yautzong Hsu; Kim Y. Lee; David Kuo
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Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process
Author(s): JiHoon Kim; Jian Yin; Yi Cao; YoungJun Her; Claire Petermann; Hengpeng Wu; Jianhui Shan; Tomohiko Tsutsumi; Guanyang Lin
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Fin formation using graphoepitaxy DSA for FinFET device fabrication
Author(s): Chi-Chun Liu; Fee Li Lie; Vinayak Rastogi; Elliott Franke; Nihar Mohanty; Richard Farrell; Hsinyu Tsai; Kafai Lai; Melih Ozlem; Wooyong Cho; Sung Gon Jung; Jay Strane; Mark Somervell; Sean Burns; Nelson Felix; Michael Guillorn; David Hetzer; Akiteru Ko; Matthew Colburn
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Smart plastic functionalization by nanoimprint and injection molding
Author(s): Maksim Zalkovskij; Lasse H. Thamdrup; Kristian Smistrup; Thomas Andén; Alicia C. Johansson; Niels Jørgen Mikkelsen; Morten Hannibal Madsen; Jørgen Garnæs; Tommy Tungelund Kristiansen; Mads Diemer; Michael Døssing; Daniel Minzari; Peter Torben Tang; Anders Kristensen; Rafael Taboryski; Søren Essendrop; Theodor Nielsen; Brian Bilenberg
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Development of NIL processes for PV applications
Author(s): H. Hauser; N. Tucher; K. Tokai; P. Schneider; Ch. Wellens; A. Volk; S. Barke; C. Müller; Thomas Glinsner; B. Bläsi
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Thermal effect induced wafer deformation in high-energy e-beam lithography
Author(s): P.S. Chen; W.C. Wang; S.J. Lin
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Comparison between e-beam direct write and immersion lithography for 20nm node
Author(s): Pieter Brandt; Charu Sardana; Dale Ibbotson; Marco Wieland; Aurélien Fay
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Alternative stitching method for massively parallel e-beam lithography
Author(s): Pieter Brandt; Céline Tranquillin; Marco Wieland; Sébastien Bayle; Matthieu Milléquant; Guillaume Renault
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Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin films deposition in solutions
Author(s): N. Koshida; A. Kojima; N. Ikegami; R. Suda; M. Yagi; J. Shirakashi; T. Yoshida; Hiroshi Miyaguchi; Masanori Muroyama; H. Nishino; S. Yoshida; M. Sugata; Kentaro Totsu; M. Esashi
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Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
Author(s): HsinYu Tsai; Hiroyuki Miyazoe; Joy Cheng; Markus Brink; Simon Dawes; David Klaus; James Bucchignano; Daniel Sanders; Eric Joseph; Matthew Colburn; Michael Guillorn
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Impact of BCP asymmetry on DSA patterning performance
Author(s): Lance Williamson; JiHoon Kim; Yi Cao; Guanyang Lin; Roel Gronheid; Paul F. Nealey
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Directed self-assembly lithography using coordinated line epitaxy (COOL) process
Author(s): Yuriko Seino; Yusuke Kasahara; Hironobu Sato; Katsutoshi Kobayashi; Hitoshi Kubota; Shinya Minegishi; Ken Miyagi; Hideki Kanai; Katsuyoshi Kodera; Naoko Kihara; Yoshiaki Kawamonzen; Toshikatsu Tobana; Masayuki Shiraishi; Satoshi Nomura; Tsukasa Azuma
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Template affinity role in CH shrink by DSA planarization
Author(s): R. Tiron; A. Gharbi; P. Pimenta Barros; S. Bouanani; C. Lapeyre; S. Bos; A. Fouquet; J. Hazart; X. Chevalier; M. Argoud; G. Chamiot-Maitral; S. Barnola; C. Monget; V. Farys; S. Berard-Bergery; L. Perraud; C. Navarro; C. Nicolet; G. Hadziioannou; G. Fleury
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Cross-sectional imaging of directed self-assembly block copolymers
Author(s): Kye Okabe; He Yi; Maryann Tung; Richard Tiberio; Joost Bekaert; Roel Gronheid; H.-S. Philip Wong
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Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing
Author(s): Matt Malloy; Brad Thiel; Benjamin D. Bunday; Stefan Wurm; Maseeh Mukhtar; Kathy Quoi; Thomas Kemen; Dirk Zeidler; Anna Lena Eberle; Tomasz Garbowski; Gregor Dellemann; Jan Hendrik Peters
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Fabrication of NIL templates and diffractive optical elements using the new Vistec SB4050 VSB e-beam writer
Author(s): Joerg Butschke; Mathias Irmscher; Corinna Koepernik; Stephan Martens; Holger Sailer; Bernd Schnabel
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Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Author(s): Christoph Hohle; Kang-Hoon Choi; Manuela Gutsch; Norbert Hanisch; Robert Seidel; Katja Steidel; Xaver Thrun; Thomas Werner
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Ready for multi-beam exposure at 5kV on MAPPER tool: lithographic and process integration performances of advanced resists/stack
Author(s): Isabelle Servin; Ndeye Arame Thiam; Patricia Pimenta-Barros; Marie-Line Pourteau; Armel-Petit Mebiene; Julien Jussot; Jonathan Pradelles; Philippe Essomba; Ludovic Lattard; Pieter Brandt; Marco Wieland
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Contour-based kernel modeling and verification for E-Beam lithography
Author(s): Jan-Wen You; Cheng-Hung Chen; Tsung-Chih Chien; Jaw-Jung Shin; Shy-Jay Lin; Burn J. Lin
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Verification of directed self-assembly (DSA) guide patterns through machine learning
Author(s): Seongbo Shim; Sibo Cai; Jaewon Yang; Seunghune Yang; Byungil Choi; Youngsoo Shin
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Experimental study of sub-DSA resolution assist features (SDRAF)
Author(s): He Yi; Joost Bekaert; Roel Gronheid; Geert Vandenberghe; Kathleen Nafus; H.-S. Philip Wong
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DSA-aware assist features
Author(s): Azat Latypov; Tamer H. Coskun
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Advantages and limitations of density functional theory in block copolymer directed self-assembly
Author(s): Jimmy Liu; Nabil Laachi; Kris T. Delaney; Glenn H. Fredrickson
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Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns
Author(s): Benjamin D. Nation; Andrew Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson
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The effects of geometry and chemistry of nanopatterned substrates on the directed self-assembly of block-copolymer melts
Author(s): Grant Garner; Lance Williamson; Robert Seidel; Paulina Rincon Delgadillo; Su-Mi Hur; Roel Gronheid; Paul F. Nealey; Juan J. de Pablo
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Effect of χN and underlayer composition on self-assembly of thins films of block copolymers with energy asymmetric blocks
Author(s): Richard A Lawson; Andrew J. Peters; Benjamin D. Nation; Peter J. Ludovice; Clifford L. Henderson
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Negative e-beam resists using for nano-imprint lithography and silicone mold fabrication
Author(s): S. L. Shy; Anil Kumar T.V.; Gene Sheu; Shao-Ming Yang; M. C. Chen; C. S. Hong
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Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses
Author(s): Jae Hong Park; Hyun Ik Jang; Jun Yong Park; Seok Woo Jeon; Woo Choong Kim; Hee Yeoun Kim; Chi Won Ahn
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An instruction-based high-throughput lossless decompression algorithm for e-beam direct-write system
Author(s): Cheng-Chi Wu; Jensen Yang; Wen-Chuan Wang; Shy-Jay Lin
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"Fast" and "thick" e-beam resists exposed with multi-beam tool at 5 keV for implants and mature nodes: experimental and simulated model study
Author(s): Aurélien Fay; Ndeye Arame Thiam; Marie-Laure Cordini; Isabelle Servin; Christophe Constancias; Ludovic Lattard; Laurent Pain
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Electric-field assisted assembly of core-shell nanoparticle arrays for contact hole patterning
Author(s): Lan Lin; Xuexue Guo; Theresa S. Mayer
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Photo-induced large-scale circular surface-relief diffraction gratings on azo-glass
Author(s): James Leibold; Ribal Georges Sabat
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Solid immersion optical lithography: tuning the prism/sample interface for improved ultra high-NA, high aspect ratio resist patterns over large exposure fields
Author(s): Sam Lowrey; Richard J. Blaikie
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Computational analysis of hole placement errors for directed self-assembly
Author(s): K. Yamamoto; T. Nakano; M. Muramatsu; T. Tomita; K. Matsuzaki; T. Kitano
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Coarse-grained molecular dynamics modeling of the kinetics of lamellar BCP defect annealing
Author(s): Andrew J. Peters; Richard A. Lawson; Benjamin D. Nation; Peter J. Ludovice; Clifford L. Henderson
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Directed self-assembly of diblock copolymers in cylindrical confinement: effect of underfilling and air-polymer interactions on configurations
Author(s): Corinne L. Carpenter; Kris T. Delaney; Nabil Laachi; Glenn H. Fredrickson
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Tilting of lamellar domains on neutral random copolymer brushes
Author(s): Indranil Mitra; Nikhila Mahadevapuram; Joseph Strzalka; Gila E. Stein
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Mapping self-assembled dots and line arrays by image analysis for quantification of defect density and alignment
Author(s): C. Simão; D. Tuchapsky; W. Khunsin; A. Amann; M. A. Morris; C. M. Sotomayor Torres
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193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study
Author(s): A. Fouquet; L. Perraud; S. Bérard-Bergery; A. Gharbi; P. Pimenta-Barros; R. Tiron; J. Hazart; V. Farys
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Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers
Author(s): Matteo Lorenzoni; Laura Evangelio; Célia Nicolet; Christophe Navarro; Alvaro San Paulo; Francesc Perez Murano
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Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure
Author(s): Laura Evangelio; Marta Fernández-Regúlez; Xavier Borrisé; Matteo Lorenzoni; Jordi Fraxedas; Francesc Pérez-Murano
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Study of DSA interaction range using Gaussian convolution
Author(s): He Yi; Joost Bekaert; Roel Gronheid; Germain Fenger; Kathleen Nafus; H.-S. Philip Wong
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Barriers to defect melting in chemo-epitaxial directed self-assembly of lamellar-forming diblock copolymer/homopolymer blends
Author(s): Kenichi Izumi; Bongkeun Kim; Nabil Laachi; Kris T. Delaney; Michael Carilli; Glenn H. Fredrickson
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Shape change of cured 2D and 3D nanostructures from imprint lithography
Author(s): Meghali J. Chopra; Roger T. Bonnecaze
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