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Proceedings of SPIE Volume 8441

Photomask and Next-Generation Lithography Mask Technology XIX
Editor(s): Kokoro Kato
Format Member Price Non-Member Price
Softcover $78.75 $105.00

Volume Details

Volume Number: 8441
Date Published: 29 June 2012
Softcover: 58 papers (520) pages
ISBN: 9780819491367

Table of Contents
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Front Matter: Volume 8441
Author(s): Proceedings of SPIE
Hybrid OPC verification flow with compact and rigorous models
Author(s): KunYuan Chen; ChunCheng Liao; ChiaWei Tsai; ChaoHeng Chen; Makoto Miyagi
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Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source
Author(s): Tetsuo Harada; Masato Nakasuji; Takeo Watanabe; Yutaka Nagata; Hiroo Kinoshita
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Fast layout processing methodologies for scalable distributed computing applications
Author(s): Chang-woo Kang; Jae-pil Shin; Bhardwaj Durvasula; Sang-won Seo; Dae-hyun Jung; Jong-bae Lee; Young-kwan Park
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Maskshop data preparation and quality control: from supplier management viewpoint
Author(s): Erwin Deng; Rachel Lee; Chun Der Lee
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Study on storage components and application performance for mask haze prevention
Author(s): Shu Li Chen; T. Y. Fang; Ryan Lai; Chun Der Lee; Shang Hao Yeh; Timmy Chen
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EUV and 193 mask line width roughness (LWR) impact on wafer CD LWR
Author(s): Chain Ting Huang; Cloud Cheng; Ming Jui Chen
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Novel OPC flow for the trim-mask lithography
Author(s): Yasushi Kojima; Akemi Moniwa; Tatsuya Maruyama; Manabu Ishibashi; Hironobu Taoka
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New CDSEM technology and its performance for multiple patterning process
Author(s): Yuta Chihara; Keisuke Ito; Masayuki Kuribara; Toshimichi Iwai; Soichi Shida; Masahiro Seyama; Jun Matsumoto; Takayuki Nakamura
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Evaluation of molecular contaminants in the micro-environment between photomask and pellicle using analysis tool
Author(s): Mina Douzono; Itsuka Shimada; Tatsuji Ueda; Tatsuo Nonaka; Yukihiro Kawano; Masashi Murakami
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Interplay of three-dimensional profile change and CD variation in 193-nm advanced binary photomasks
Author(s): Yun-Yue Lin; Sean Su; Wen-Chang Hsush; Ta-Cheng Lien; Jia-Jen Chen; Shin-Chang Lee; Anthony Yen
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Evaluation of EUV mask cleaning process
Author(s): Pavel Nesladek; Stefan Rümmelin; Uzodinma Okoroanyanwu
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Tales of scales: how to enable backup process tool qualification for high-end photomasks
Author(s): G. R. Cantrell; Christian Bürgel; Martin Sczyrba; Jan Heumann; Stefan Meusemann; Clemens Utzny
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Applications and development of BitClean technology including selective nanoparticle manipulation
Author(s): Tod Robinson; David Brinkley; Roy White; Jeff LeClaire; Michael Archuletta; Ron Bozak; Daniel Yi
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Assist feature printability prediction by 3-D resist profile reconstruction
Author(s): Xin Zheng; Jensheng Huang; Fook Chin; Aram Kazarian; Chun-Chieh Kuo
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Shadowing 3D mask effects in EUV
Author(s): Eytan Barouch
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EUV actinic blank inspection tool with a high magnification review mode
Author(s): Tomohiro Suzuki; Hiroki Miyai; Kiwamu Takehisa; Haruhiko Kusunose; Takeshi Yamane; Tsuneo Terasawa; Hidehiro Watanabe; Soichi Inoue; Ichiro Mori
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Black border with etched multilayer on EUV mask
Author(s): Norihito Fukugami; Kazuaki Matsui; Genta Watanabe; Takeshi Isogawa; Shinpei Kondo; Yutaka Kodera; Yo Sakata; Shinji Akima; Jun Kotani; Hiroaki Morimoto; Tsuyoshi Tanaka
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Systematic study of source mask optimization and verification flows
Author(s): Yu Ben; Azat Latypov; Gek Soon Chua; Yi Zou
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Past and future challenges from a display mask writer perspective
Author(s): Peter Ekberg; Axel von Sydow
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Novel MRC algorithms using GPGPU
Author(s): Kokoro Kato; Yoshiyuki Taniguchi; Tadao Inoue; Kazuya Kadota
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Applications of MRC software for efficient mask manufacturing
Author(s): Kokoro Kato; Yoshiyuki Taniguchi; Kuninori Nishizawa; Tadao Inoue
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A perspective on collaborative research for emerging technologies and design
Author(s): Andrew R. Neureuther
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Loss free mask production with inspection, repair, and pellicle handling systems
Author(s): Makoto Yonezawa; Tosho Cho; Makoto Takano; Masahiro Toriguchi; Masafumi Shinoda; Mitsuru Hamakawa; Seiki Matsumoto
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Development of a new mask pattern inspection tool NPI-7000 and applied results to EUV mask inspection
Author(s): Hideaki Hashimoto; Nobutaka Kikuiri; Ikunao Isomura; Manabu Isobe; Noriaki Musashi
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Novel programmed defect mask blanks for ML defect understanding and characterization
Author(s): Kazuaki Matsui; Takagi Noriaki; Isogawa Takeshi; Yutaka Kodera; Sakata Yo; Akima Shinji
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Shedding light on EUV mask inspection
Author(s): Kazunori Seki; Karen Badger; Emily Gallagher; Toshio Konishi; Gregory McIntyre
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Closed loop registration control (RegC) using PROVE as the data source for the RegC process
Author(s): Erez Graitzer; Avi Cohen; Vladimir Dmitriev; Itamar Balla; Dan Avizemer; Dirk Beyer; Klaus Boehm; Wolfgang Degel
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Direct phase-shift measurement of thin and thick absorber EUV masks
Author(s): Tetsunori Murachi; Hiroyoshi Tanabe; Seh-Jin Park; Eric Gullikson; Taichi Ogase; Tsukasa Abe; Naoya Hayashi
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Mask CD uniformity metrology for logic patterning and its correlation to wafer data
Author(s): Bertrand Le Gratiet; Raphaël Zékri; Frank Sundermann; Thomas Trautzsch; Thomas Thaler; Robert Birkner; Ute Buttgereit
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A systematic approach for extracting verification patterns from an OPC test mask
Author(s): Mohammad K. A. Kamel; Mohamed Al-Imam
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A simulation of chrome migration and its prevention in photomask
Author(s): Jong-Min Kim; Ik-Boum Hur; Dong-Heok Lee; Sang-Soo Choi
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Evaluation of 3D metrology potential using a multiple detector CDSEM
Author(s): Hidemitsu Hakii; Isao Yonekura; Yasushi Nishiyama; Keishi Tanaka; Kenji Komoto; Tsutomu Murakawa; Mitsuo Hiroyama; Soichi Shida; Masayuki Kuribara; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura
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Roadmap to sub-nanometer OPC model accuracy
Author(s): John L. Sturtevant; Edita Tejnil
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Challenges and solutions ensuring EUVL photomask integrity
Author(s): O. Brux; P. Dreß; H. Schmalfuß; R. Jonckheere; W. Koolen-Hermkens
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Study of EUV mask inspection using projection EB optics with programmed pattern defect
Author(s): Ryoichi Hirano; Hidehiro Watanabe; Susumu Iida; Tsuyoshi Amano; Tsuneo Terasawa; Masahiro Hatakeyama; Takeshi Murakami
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ZEP520A cold-development technique and tool for ultimate resolution to fabricate 1Xnm bit pattern EB master mold for nano-imprinting lithography for HDD/BPM development
Author(s): Hideo Kobayashi; Hiromasa Iyama
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The door opener for EUV mask repair
Author(s): M. Waiblinger; R. Jonckheere; Tristan Bret; D. Van den Heuvel; C. Baur; G. Baralia
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Master mold and working replica fabrication for nano-imprinting lithography for 1Tbit/inch2 and 25nm pitch bit patterned media
Author(s): Hideo Kobayashi; Shuji Kishimoto; Kouta Suzuki; Hiromasa Iyama; Sakae Nakatsuka; Kazutake Taniguchi; Takaeshi Kagatsume; Takashi Sato; Tsuyoshi Watanabe
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Masks data preparation flow for advanced technology nodes
Author(s): Antonio Marques; Corinne Miramond; Omar Ndiaye
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Improved signal to noise ratio in actinic EUVL mask blank inspection
Author(s): Takeshi Yamane; Tsuneo Terasawa
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Development of novel projection electron microscopy (PEM) system for EUV mask inspection
Author(s): Masahiro Hatakeyama; Takeshi Murakami; Tsutomu Karimata; Kenji Watanabe; Yoshihiko Naito; Tsuyoshi Amano; Ryoichi Hirano; Susumu Iida; Hidehiro Watanabe; Tsuneo Terasawa
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A study of hot spot measurement on WLCD
Author(s): Hidemichi Imai; Shingo Yoshikawa; Hideyoshi Takamizawa; Ute Buttgereit; Thomas Thaler
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Mask process characterization of multiresolution writing
Author(s): Timothy Lin; Jed Rankin; Yuki Fujita; Adam C. Smith; Emile Sahouria; Ahmad Elayat; Peter Thwaite; Steffen Schulze
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Placement error due to charging in EBL: experimental verification of a new correction model
Author(s): Sergey Babin; Sergey Borisov; Yasuki Kimura; Kenji Kono; Vladimir Militsin; Ryuuji Yamamoto
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Defect management of EUV mask
Author(s): Takashi Kamo; Koji Murano; Kosuke Takai; Kazuki Hagihara; Shinji Yamaguchi; Masato Naka; Keiko Morishita; Ryoji Yoshikawa; Masamitsu Itoh; Suigen Kyoh; Naoya Hayashi
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Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)
Author(s): Elmar Platzgummer; Christof Klein; Hans Loeschner
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Impact of mask line edge roughness and statistical noise on next generation mask making
Author(s): Byung Gook Kim; Jin Choi; Sang Hee Lee; Chan Uk Jeon
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EB alignment function for defect mitigation of EUV blank
Author(s): Shusuke Yoshitake; Seiji Wake; Yasuo Sengoku; Saiko Hayashi; Tomohiro Iijima; Munehiro Ogasawara; Kiyoshi Hattori
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New development system for EUV mask
Author(s): Masatoshi Terayama; Hideaki Sakurai; Mari Sakai; Masamitsu Itoh; Hideo Funakoshi; Hideaki Iwasaka; Junko Iizuka; Mitsuaki Maruyama; Naoya Hayashi
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The quality assurance of EUV mask pattern based on 3D-SEM and lithography simulation
Author(s): Eiji Yamanaka; Keiko Morishita; Takamasa Takaki; Masanori Takahashi; Takashi Hirano; Masamitsu Itoh; Shigeki Nojima; Naoya Hayashi
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New paradigm for effective particle removal cleaning of EUV mask
Author(s): Jinsang Yoon; Han-Shin Lee; Hyoyeon Kim; Heungsuk Oh; Jaehyuck Choi; Paul Chung; Inkyun Shin; Chanuk Jeon
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Photomask repair technology by using gas field ion source
Author(s): Fumio Aramaki; Tomokazu Kozakai; Osamu Matsuda; Osamu Takaoka; Yasuhiko Sugiyama; Hiroshi Oba; Kazuo Aita; Anto Yasaka
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Over-generation-10 size FPD photomasks for virtual reality
Author(s): Kazuya Shiojiri
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A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks
Author(s): Patrick Schiavone; Luc Martin; Clyde Browning; Vincent Farys; Frank Sundermann; Shogo Narukawa; Tadahiko Takikawa; Naoya Hayashi
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Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node
Author(s): Sukjong Bae; Jin Choi; Sung Hoon Park; Byung Gook Kim; Chan-Uk Jeon
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Layout and reticle verification for FPD
Author(s): Makoto Takagi; Kouji Yamaguchi; Hideki Chida; Tsuneo Munakata; Nobuto Ono
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CD-Metrology of EUV masks in the presence of charging: measurement and simulation
Author(s): Sergey Babin; Sergey Borisov; Hidemitsu Hakii; Yasushi Nishiyama; Isao Yonekura
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