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Proceedings of SPIE Volume 8701

Photomask and Next-Generation Lithography Mask Technology XX
Editor(s): Kokoro Kato
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Volume Details

Volume Number: 8701
Date Published: 2 July 2013
Softcover: 42 papers (378) pages
ISBN: 9780819494917

Table of Contents
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Front Matter: Volume 8701
Author(s): Proceedings of SPIE
EUV scanner throughput considerations for the higher mask magnification
Author(s): Kiwamu Takehisa
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Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM
Author(s): Keisuke Ito; Tsutomu Murakawa; Naoki Fukuda; Soichi Shida; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura; Shohei Matsushita; Kazuyuki Hagiwara; Daisuke Hara
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Phase imaging of EUV masks using a lensless EUV microscope
Author(s): Tetsuo Harada; Masato Nakasuji; Yutaka Nagata; Takeo Watanabe; Hiroo Kinoshita
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A very fast and accurate rigorous EMF simulator for EUVL masks based on the pseudo-spectral time-domain method
Author(s): Michael Yeung; Eytan Barouch
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Advancements in automatic marking with range pattern matching
Author(s): D. Salazar; J. Valadez
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Comparison techniques for VSB fractured vs. unfractured data
Author(s): D. Salazar; J. Valadez
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Projection exposure using a projector with highly minute liquid crystal display panels
Author(s): Soichiro Koyama; Kenji Saito; Toshiyuki Horiuchi
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Fuzzy pattern matching techniques for photomask layout data
Author(s): Kokoro Kato; Yoshiyuki Taniguchi; Kuninori Nishizawa
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A method of utilizing AIMS to quantify substrate/attenuator over-etch or under-etch during mask repair
Author(s): Vahagn Sargsyan; Kevin Olson; Doug Uzzel; Jon Morgan; Mark Ma; Gilles Tabbone; Anthony Garetto
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Effect of cleaning chemistry on MegaSonic damage
Author(s): Sherjang Singh; Uwe Dietze; Peter Dress
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Investigation of cleaning process induced CD shift at EUV mask
Author(s): Pavel Nesladek; Florian Schunke; Stefan Rümmelin; Kornelia Dittmar
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Defect printability studies at SEMATECH
Author(s): Il-Yong Jang; Ranganath Teki; Vibhu Jindal; Frank Goodwin; Masaki Satake; Ying Li; Danping Peng; Sungmin Huh; Seong-Sue Kim
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Mask degradation monitoring with aerial mask inspector
Author(s): Wen-Jui Tseng; Yung-Ying Fu; Shih-Ping Lu; Ming-Sian Jiang; Jeffrey Lin; Clare Wu; Sivan Lifschitz; Aviram Tam
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High resolution technology for FPD lithography tools
Author(s): Nobuhiko Yabu; Yoshiyuki Nagai; Satoshi Tomura; Tomohiro Yoshikawa
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In collaboration with mask suppliers for change management enhancement
Author(s): Erwin Deng; Chun Der Lee; Rachel Lee
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Quality enhancement of parallel MDP flows with mask suppliers
Author(s): Erwin Deng; Rachel Lee; Chun Der Lee
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Layout finishing of a 28nm, 3 billions transistors, multi-core processor
Author(s): Philippe Morey-Chaisemartin; Eric Beisser
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A study of applications scribe frame data verifications using design rule check
Author(s): Shoko Saito; Masaru Miyazaki; Mitsuo Sakurai; Takahisa Itoh; Kazumasa Doi; Norioko Sakurai; Tomoyuki Okada
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Better numerical model for shape-dependent dose margin correction using model-based mask data preparation
Author(s): Yasuki Kimura; Takao Kubota; Kenji Kouno; Kazuyuki Hagiwara; Shohei Matsushita; Daisuke Hara
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A novel algorithm for notch detection
Author(s): C. Acosta; D. Salazar; D. Morales
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Physical force optimization for advanced photomask cleaning
Author(s): C. W. Shen; K. W. Lin; C. L. Lu; Luke Hsu; Angus Chin; Anthony Yen
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Circle pattern detector & VSB shot count estimator
Author(s): Sebastian Munoz; Raghava Kondepudy
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Using a mask rule checker as an electrical rule checker
Author(s): Philippe Morey-Chaisemartin; Eric Beisser
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Development of the CLIOS G821 system for inspection of LSPM for high-definition FPDs
Author(s): Makoto Takano; Mitsuru Hamakawa; Masahiro Toriguchi; Shinya Kuroda; Atsushi Tajima
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Next generation electron beam lithography system F7000 for wide range applications
Author(s): Hirofumi Hayakawa; Masahiro Takizawa; Masaki Kurokawa; Akiyoshi Tsuda; Masami Takigawa; Shin-ichi Hamaguchi; Akio Yamada; Kiichi Sakamoto; Takayuki Nakamura
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Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly
Author(s): Hideaki Hashimoto; Nobutaka Kikuiri; Eiji Matsumoto; Hideo Tsuchiya; Riki Ogawa; Ikunao Isomura; Manabu Isobe; Kenichi Takahara
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Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers
Author(s): Karen Badger; Emily Gallagher; Kazunori Seki; Gregory McIntyre; Toshio Konishi; Yutaka Kodera; Vincent Redding
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Megasonic cleaning: effect of dissolved gas properties on cleaning
Author(s): Hrishi Shende; Sherjang Singh; James Baugh; Uwe Dietze; Peter Dress
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Modeling of resist surface charging effect on EBM-8000 and its comparison with EBM-6000
Author(s): Noriaki Nakayamada; Takashi Kamikubo; Hirohito Anze; Munehiro Ogasawara
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Challenge for under 40nm size pattern making for EUV mask
Author(s): Tsukasa Abe; Yuichi Inazuki; Yukie Kobayashi; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi
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Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation
Author(s): Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao; Kenji Watanabe; Yoshihiko Naito; Tsuyoshi Amano; Ryoichi Hirano; Susumu Iida; Tsuneo Terasawa; Hidehiro Watanabe
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Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks
Author(s): Ryoichi Hirano; Susumu Iida; Tsuyoshi Amano; Tsuneo Terasawa; Hidehiro Watanabe; Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao
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In-situ repair qualification by applying Computational Metrology and Inspection (CMI) technologies
Author(s): C. Y. Chen; Ivan Wei; Laurent Tuo; C. S. Yoo; Dongxue Chen; Danping Peng; Masaki Satake; Bo Su; Linyong Pang
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The capability of high magnification review function for EUV actinic blank inspection tool
Author(s): Hiroki Miyai; Tomohiro Suzuki; Kiwamu Takehisa; Haruhiko Kusunose; Takeshi Yamane; Tsuneo Terasawa; Hidehiro Watanabe; Ichiro Mori
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Using pattern shift to avoid blank defects during EUVL mask fabrication
Author(s): Yoshiyuki Negishi; Yuki Fujita; Kazunori Seki; Toshio Konishi; Jed Rankin; Steven Nash; Emily Gallagher; Alfred Wagner; Peter Thwaite; Ahmad Elayat
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Improvement of EUVL mask structure with black border of etched multilayer
Author(s): Kosuke Takai; Koji Murano; Eiji Yamanaka; Shinji Yamaguchi; Masato Naka; Takashi Kamo; Naoya Hayashi
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Background level analysis on an actinic inspection image of EUVL mask blank
Author(s): Takeshi Yamane; Myoungsoo Lee; Tsuneo Terasawa
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Exploring probability of shallow ML defect impact to defect assurance
Author(s): Kazuaki Matsui; Noriaki Takagi; Satoshi Takahashi; Yutaka Kodera; Yo Sakata; Shinji Akima
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A study of phase defect measurement on EUV mask by multiple detectors CD-SEM
Author(s): Isao Yonekura; Hidemitsu Hakii; Shinya Morisaki; Tsutomu Murakawa; Soichi Shida; Masayuki Kuribara; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura
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Verification: an enabler for model based data preparation
Author(s): Patrick Schiavone; Alexandre Chagoya; Luc Martin; Vincent Annezo; Alexis Blanchemain
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EUV reticle inspection with a 193nm reticle inspector
Author(s): William Broadbent; Gregg Inderhees; Tetsuya Yamamoto; Isaac Lee; Phillip Lim
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Progressive defects caused by crosstalk between mask fabrication processes
Author(s): Jongkeun Oh; Junyeol Choi; Jaehyuck Choi; Han-shin Lee; Hyungho Koh; Byunggook Kim; Chanuk Jeon
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E-beam resist outgassing for study of correlation between resist sensitivity and e-beam optic contamination
Author(s): Sung-Il Lee; Yun Song Jeong; Cheol Hong Park; Hee Bom Kim; Inkyun Shin; Chan-Uk Jeon
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Extending DUV mask inspection tool for inspecting 2xnm HP and beyond
Author(s): Jihoon Na; Sang Hoon Han; Gisung Yoon; Dong Hoon Chung; Byung-Gook Kim; Chanuk Jeon; Dana Bernstein; Lior Shoval; Ido Dolev; Ofer Shopen; Ju Sang Lee; Chung ki Lyu; Seung Ryong Bae
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