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PROCEEDINGS VOLUME 8680

Alternative Lithographic Technologies V
Editor(s): William M. Tong
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Volume Details

Volume Number: 8680
Date Published: 11 April 2013
Softcover: 64 papers (594) pages
ISBN: 9780819494627

Table of Contents
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Front Matter: Volume 8680
Author(s): Proceedings of SPIE
Electron multi-beam technology for mask and wafer writing at 0.1nm address grid
Author(s): Elmar Platzgummer; Christof Klein; Hans Loeschner
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Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA
Author(s): X. Chevalier; C. Nicolet; R. Tiron; A. Gharbi; M. Argoud; J. Pradelles; M. Delalande; G. Cunge; G. Fleury; G. Hadziioannou; C. Navarro
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Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers
Author(s): Ya-Mi Chuang; Han-Hao Cheng; Kevin Jack; Andrew Whittaker; Idriss Blakey
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Defect reduction for semiconductor memory applications using jet and flash imprint lithography
Author(s): Zhengmao Ye; Kang Luo; J. W. Irving; Xiaoming Lu; Wei Zhang; Brian Fletcher; Weijun Liu; Matt Shafran; Saul Lee; Whitney Longsine; Van Truskett; Frank Xu; Dwayne LaBrake; Douglas Resnick; S. V. Sreenivasan
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Novel fluorinated compounds for releasing material in nanoimprint lithography
Author(s): Tsuneo Yamashita; Hisashi Mitsuhashi; Masamichi Morita
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New materials and processes for directed self-assembly
Author(s): Shih-wei Chang; Jessica P. Evans; Shouren Ge; Valeriy V. Ginzburg; John W. Kramer; Brian Landes; Christopher Lee; Greg F. Meyers; Daniel J. Murray; Jong Park; Rahul Sharma; Peter Trefonas; Jeffrey D. Weinhold; Jieqian Zhang; Phillip D. Hustad
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Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip
Author(s): Thomas Gubiotti; Jeff Fuge Sun; Regina Freed; Francoise Kidwingira; Jason Yang; Chris Bevis; Allen Carroll; Alan Brodie; William M. Tong; Shy-Jay Lin; Wen-Chuan Wang; Luc Haspeslagh; Bart Vereecke
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Development of maskless electron-beam lithography using nc-Si electron-emitter array
Author(s): A. Kojima; N. Ikegami; T. Yoshida; H. Miyaguchi; M. Muroyama; H. Nishino; S. Yoshida; M. Sugata; S. Cakir; H. Ohyi; N. Koshida; M. Esashi
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Matching of beams on the MAPPER MATRIX tool: a simulation study
Author(s): J. Belledent; G. Z. M. Berglund; P. L Brandt; S. Bérard-Bergery; M. J. Wieland; L. Pain
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Defect source analysis of directed self-assembly process (DSA of DSA)
Author(s): Paulina Rincon Delgadillo; Ryota Harukawa; Mayur Suri; Stephane Durant; Andrew Cross; Venkat R. Nagaswami; Dieter Van Den Heuvel; Roel Gronheid; Paul Nealey
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MAPPER: progress toward a high-volume manufacturing system
Author(s): G. de Boer; M. P. Dansberg; R. Jager; J. J. M. Peijster; E. Slot; S. W. H. K. Steenbrink; M. J. Wieland
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Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns
Author(s): John G. Hartley; Nigel Crosland; Robert C. Dowling; Philip C. Hoyle; Andrew McClelland; Martin Turnidge; James H. Smith
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Data delivery system for MAPPER using image compression
Author(s): Jeehong Yang; Serap A. Savari
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High performance wire grid polarizers using jet and flashTM imprint lithography
Author(s): Sean Ahn; Jack Yang; Mike Miller; Maha Ganapathisubramanian; Marlon Menezes; Jin Choi; Frank Xu; Douglas J. Resnick; S. V. Sreenivasan
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Deterministically isolated gratings through the directed self-assembly of block copolymers
Author(s): Gregory S. Doerk; Joy Y. Cheng; Charles T. Rettner; Srinivasan Balakrishnan; Noel Arellano; Daniel P. Sanders
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Computational solution of inverse directed self-assembly problem
Author(s): Azat Latypov
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Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self assembly
Author(s): He Yi; Xin-Yu Bao; Richard Tiberio; H.-S. Philip Wong
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Patterning process for semiconductor using directed self assembly
Author(s): Jaewoo Nam; Eun Sung Kim; Daekeun Kang; Hangeun Yu; Kyoungseon Kim; Shiyong Yi; Chul-Ho Shin; Ho-Kyu Kang
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The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication
Author(s): R. Tiron; A. Gharbi; M. Argoud; X. Chevalier; J. Belledent; P. Pimmenta Barros; I. Servin; C. Navarro; G. Cunge; S. Barnola; L. Pain; M. Asai; C. Pieczulewski
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Dissipative particle dynamics study on directed self-assembly in holes
Author(s): T. Nakano; M. Matsukuma; K. Matsuzaki; M. Muramatsu; T. Tomita; T. Kitano
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The hole shrink problem: Theoretical studies of directed self-assembly in cylindrical confinement
Author(s): Nabil Laachi; Kris T. Delaney; Bongkeun Kim; Su-Mi Hur; Robert Bristol; David Shykind; Corey J. Weinheimer; Glenn H. Fredrickson
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Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method
Author(s): Katsuyoshi Kodera; Shimon Maeda; Satoshi Tanaka; Shoji Mimotogi; Yuriko Seino; Hiroki Yonemitsu; Hironobu Sato; Tsukasa Azuma
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Defectivity study of directed self-assembly of cylindrical diblock copolymers in laterally confined thin channels
Author(s): Bongkeun Kim; Nabil Laachi; Glenn H. Fredrickson
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Scanning probe lithography approach for beyond CMOS devices
Author(s): Zahid Durrani; Mervyn Jones; Marcus Kaestner; Manuel Hofer; Elshad Guliyev; Ahmad Ahmad; Tzvetan Ivanov; Jens-Peter Zoellner; Ivo W. Rangelow
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0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography
Author(s): Nataliya Vorbringer-Doroshovets; Felix Balzer; Roland Fuessl; Eberhard Manske; Marcus Kaestner; Andreas Schuh; Jens-Peter Zoellner; Manuel Hofer; Elshad Guliyev; Ahmad Ahmad; Tzvetan Ivanov ; Ivo W. Rangelow
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Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography
Author(s): Marcus Kaestner; Manuel Hofer; Ivo W. Rangelow
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Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Author(s): Katja Steidel; Kang-Hoon Choi; Martin Freitag; Manuela Gutsch; Christoph Hohle; Robert Seidel; Xaver Thrun; Thomas Werner
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A dose modification strategy of electron beam direct writing considering TDDB reliability in LSI interconnects
Author(s): Yoshihiro Midoh; Atsushi Osaki; Koji Nakamae
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Influence of data volume and EPC on process window in massively parallel e-beam direct write
Author(s): Shy-Jay Lin; Pei-Yi Liu; Cheng-Hung Chen; Wen-Chuan Wang; Jaw-Jung Shin ; Burn Jeng Lin; Mark A. McCord; Sameet K. Shriyan
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MAPPER alignment sensor evaluation on process wafers
Author(s): N. Vergeer; L. Lattard; G. de Boer; F. Couweleers; D. Dave; J. Pradelles; J. Bustos
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Fabrication of 28nm pitch Si fins with DSA lithography
Author(s): Gerard Schmid; Richard Farrell; Ji Xu; Chanro Park; Moshe Preil; Vidhya Chakrapani; Nihar Mohanty; Akiteru Ko; Michael Cicoria; David Hetzer; Mark Somervell; Benjamen Rathsack
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Directed self-assembly process implementation in a 300mm pilot line environment
Author(s): Chi-Chun Liu; I. Cristina Estrada-Raygoza; Jassem Abdallah; Steven Holmes; Yunpeng Yin; Anthony Schepis; Michael Cicoria; David Hetzer; Hsinyu Tsai; Michael Guillorn; Melia Tjio; Joy Cheng; Mark Somervell; Matthew Colburn
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Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration
Author(s): Paulina A Rincon Delgadillo; Roel Gronheid; Guanyang Lin ; Yi Cao; Ainhoa Romo; Mark Somervell ; Kathleen Nafus ; Paul F. Nealey
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Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surface
Author(s): Kenji Yoshimoto; Takashi Taniguchi
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Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly
Author(s): Hironobu Sato; Hiroki Yonemitsu; Yuriko Seino; Hirokazu Kato; Masahiro Kanno; Katsutoshi Kobayashi; Ayako Kawanishi; Katsuyoshi Kodera; Tsukasa Azuma
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Exploration of the directed self-assembly based nano-fabrication design space using computational simulations
Author(s): Azat Latypov; Moshe Preil; Gerard Schmid; Ji Xu; He Yi; Kenji Yoshimoto; Yi Zou
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Computational simulation of block copolymer directed self-assembly in small topographical guiding templates
Author(s): He Yi; Azat Latypov; H.-S. Philip Wong
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Polymer blends for directed self-assembly
Author(s): Yuuji Namie; Yusuke Anno; Takehiko Naruoka; Shinya Minegishi; Tomoki Nagai; Yoshi Hishiro; Yoshikazu Yamaguchi
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Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning
Author(s): Douglas J. Guerrero; Mary Ann Hockey; Yubao Wang; Eric Calderas
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Perpendicular orientation of block-co-polymer on controlled neutralization layer
Author(s): Daiju Shiono; Tsuyoshi Kurosawa; Kenichiro Miyashita; Tasuku Matsumiya; Ken Miyagi; Katsumi Ohmori
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Block-copolymer healing of simple defects in a chemoepitaxial template
Author(s): Paul N. Patrone; Gregg M. Gallatin
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Using process monitor wafers to understand directed self-assembly defects
Author(s): Yi Cao; YoungJun Her; Paulina Rincon Delgadillo; Nadia Vandenbroeck; Roel Gronheid; Boon Teik Chan; Yukio Hashimoto; Ainhoa Romo; Mark Somervell; Kathleen Nafus; Paul F. Nealey
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Orientation and position-controlled block copolymer nanolithography for bit-patterned media
Author(s): R. Yamamoto; M. Kanamaru; K. Sugawara; N. Sasao; Y. Ootera; T. Okino; H. Hieda; N. Kihara; Y. Kamata; A. Kikitsu
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Alignment strategy for mixed e-beam and optical lithography
Author(s): Paul Duval; Kamal Tabatabaie-Alavi; Dale Shaw; Alan St. Germain
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Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography
Author(s): Lorea Oria; Alaitz Ruiz de Luzuriaga; Juan Antonio Alduncín; Francesc Pérez-Murano
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Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL)
Author(s): Enden D. Liu; Cong Tran; David K. Lam; Ted Prescop
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Direct-write maskless lithography using patterned oxidation of Si-substrate Induced by femtosecond laser pulses
Author(s): Amirkianoosh Kiani; Krishnan Venkatakrishnan; Bo Tan
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A slim column cell of 12nm resolution for wider application of e-beam lithography
Author(s): Akio Yamada; Hitoshi Tanaka; Tomohiko Abe; Youichi Shimizu
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Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology
Author(s): Yoshinori Kojima; Yasushi Takahashi; Shuzo Ohshio; Shinji Sugatani; Junichi Kon
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Practical proof of CP element based design for 14nm node and beyond
Author(s): Takashi Maruyama; Hiroshi Takita; Rimon Ikeno; Morimi Osawa; Yoshinori Kojima; Shinji Sugatani; Hiromi Hoshino; Toshio Hino; Masaru Ito; Tetsuya Iizuka; Satoshi Komatsu; Makoto Ikeda; Kunihiro Asada
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Reticle level compensation for long range effects
Author(s): Thiago Figueiro; Clyde Browning; Martin J. Thornton; Cyril Vannufel; Patrick Schiavone
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Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct write
Author(s): Alan Brodie; Shinichi Kojima; Mark McCord; Luca Grella; Thomas Gubiotti; Chris Bevis
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Contrast enhanced exposure strategy in multi-beam mask writing
Author(s): Nikola Belic; Ulrich Hofmann; Jan Klikovits; Stephan Martens
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Sub-22 nm silicon template nanofabrication by advanced spacer patterning technique for NIL applications
Author(s): Jong-Moon Park; Kun-Sik Park; Dong-Pyo Kim; Seong-Ook Yoo; Jin-Ho Lee
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A process for low cost wire grid polarizers
Author(s): M. P. C. Watts; M. Little; E. Egan; A. Hochbaum; C. Johns; S. Stephansen
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Process enhancements for negative tone development (NTD)
Author(s): Go Noya; Kazuma Yamamoto; Naoki Matsumoto; Yukie Takemura; Maki Ishii; Yoshihiro Miyamoto; Masahiro Ishii; Tatsuro Nagahara; Georg Pawlowski
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Direct electron beam patterning of sub-5nm monolayer graphene interconnects
Author(s): Zhengqing John Qi; Julio A. Rodríguez-Manzo; Sung Ju Hong; Yung Woo Park; Eric A. Stach; Marija Drndić; A. T. Charlie Johnson
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PS-b-PAA as a high X polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA
Author(s): Jing Cheng; Richard A. Lawson; Wei-Ming Yeh; Nathan D. Jarnagin; Laren M. Tolbert; Clifford L. Henderson
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PS-b-PHEMA: synthesis, characterization, and processing of a high X polymer for directed self-assembly lithography
Author(s): Jing Cheng; Richard A. Lawson; Wei-Ming Yeh; Nathan D. Jarnagin; Laren M. Tolbert; Clifford L. Henderson
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PS-b-PHOST as a high X block copolymers for directed self assembly: optimization of underlayer and solvent anneal processes
Author(s): Nathan D. Jarnagin; Wei-Ming Yeh; Jing Cheng; Andrew Peters; Richard A. Lawson; Laren M. Tolbert; Clifford L. Henderson
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Coarse grained molecular dynamics model of block copolymer directed self-assembly
Author(s): Richard A. Lawson; Andrew J. Peters; Peter J. Ludovice; Clifford L. Henderson
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Tuning domain size of block copolymers for directed self assembly using polymer blending: molecular dynamics simulation studies
Author(s): Richard A. Lawson; Andrew J. Peters; Peter J. Ludovice; Clifford L. Henderson
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Effects of block copolymer polydispersity and xN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers
Author(s): Andrew J. Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson
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