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Proceedings of SPIE Volume 8466

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
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Volume Details

Volume Number: 8466
Date Published: 19 October 2012
Softcover: 21 papers (194) pages
ISBN: 9780819491831

Table of Contents
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Front Matter: Volume 8466
Author(s): Proceedings of SPIE
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High-rate, roll-to-roll nanomanufacturing of flexible systems
Author(s): Khershed P. Cooper; Ralph F. Wachter
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Metrology and instrumentation challenges with high-rate, roll-to-roll manufacturing of flexible electronic systems
Author(s): Harish Subbaraman; Xiaohui Lin; Xiaochuan Xu; Ananth Dodabalapur; L. Jay Guo; Ray T. Chen
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Metrology challenges for high-rate nanomanufacturing of polymer structures
Author(s): Joey Mead; Carol Barry; Ahmed Busnaina; Jacqueline Isaacs
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Performances and limitations of Lab-to-Fab strategies for inline optical metrology
Author(s): E. Nolot; A. André; A. Michallet
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In-line control and characterization of nanomaterials synthesis from hyperspectral polarimetric light scattering: an experimental method
Author(s): Romain Ceolato; Nicolas Riviere; Beatrice Biscans
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Defect inspection strategies for 14 nm semiconductor technology
Author(s): Ralf Buengener
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Object-depending artifacts in confocal measurements
Author(s): F. Mauch; W. Lyda; M. Gronle; W. Osten
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Advances in metrology for the determination of Young's modulus for low-k dielectric thin films
Author(s): Sean King; George A. Antonelli; Gheorghe Stan; Robert F. Cook; R. Sooryakumar
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Blue irradiance intercomparison in the medical field
Author(s): Antonio F. G. Ferreira
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New reference material for transmission electron microscope calibration
Author(s): M. N. Filippov; V. P. Gavrilenko; M. V. Kovalchuk; V. B. Mityukhlyaev; A. V. Rakov; P. A. Todua; A. L. Vasiliev
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First steps towards a scatterometry reference standard
Author(s): Bernd Bodermann; Poul-Erik Hansen; Sven Burger; Mark-Alexander Henn; Hermann Gross; Markus Bär; Frank Scholze; Johannes Endres; Matthias Wurm
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Multiple-order imaging for optical critical dimension metrology using microscope characterization
Author(s): Jing Qin; Hui Zhou; Bryan M. Barnes; Francois Goasmat; Ronald Dixson; Richard M. Silver
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Plasmonic-enhanced infrared photoexpansion nano-spectroscopy using tunable quantum cascade lasers
Author(s): Feng Lu; Mikhail A. Belkin
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Active retroreflector to measure the rotational orientation in conjunction with a laser tracker
Author(s): O. Hofherr; C. Wachten; C. Müller; H. Reinecke
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Imaging of short time microscopic scenes with strong light emission: revisited
Author(s): Cornelius Hahlweg; Wenjing Zhao; Hendrik Vogeler; Hendrik Rothe
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A large-scale ceramic package of the CMOS image sensor chip for remote sensing application
Author(s): Chia-Hung Chang; Jer Ling; Shih-Hung Lo; Wen-Chih Hsu; Cynthia Liu
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Graphene Raman imaging and spectroscopy processing: characterization of graphene growth
Author(s): Matias G. Babenco; Li Tao; Deji Akinwande
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A portable modular optical sensor capable of measuring complex multi-axis strain fields
Author(s): Weixin Zhao; B. Terry Beck; Robert J. Peterman; Chih-Hang John Wu
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Non-destructive 3D characterization of microchannels
Author(s): Ville Heikkinen; Anton Nolvi; Ivan Kassamakov; Kestutis Grigoras; Sami Franssila; Edward Hæggström
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Optical testing for meter size aspheric optics
Author(s): Peng Su; Chang Jin Oh; Chunyu Zhao; James H. Burge
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Comparison of refractive indices measured by m-lines and ellipsometry: application to polymer blend and ceramic thin films for gas sensors
Author(s): Thomas Wood; Judikaël Le Rouzo; François Flory; Paul Coudray; Valmor Roberto Mastelaro; Pedro Pelissari; Sérgio Zilio
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