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Proceedings of SPIE Volume 8683

Optical Microlithography XXVI
Editor(s): Will Conley
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Volume Details

Volume Number: 8683
Date Published: 26 April 2013
Softcover: 78 papers (766) pages
ISBN: 9780819494658

Table of Contents
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Front Matter: Volume 8683
Author(s): Proceedings of SPIE
Computational aspects of optical lithography extension by directed self-assembly
Author(s): Kafai Lai; Chi-chun Liu; Jed Pitera; Daniel J. Dechene; Anthony Schepis; Jassem Abdallah; Hsinyu Tsai; Mike Guillorn; Joy Cheng; Gregory Doerk; Melia Tjio; Charles Rettner; Olalekan Odesanya; Melih Ozlem; Neal Lafferty
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Sub-12nm optical lithography with 4x pitch division and SMO-lite
Author(s): Michael C. Smayling; Koichiro Tsujita; Hidetami Yaegashi; Valery Axelrad; Tadashi Arai; Kenichi Oyama; Arisa Hara
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Impact of process decisions and alignment strategy on overlay for the 14nm node
Author(s): David Laidler; Koen D’havé; Philippe Leray; Jan Hermans; Juergen Boemmels; Shaunee Cheng; Huixiong Dai; Yongmei Chen; Bencherki Mebarki; Chris Ngai
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The impact of 14-nm photomask uncertainties on computational lithography solutions
Author(s): John Sturtevant; Edita Tejnil; Tim Lin; Steffen Schultze; Peter Buck; Franklin Kalk; Kent Nakagawa; Guoxiang Ning; Paul Ackmann; Fritz Gans; Christian Buergel
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An investigation into scalability and compliance for triple patterning with stitches for metal 1 at the 14nm node
Author(s): Christopher Cork; Alexander Miloslavsky; Paul Friedberg; Gerry Luk-Pat
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Robust SMO methodology for exposure tool and mask variations in high volume production
Author(s): Takaki Hashimoto; Yasunobu Kai; Kazuyuki Masukawa; Shigeki Nojima; Toshiya Kotani
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Imaging application tools for extremely low-k1 ArF immersion lithography
Author(s): Shinichi Mori; Hajime Aoyama; Taro Ogata; Ryota Matsui; Tomoyuki Matsuyama
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Study of recent CFD-based scheme for analyzing 3D mask effects
Author(s): M. Takahashi; K. Kodera; M. Motokubota; Y. Kawabata; S. Maeda; S. Nojima; S. Tanaka; S. Mimotogi
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The effect of mask and source complexity on source mask optimization
Author(s): Seung-Hune Yang; Ningning Jia; SeongBo Shim; Dmitry Vengertsev; Jungdal Choi; Ho-Kyu Kang; Young-Chang Kim
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Illumination pupilgram control using an intelligent illuminator
Author(s): Noriyuki Hirayanagi; Yasushi Mizuno; Masakazu Mori; Naonori Kita; Ryota Matsui; Tomoyuki Matsuyama
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Inverse lithography technique for advanced CMOS nodes
Author(s): Alexandre Villaret; Alexander Tritchkov; Jorge Entradas; Emek Yesilada
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Mask compensation for process flare in 193nm very low k1 lithography
Author(s): Jeonkyu Lee; Taehyeong Lee; Sangjin Oh; Chunsoo Kang; Jungchan Kim; Jaeseung Choi; Chanha Park; Hyunjo Yang; Donggyu Yim; Munhoe Do; Irene Su; Hua Song; Jung-Hoe Choi; Yongfa Fan; Anthony Chunqing Wang; Sung-Woo Lee; Robert Boone; Kevin Lucas
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Pupil wavefront manipulation to compensate for mask topography effects in optical nanolithography
Author(s): Monica Kempsell Sears; Bruce W. Smith
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Effective model-based SRAF placement for full chip 2D layouts
Author(s): Srividya Jayaram; Pat LaCour; James Word; Alexander Tritchkov
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Wafer topography modeling for ionic implantation mask correction dedicated to 2x nm FDSOI technologies
Author(s): Jean-Christophe Michel; Jean-Christophe Le Denmat; Elodie Sungauer; Frédéric Robert; Emek Yesilada; Ana-Maria Armeanu; Jorge Entradas; John L. Sturtevant; Thuy Do; Yuri Granik
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Enabling reverse tone imaging for via levels using attenuated phase shift mask and source optimization
Author(s): Bassem Hamieh; Hyun Chol Choi; Burcin Erenturk; Wei Guo; Ayman Hamouda; Huikan Liu; Gregory McIntyre; Jason Meiring; David Moreau; Alan Thomas; Alexander Wei
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Introducing a novel flow to estimate challenges encountered while transitioning from RET development to manufacturable solution
Author(s): Jacky Cheng; Robin Chia; Ying Gong; Omar ElSewefy; GekSoon Chua; YeeMei Foong; Aasutosh Dave; Alvin Chua; DongQing Zhang; Vlad Liubich; Pat Lacour; Alex Tritchkov
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Manufacturability of computation lithography mask: current limit and requirements for sub-20nm node
Author(s): Jin Choi; In-Yong Kang; Ji Soong Park; In Kyun Shin; Chan-Uk Jeon
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The impact of realistic source shape and flexibility on source mask optimization
Author(s): Hajime Aoyama; Yasushi Mizuno; Noriyuki Hirayanagi; Naonori Kita; Ryota Matsui; Hirohiko Izumi; Keiichi Tajima; Joachim Siebert; Wolfgang Demmerle; Tomoyuki Matsuyama
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Source and mask optimization to mitigate hotspots in etch process
Author(s): Yuko Kono; Yasunobu Kai; Kazuyuki Masukawa; Sayaka Tamaoki; Takaki Hashimoto; Taiki Kimura; Ryota Aburada; Toshiya Kotani
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Global source optimization for MEEF and OPE
Author(s): Ryota Matsui; Tomoya Noda; Hajime Aoyama; Naonori Kita; Tomoyuki Matsuyama; Donis Flagello
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Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.
Author(s): Jos Benschop; Andre Engelen; Hugo Cramer; Michael Kubis; Paul Hinnen; Hans van der Laan; Kaustuve Bhattacharyya; Jan Mulkens
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Mix-and-match overlay performance of the NSR-S622D immersion scanner
Author(s): Katsushi Makino; Takahisa Kikuchi; Satoru Sasamoto; Park Hongki; Akiko Mori; Nobuyuki Takahashi; Shinji Wakamoto
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Lithography imaging control by enhanced monitoring of light source performance
Author(s): Paolo Alagna; Omar Zurita; Ivan Lalovic; Nakgeuon Seong; Gregory Rechsteiner; Joshua Thornes; Koen D'havé; Lieve Van Look ; Joost Bekaert
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Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography
Author(s): Kazuya Fukuhara; Akiko Mimotogi; Takuya Kono; Hajime Aoyama; Taro Ogata; Naonori Kita; Tomoyuki Matsuyama
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Compact OPC model optimization using emulated data
Author(s): Artak Isoyan; Thomas Mülders; Craig Westwood; Lawrence S. Melvin
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A study on the automation of scanner matching
Author(s): Yuan He; Alexander Serebryakov; Scott Light; Vivek Jain; Erik Byers; Ronald Goossens; Zhi-Yuan Niu; Peter Engblom; Scott Larson; Bernd Geh; Craig Hickman; Hoyoung Kang
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Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device
Author(s): Manseung Seo; Haeryung Kim
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Simulation of spacer-based SADP (Self-Aligned Double-Patterning) for 15nm half pitch
Author(s): Stewart Robertson; Patrick Wong; Janko Versluijs; Vincent Wiaux
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A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling
Author(s): Yijian Chen; Weiling Kang; Pan Zhang
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Grayscale lithography: 3D structuring and thickness control
Author(s): Marcel Heller; Dieter Kaiser; Maik Stegemann; Georg Holfeld; Nicoló Morgana; Jens Schneider; Daniel Sarlette
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Sidewall profile inclination modulation mask (SPIMM): modification of an attenuated phase-shift mask for single-exposure double and multiple patterning
Author(s): Frederick T. Chen; Wei-Su Chen; Ming-Jinn Tsai; Tzu-Kun Ku
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Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning
Author(s): Gerard Luk-Pat; Ben Painter; Alex Miloslavsky; Peter De Bisschop; Adam Beacham; Kevin Lucas
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Best focus shift mitigation for extending the depth of focus
Author(s): A. Szucs; J. Planchot; V. Farys; E. Yesilada; C. Alleaume; L. Depre; R. Dover; C. Gourgon; M. Besacier; A. Nachtwein; P. Rusu
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Wafer sub-layer impact in OPC/ORC models for 2x nm node implant layers
Author(s): Jean-Christophe Le-Denmat; Catherine Martinelli; Elodie Sungauer; Jean-Christophe Michel; Emek Yesilada; Frederic Robert
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Interference harmonics and rigorous EM spectrum analysis method for low-k1 CD Bossung tilt correction
Author(s): Shuo-Yen Chou; Hoi-Tou Ng; Yi-Yin Chen; Chien-Fu Lee; Ru-Gun Liu; Tsai-Sheng Gau
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Model-based stitching and inter-mask bridge prevention for double patterning lithography
Author(s): Guillaume Landié; Jean-Noel Pena; Serguey Postnikov; James Word; Shumay Shang; Fahd Chaoui; Emek Yesilada; Catherine Martinelli
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Application of artificial neural networks to compact mask models in optical lithography simulation
Author(s): Viviana Agudelo; Tim Fühner; Andreas Erdmann; Peter Evanschitzky
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3D resist profile modeling for OPC applications
Author(s): Yongfa Fan; Kar Kit Koh; Qing Yang; Wolfgang Hoppe; Bernd Kuechler; Puvan Perampalam; Makoto Miyagi; Lena Zavyalova; Thomas Schmoeller
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On the accuracy of different Fourier transforms of VLSI designs
Author(s): Rajai Nasser; Paul Hurley
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Benchmarking study of 3D mask modeling for 2X and 1X nodes
Author(s): ChangAn Wang; Chao-Chun Liang; Huikan Liu; Chidam Kallingal; Derren Dunn; James Oberschmidt; Jaione Tirapu Azpiroz
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OPC resist model separability validation after SMO source change
Author(s): Werner Gillijns; Jeroen Van de Kerkhove; Darko Trivkovic; Peter De Bisschop; David Rio; Stephen Hsu; Mu Feng; Qiang Zhang; Hua-yu Liu
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Topographic mask modeling with reduced basis finite element method
Author(s): Jacek K. Tyminski; Jan Pomplun; Lin Zschiedrich; Donis Flagello; Tomiyuki Matsuyama
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Accurate 3DEMF mask model for full-chip simulation
Author(s): Michael C. Lam; Kostas Adam; David Fryer; Christian Zuniga; Haiqing Wei; Michael Oliver; Chris H. Clifford
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Role of 3D photo-resist simulation for advanced technology nodes
Author(s): Aravind Narayana Samy; Rolf Seltmann; Frank Kahlenberg; Jessy Schramm; Bernd Küchler; Ulrich Klostermann
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A study of vertical lithography for high-density 3D structures
Author(s): Masaki Mizutani; Shin-Ichiro Hirai; Ichiro Koizumi; Ken-Ichiro Mori; Seiya Miura
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Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography
Author(s): Takeshi Asayama; Youichi Sasaki; Takayuki Nagashima; Akihiko Kurosu; Hiroaki Tsushima; Takahito Kumazaki; Kouji Kakizaki; Takashi Matsunaga; Hakaru Mizoguchi
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High power 120W ArF immersion XLR laser system for high dose applications
Author(s): R. Rokitski; R. Rafac; J. Melchior; R. Dubi; J. Thornes; T. Cacouris; M. Haviland; D. Brown
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Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay
Author(s): Yohei Fujishima; Satoshi Ishiyama; Susumu Isago; Akihiro Fukui; Hajime Yamamoto; Toru Hirayama; Tomoyuki Matsuyama; Yasuhiro Ohmura
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High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements
Author(s): Jan Mulkens; Michael Kubis; Paul Hinnen; Roelof de Graaf; Hans van der Laan; Alexander Padiy; Boris Menchtchikov
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High-productivity immersion scanner enabling 1xnm hp manufacturing
Author(s): Yosuke Shirata; Yuichi Shibazaki; Junichi Kosugi; Takahisa Kikuchi; Yasuhiro Ohmura
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Compatibility of optimized source over design changes in the foundry environment
Author(s): Jojo Pei; Feng Shao; Omar ElSewefy; Cynthia Zhu; Verne Xu; Yu Zhu; Liguo Zhang; Xuelong Shi; Qingwei Liu; Aasutosh Dave
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3D resist profile full chip verification and hot spot disposition
Author(s): Qing Yang; ShyueFong Quek; YeeMei Foong; Jens Hassmann; DongQing Zhang; Andre Leschok; Tang Yun; Mu Feng; Stanislas Baron; JianHong Qiu; Taksh Pandey; Bo Yan; Russell Dover
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3D lithography for implant applications
Author(s): Jens Schneider; Henning Feick; Dieter Kaiser; Marcel Heller; Daniel Sarlette
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Lens heating impact analysis and controls for critical device layers by computational method
Author(s): Du Hyun Beak; Jin Phil Choi; Tony Park; Young Sun Nam; Young Seog Kang; Chan-Hoon Park; Ki-Yeop(Chris) Park; Chang-Hoon Ryu; Wenjin Huang; Ki-Ho Baik
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Effects of focus difference of nested and isolated features for scanner proximity matching
Author(s): GuoXiang Ning; Paul Ackmann; Huifeng Koh; Frank Richter; Matthias Ruhm; Jens Busch; Norman Chen; Karin Kurth ; Andre Leschok; Chin Teong Lim
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Source mask optimization using real-coded genetic algorithms
Author(s): Chaoxing Yang; Xiangzhao Wang; Sikun Li; Andreas Erdmann
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Mask 3D effects on contact layouts of 1Xnm NAND flash devices
Author(s): Jongwon Jang; Hyungjeong Jeong; Hyungsoon Yune; Seyoung Oh; Hyunjo Yang; Donggyu Yim
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High speed and flexible PEB 3D diffusion simulation based on Sylvester equation
Author(s): Pei-Chun Lin; Charlie Chung-Ping Chen
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Line edge roughness (LER) mitigation studies specific to interference-like lithography
Author(s): Burak Baylav; Andrew Estroff; Peng Xie; Bruce W. Smith
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The studies of SMO process on cont layer of 20nm node
Author(s): Wei Cyuan Lo; Yung Feng Cheng; Ming Jui Chen
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SMO and NTD for robust single exposure solution on contact patterning for 40nm node flash memory devices
Author(s): Chih-Chieh Yu; C. C. Yang; Elvis Yang; T. H. Yang; K. C. Chen; Chih-Yuan Lu
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Multiple-step process window aware OPC for hyper-NA lithography
Author(s): C. T. Hsuan; C. M. Hu; Fred Lo; Elvis Yang; T. H. Yang; K. C. Chen; Chih-Yuan Lu
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Studies of a suitable mask error enhancement factor for 2D patterns
Author(s): Chih I Wei; Yung Feng Cheng; Ming Jui Chen
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Pixel-based inverse lithography using a mask filtering technique
Author(s): Wen Lv; Qi Xia; Shiyuan Liu
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Imaging quality full chip verification for yield improvement
Author(s): Qing Yang; CongShu Zhou; ShyueFong Quek; Mark Lu; YeeMei Foong; JianHong Qiu; Taksh Pandey; Russell Dover
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Hybrid OPC technique using model based and rule-based flows
Author(s): Mohammed Harb; Hesham Abdelghany
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Model of freeform illumination mode and polarization mode for 193nm immersion lithographic machine
Author(s): Yunbo Zhang; Aijun Zeng; Ying Wang; Mingxing Chen; Huijie Huang
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Analytical equation predicting the forbidden pattern pitch for phase-shifting mask
Author(s): Junichi Tamaki; Masato Shibuya; Nakadate Suezou
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Optomechanical characterization of large wafer stepper-optics with respect to centering errors, lens distances, and center thicknesses
Author(s): Daniel Stickler; Patrik Langehanenberg; Bernd Lüerß; Josef Heinisch
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A customized Exicor system for measuring residual birefringence in lithographic lenses
Author(s): Andy Breninger; Baoliang (Bob) Wang
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Flare management for 40-nm logic devices
Author(s): Yuusuke Tanaka; Takao Tamura; Masashi Fujimoto; Kyoichi Tsubata; Naka Onoda; Kiyoshi Fujii
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Wavefront testing of pinhole based on point diffraction interferometer
Author(s): Xin Jia; Tingwen Xing; Jiajun Xu; Wumei Lin; Zhijie Liao
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Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system
Author(s): Linglin Zhu; Aijun Zeng; Shanhua Zhang; Ruifang Fang; Huijie Huang
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Zero expansion glass ceramic ZERODUR® roadmap for advanced lithography
Author(s): Thomas Westerhoff; Ralf Jedamzik; Peter Hartmann
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Mask side wall clamping
Author(s): G. J. P. Naaijkens; P. C. J. N. Rosielle; M. Steinbuch
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Extending immersion lithography down to 1x nm production nodes
Author(s): Wim P. de Boeij; Remi Pieternella; Igor Bouchoms; Martijn Leenders; Marjan Hoofman; Roelof de Graaf; Haico Kok; Par Broman; Joost Smits; Jan-Jaap Kuit; Matthew McLaren
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Lithographic challenges and their solutions for critical layers in sub-14nm node logic devices
Author(s): Tsann-Bim Chiou; Mircea Dusa; Alek C. Chen; David Pietromonaco
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