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Proceedings of SPIE Volume 9049

Alternative Lithographic Technologies VI
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Volume Details

Volume Number: 9049
Date Published: 30 April 2014
Softcover: 62 papers (594) pages
ISBN: 9780819499721

Table of Contents
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Front Matter: Volume 9049
Author(s): Proceedings of SPIE
Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow
Author(s): Roel Gronheid; Paulina Rincon Delgadillo; Hari Pathangi; Dieter Van den Heuvel; Doni Parnell; Boon Teik Chan; Yu-Tsung Lee; Lieve Van Look; Yi Cao; YoungJun Her; Guanyang Lin; Ryota Harukawa; Venkat Nagaswami; Lucia D'Urzo; Mark Somervell; Paul Nealey
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Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends
Author(s): Azat Latypov; Tamer H. Coskun; Grant Garner; Moshe Preil; Gerard Schmid; Ji Xu; Yi Zou
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Towards electrical testable SOI devices using Directed Self-Assembly for fin formation
Author(s): Chi-Chun Liu; Cristina Estrada-Raygoza; Hong He; Michael Cicoria; Vinayak Rastogi; Nihar Mohanty; Hsinyu Tsai; Anthony Schepis; Kafai Lai; Robin Chao; Derrick Liu; Michael Guillorn; Jason Cantone; Sylvie Mignot; Ryoung-Han Kim; Joy Cheng; Melia Tjio; Akiteru Ko; David Hetzer; Mark Somervell; Matthew Colburn
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Closed-loop high-speed 3D thermal probe nanolithography
Author(s): A. W. Knoll; M. Zientek; L. L. Cheong; C. Rawlings; P. Paul; F. Holzner; J. L. Hedrick; D. J. Coady; R. Allen; U. Dürig
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Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever
Author(s): Marcus Kaestner; Konrad Nieradka; Tzvetan Ivanov; Steve Lenk; Yana Krivoshapkina; Ahmad Ahmad; Tihomir Angelov; Elshad Guliyev; Alexander Reum; Matthias Budden; Tomas Hrasok; Manuel Hofer; Christian Neuber; Ivo W. Rangelow
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A frequency multiplication technique based on EUV near-field imaging
Author(s): Yijian Chen; Yashesh Shroff
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High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography
Author(s): Sami Sabik; Joris de Riet; Iryna Yakimets; Edsger Smits
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High volume nanoscale roll-based imprinting using jet and flash imprint lithography
Author(s): Se Hyun Ahn; Michael Miller; Shuqiang Yang; Maha Ganapathisubramanian; Marlon Menezes; Vik Singh; Fen Wan; Jin Choi; Frank Xu; Dwayne LaBrake; Douglas J. Resnick; Paul Hofemann; S. V. Sreenivasan
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Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists
Author(s): Manuel W. Thesen; Maximilian Rumler; Florian Schlachter; Susanne Grützner; Christian Moormann; Mathias Rommel; Dieter Nees; Stephan Ruttloff; Stefan Pfirrmann; Marko Vogler; Arne Schleunitz; Gabi Grützner
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Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography
Author(s): Ryoichi Inanami; Kazuto Matsuki; Tomoko Ojima; Takuya Kono; Tetsuro Nakasugi
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Size and shape control of sub-20nm patterns fabricated using focused electron beam induced processing
Author(s): S. Hari; C. W. Hagen; T. Verduin; P. Kruit
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Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate
Author(s): James H. Smith; Nigel Crosland; Samuel Doran; Robert C. Dowling; John G. Hartley; Philip C. Hoyle; David M. P. King; Lawrence Kutcher; Andrew McClelland; Martin Turnidge
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Improvements of self-assembly properties via homopolymer addition or block-copolymer blends
Author(s): X. Chevalier; C. Nicolet; R. Tiron; Ahmed Gharbi; M. Argoud; C. Couderc; Guillaume Fleury; G. Hadziioannou; I. Iliopoulos; C. Navarro
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Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly
Author(s): Thomas Bennett; Kevin Pei; Han-Hao Cheng; Kristofer J. Thurecht; Kevin S. Jack; Idriss Blakey
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Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers
Author(s): Richard A. Lawson; Andrew J. Peters; Benjamin Nation; Peter J. Ludovice; Clifford L. Henderson
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Guided self-assembly of Si-containing block copolymer with a topcoat surface treatment
Author(s): Takehiro Seshimo; Yoshiyuki Utsumi; Takahiro Dazai; Takaya Maehashi; Katsumi Ohmori
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Self-assembly of high-resolutions PS-b-PMMA block-copolymers: processes capabilities and integration on 300mm track
Author(s): X. Chevalier; C. Nicolet; R. Tiron; A. Gharbi; G. Chamiot-Maitral; K. Jullian; P. Pimenta-Barros; M. Argoud; J.-L. Peyre; R. Van Spaandonk; G. Fleury; G. Hadziioannou; C. Navarro
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Hard disk drive thin film head manufactured using nanoimprint lithography
Author(s): Daniel B. Sullivan; Thomas Boonstra; Mark T. Kief; Lily Youtt; Sethuraman Jayashankar; Carolyn Van Dorn; Harold Gentile; Sriram Viswanathan; Dexin Wang; Dion Song; Dongsung Hong; Sung-Hoon Gee
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High-throughput jet and flash imprint lithography for advanced semiconductor memory
Author(s): Niyaz Khusnatdinov; Zhengmao Ye; Kang Luo; Tim Stachowiak; Xiaoming Lu; J. W. Irving; Matt Shafran; Whitney Longsine; Matthew Traub; Van Truskett; Brian Fletcher; Weijun Liu; Frank Xu; Dwayne LaBrake; S. V. Sreenivasan; Douglas J. Resnick
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The prospects of design for roll to roll lithography: layout refinement utilizing process simulation
Author(s): Sachiko Kobayashi; Mitsuko Shimizu; Satoshi Tanaka; Yohko Furutono; Masayuki Hatano; Kazuto Matsuki; Ryoichi Inanami; Shoji Mimotogi
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Demonstration of EDA flow for massively parallel e-beam lithography
Author(s): P. Brandt; J. Belledent; C. Tranquillin; T. Figueiro; S. Meunier; S. Bayle; A. Fay; M. Milléquant; B. Icard; M. Wieland
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The REBL DPG: recent innovations and remaining challenges
Author(s): Allen Carroll; Luca Grella; Kirk Murray; Mark A. McCord; Paul Petric; William M. Tong; Christopher F. Bevis; Shy-Jay Lin; Tsung-Hsin Yu; Tze-Chiang Huang; T. P. Wang; Wen-Chuan Wang; J. J. Shin
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Massively parallel electron beam direct writing (MPEBDW) system based on micro-electro-mechanical system (MEMS)/nanocrystalineSi emitter array
Author(s): A. Kojima; N. Ikegami; T. Yoshida; H. Miyaguchi; M. Muroyama; H. Nishino; S. Yoshida; M. Sugata; H. Ohyi; N. Koshida; M. Esashi
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Tuning the strength of chemical patterns for directed self-assembly of block copolymers
Author(s): Lance Williamson; Guanyang Lin; Yi Cao; Roel Gronheid; Paul Nealey
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Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers
Author(s): Benjamin D. Nation; Andrew Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson
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Directed self-assembly of diblock copolymers in laterally confining channels: line-edge-roughness and defectivity
Author(s): Bongkeun Kim; Nabil Laachi; Kris T. Delaney; Glenn H. Fredrickson
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Nanoimprint lithography process chains for the fabrication of micro- and nanodevices
Author(s): Helmut Schift
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New lithography technology for sub-10nm patterning with shrinking organic material
Author(s): Seiji Morita
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A full-chip DSA correction framework
Author(s): Wei-Long Wang; Azat Latypov; Yi Zou; Tamer Coskun
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DFM for defect-free DSA hole shrink process
Author(s): Ken Fukawatase; Kenji Yoshimoto; Masahiro Ohshima; Yoshihiro Naka; Shimon Maeda; Satoshi Tanaka; Seiji Morita; Hisako Aoyama; Shoji Mimotogi
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Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Author(s): A. Romo-Negreira; T. R. Younkin; R. Gronheid; S. Demuynck; N. Vandenbroeck; T. Seo; D. J. Guerrero; D. Parnell; M. Muramatsu; S. Kawakami; T. Yamauchi; K. Nafus; M. H. Somervell
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Field-theoretic simulations of directed self-assembly in cylindrical confinement: placement and rectification aspects
Author(s): Nabil Laachi; Tatsuhiro Iwama; Kris T. Delaney; Bongkeun Kim; Robert Bristol; David Shykind; Corey J. Weinheimer; Glenn H. Fredrickson
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Contact holes patterning by directed self-assembly of block copolymers: What would be the Bossung plot?
Author(s): A. Gharbi; R. Tiron; M. Argoud; X. Chevalier; J. Belledent; J. Pradelles; P. Pimenta Barros; C. Navarro; C. Nicolet; G. Hadziioannou; G. Fleury; S. Barnola
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Influence of litho patterning on DSA placement errors
Author(s): Sander Wuister; Tamara Druzhinina; Davide Ambesi; Bart Laenens; Linda He Yi; Jo Finders
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Novel fluorinated compounds that improve durability of antistick layer for quartz mold
Author(s): Tsuneo Yamashita; Hisashi Mitsuhashi; Masamichi Morita; Shuso Iyoshi; Makoto Okada; Shinji Matsui
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Molecular glass resists for scanning probe lithography
Author(s): Christian Neuber; Andreas Ringk; Tristan Kolb; Florian Wieberger; Peter Strohriegl; Hans-Werner Schmidt; Vincent Fokkema; Mike Cooke; Colin Rawlings; Urs Dürig; Armin W. Knoll; Jean-Francois de Marneffe; Peter De Schepper; Marcus Kaestner; Yana Krivoshapkina; Matthias Budden; Ivo W. Rangelow
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REBL DPG lenslet structure: design for charging prevention
Author(s): Shy-Jay Lin; T. I. Bao; C. W. Lu; S.-C. Wang; T. C. Chien; J.-J. Shin; Burn J. Lin; Mark A. McCord; Alan Brodie; Allen Carroll; Luca Grella
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Analysis of mix-and-match litho approach for manufacturing 20nm logic-node products
Author(s): Yayi Wei; Chao Zhao; Tianchun Ye
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A shape-modification strategy of electron-beam direct writing considering circuit performance in LSI interconnects
Author(s): Yoshihiro Midoh; Atsushi Osaki; Koji Nakamae
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DSA template optimization for contact layer in 1D standard cell design
Author(s): Zigang Xiao; Yuelin Du; Haitong Tian; Martin D. F. Wong; He Yi; H.-S. Philip Wong
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Simulation analysis of directed self-assembly for hole multiplication in guide pattern
Author(s): M. Muramatsu; T. Nakano; T. Tomita; K. Yamamoto; K. Matsuzaki; T. Kitano
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Self-consistent field theory of directed self-assembly on chemically prepatterned surfaces
Author(s): Kenichi Izumi; Nabil Laachi; XingKun Man; Kris T. Delaney; Glenn H. Fredrickson
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Towards the fast DSA: improvement of computational performance of the DSA model
Author(s): Azat Latypov
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Self-assembly of Si-containing block copolymers with high-segregation strength: toward sub-10nm features in directed self-assembly
Author(s): C. Reboul; G. Fleury; K. Aissou; C. Brochon; E. Cloutet; C. Nicolet; X. Chevalier; C. Navarro; R. Tiron; G. Cunge; G. Hadziioannou
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Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory
Author(s): Katsuyoshi Kodera; Hironobu Sato; Hideki Kanai; Yuriko Seino; Naoko Kihara; Yusuke Kasahara; Katsutoshi Kobayashi; Ken Miyagi; Shinya Minegishi; Koichi Yatsuda; Tomoharu Fujiwara; Noriyuki Hirayanagi; Yoshiaki Kawamonzen; Tsukasa Azuma
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Computational studies of shape rectification in directed self-assembly
Author(s): Tatsuhiro Iwama; Nabil Laachi; Kris T. Delaney; Bongkeun Kim; Glenn H. Fredrickson
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300mm pilot line DSA contact hole process stability
Author(s): M. Argoud; I. Servin; A. Gharbi; P. Pimenta Barros; K. Jullian; M. Sanche; G. Chamiot-Maitral; S. Barnola; R. Tiron; C. Navarro; X. Chevalier; C. Nicolet; G. Fleury; G. Hadziioannou; M. Asai; C. Pieczulewski
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Streamlined etch integration with a unique neutral layer for self-assembled block copolymers (BCPs)
Author(s): Mary Ann Hockey; Kui Xu; Yubao Wang; Douglas J. Guerrero; Eric Calderas
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Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing
Author(s): Alan G. Jacobs; Byungki Jung; Christopher K. Ober; Michael O. Thompson
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Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly
Author(s): Hao Yun Yu; Chun-Hung Liu; Yu Tian Shen; Hsuan-Ping Lee; Kuen Yu Tsai
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Inspection of directed self-assembly defects
Author(s): Chikashi Ito; Stephane Durant; Steve Lange; Ryota Harukawa; Takemasa Miyagi; Venkat Nagaswami; Paulina Rincon Delgadillo; Roel Gronheid; Paul Nealey
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Understanding defects in DSA: calculation of free energies of block copolymer DSA systems via thermodynamic integration of a mesoscale block-copolymer model
Author(s): Andrew J. Peters; Richard A. Lawson; Benjamin D. Nation; Peter J. Ludovice; Clifford L. Henderson
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Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns
Author(s): Arjun Singh; Boon Teik Chan; Yi Cao; Guanyang Lin; Roel Gronheid
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Scanner effects on directed self-assembly patterning
Author(s): Stephen P. Renwick
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DSA-aware detailed routing for via layer optimization
Author(s): Yuelin Du; Zigang Xiao; Martin D. F. Wong; He Yi; H.-S. Philip Wong
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Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication
Author(s): Benjamin D. Nation; Andrew Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson
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Multiscale DSA simulations for efficient hotspot analysis
Author(s): Yoshihiro Hori; Kenji Yoshimoto; Takashi Taniguchi; Masahiro Ohshima
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Development of fast DSA simulation method using OCTA system
Author(s): Hiroshi Morita
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A single-nanometer nanoimprint-mask fabrication by EB lithography followed by nanoimprinting and self-aligned double-patterning
Author(s): Hideo Kobayashi; Kouta Suzuki; Hiromasa Iyama; Shuji Kishimoto; Takeshi Kagatsume; Takashi Sato; Tsuyoshi Watanabe
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Investigation of the resist outgassing and hydrocarbonaceous contamination induced in multi-electron-beam lithography tools
Author(s): A.-P. Mebiene-Engohang; M. L. Pourteau; J. C. Marusic; L. Pain; T. Nakayama; A. Miyake; M. Smits; S. David; S. Labau; J. Boussey
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Fluorine coatings for nanoimprint lithography masks
Author(s): Thomas E. Seidel; Alexander Goldberg; Mathew D. Halls
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Photoinhibited superresolution lithography: overcoming chemical blur
Author(s): Darren L. Forman; Robert R. McLeod
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Making the impossible: dealing with patterns throughout the design and manufacturing flow (Presentation Recording)
Author(s): Joseph D. Sawicki
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Beyond scaling: opportunities and approaches (Presentation Recording)
Author(s): Akihisa Sekiguchi
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